Bierman; Benjamin

Patent Applications and Registrations

Patent applications and USPTO patent grants for Bierman; Benjamin.The latest application filed is for "thermally processing a substrate".

Company Profile

0.11.0

Bierman; Benjamin - Fremont CA
Bierman; Benjamin - Milpitas CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Thermally processing a substrate Grant 6,803,546 - Boas , et al. October 12, 2	2004-10-12
Sloped substrate support Grant 6,395,363 - Ballance , et al. May 28, 2	2002-05-28
Magnetically-levitated rotor system for an RTP chamber Grant 6,157,106 - Tietz , et al. December 5, 2	2000-12-05
Method and apparatus for achieving temperature uniformity of a substrate Grant 6,123,766 - Williams , et al. September 26, 2	2000-09-26
Multi-zone gas flow control in a process chamber Grant 6,090,210 - Ballance , et al. July 18, 2	2000-07-18
Reflector cover for a semiconductor processing chamber Grant 6,035,100 - Bierman , et al. March 7, 2	2000-03-07
Method and apparatus for purging the back side of a substrate during chemical vapor processing Grant 5,960,555 - Deaton , et al. October 5, 1	1999-10-05
Method and apparatus for purging the back side of a substrate during chemical vapor processing Grant 5,884,412 - Tietz , et al. March 23, 1	1999-03-23
Lift pin and support pin apparatus for a processing chamber Grant 5,879,128 - Tietz , et al. March 9, 1	1999-03-09
Semiconductor wafer support with graded thermal mass Grant 5,848,889 - Tietz , et al. December 15, 1	1998-12-15
Gas introduction showerhead for an RTP chamber with upper and lower transparent plates and gas flow therebetween Grant 5,781,693 - Ballance , et al. July 14, 1	1998-07-14

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