Besaucele; Herve A.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Besaucele; Herve A..The latest application filed is for "laser gas injection system".

Company Profile

0.21.12

Besaucele; Herve A. - San Diego CA
Besaucele; Herve A. - La Jolla CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Laser gas injection system Grant 7,835,414 - Dunstan , et al. November 16, 2	2010-11-16
Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control Grant 7,741,639 - Besaucele , et al. June 22, 2	2010-06-22
Very narrow band, two chamber, high rep-rate gas discharge laser system Grant 7,567,607 - Knowles , et al. July 28, 2	2009-07-28
Gas discharge laser output light beam parameter control Grant 7,471,708 - Besaucele , et al. December 30, 2	2008-12-30
Laser gas injection system App 20080205472 - Dunstan; Wayne J. ; et al.	2008-08-28
Line selected F.sub.2 two chamber laser system Grant 7,218,661 - Knowles , et al. May 15, 2	2007-05-15
Gas discharge laser output light beam parameter control App 20060227839 - Besaucele; Herve A. ; et al.	2006-10-12
Very narrow band, two chamber, high rep-rate gas discharge laser system App 20060126697 - Knowles; David S. ; et al.	2006-06-15
Very narrow band, two chamber, high rep-rate gas discharge laser system Grant 7,061,961 - Knowles , et al. June 13, 2	2006-06-13
Line selected F2 two chamber laser system Grant 7,058,107 - Knowles , et al. June 6, 2	2006-06-06
Very narrow band, two chamber, high reprate gas discharge laser system Grant 6,985,508 - Knowles , et al. January 10, 2	2006-01-10
Very Narrow Band, Two Chamber, High Rep-rate Gas Discharge Laser System App 20050271109 - Knowles, David S. ; et al.	2005-12-08
Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection control App 20050094698 - Besaucele, Herve A. ; et al.	2005-05-05
Line selected F2 two chamber laser system App 20040258122 - Knowles, David S. ; et al.	2004-12-23
Line selected F2 two chamber laser system Grant 6,801,560 - Knowles , et al. October 5, 2	2004-10-05
Line selected F2 two chamber laser system App 20040174919 - Knowles, David S. ; et al.	2004-09-09
Very narrow band, two chamber, high reprate gas discharge laser system App 20040047385 - Knowles, David S. ; et al.	2004-03-11
Lithography laser with beam delivery and beam pointing control Grant 6,704,339 - Lublin , et al. March 9, 2	2004-03-09
Very narrow band, two chamber, high rep rate gas discharge laser system Grant 6,625,191 - Knowles , et al. September 23, 2	2003-09-23
Very narrow band, two chamber, high rep rate gas discharge laser system Grant 6,567,450 - Myers , et al. May 20, 2	2003-05-20
ArF laser with low pulse energy and high rep rate Grant 6,553,049 - Besaucele , et al. April 22, 2	2003-04-22
Reliable, modular, production quality narrow-band high rep rate F2 laser Grant RE38,054 - Hofmann , et al. April 1, 2	2003-04-01
Lithography laser with beam delivery and beam pointing control App 20030043876 - Lublin, Leonard ; et al.	2003-03-06
Very narrow band, two chamber, high rep rate gas discharge laser system App 20020154668 - Knowles, David S. ; et al.	2002-10-24
Line selected F2 two chamber laser system App 20020154671 - Knowles, David S. ; et al.	2002-10-24
Very narrow band, two chamber, high rep rate gas discharge laser system App 20020044586 - Myers, David W. ; et al.	2002-04-18
Reliable, modular, production quality narrow-band high rep rate ArF excimer laser Grant 6,330,261 - Ishihara , et al. December 11, 2	2001-12-11
Narrow band gas discharge laser with gas additive Grant 6,188,710 - Besaucele , et al. February 13, 2	2001-02-13
Reliable modular production quality narrow-band high REP rate excimer laser Grant 6,128,323 - Myers , et al. October 3, 2	2000-10-03
Laser-illuminated stepper or scanner with energy sensor feedback Grant 6,067,306 - Sandstrom , et al. May 23, 2	2000-05-23
Reliable, modular, production quality narrow-band high rep rate F.sub.2 laser Grant 6,018,537 - Hofmann , et al. January 25, 2	2000-01-25
Reliable. modular, production quality narrow-band KRF excimer laser Grant 5,991,324 - Knowles , et al. November 23, 1	1999-11-23
Laser chamber with minimized acoustic and shock wave disturbances Grant 5,978,405 - Juhasz , et al. November 2, 1	1999-11-02

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