Berendsen; Christianus Wilhelmus Johannes

Patent Applications and Registrations

Patent applications and USPTO patent grants for Berendsen; Christianus Wilhelmus Johannes.The latest application filed is for "a process tool and an inspection method".

Company Profile

4.7.5

Berendsen; Christianus Wilhelmus Johannes - Roermond NL
BERENDSEN; Christianus Wilhelmus Johannes - Eindhoven NL

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Lithographic apparatus and an object positioning system Grant RE49,142 - Koevoets , et al. July 19, 2	2022-07-19
A Process Tool And An Inspection Method App 20210349397 - STEGEN; Raphael Nico Johan ; et al.	2021-11-11
Guiding Device And Associated System App 20210141311 - LABETSKI; Dzmitry ; et al.	2021-05-13
Guiding device and associated system Grant 10,955,749 - Labetski , et al. March 23, 2	2021-03-23
Method for removing photosensitive material on a substrate Grant 10,948,825 - Berendsen , et al. March 16, 2	2021-03-16
Method For Removing Photosensitive Material On A Substrate App 20200166845 - BERENDSEN; Christianus Wilhelmus Johannes ; et al.	2020-05-28
Immersion lithographic apparatus Grant 10,216,095 - Riepen , et al. Feb	2019-02-26
Lithographic apparatus and method of manufacturing a lithographic apparatus Grant 10,018,926 - Cortie , et al. July 10, 2	2018-07-10
Method for compensating for an exposure error, a device manufacturing method, a substrate table, a lithographic apparatus, a control system, a method for measuring reflectivity and a method for measuring a dose of EUV radiation Grant 9,983,489 - Berendsen , et al. May 29, 2	2018-05-29
Lithographic apparatus and an object positioning system Grant 9,939,738 - Koevoets , et al. April 10, 2	2018-04-10
A Lithographic Apparatus And An Object Positioning System App 20170212429 - KOEVOETS; Adrianus Hendrik ; et al.	2017-07-27
Method For Compensating for an Exposure Error, a Device Manufacturing Method, a Substrate Table, a Lithographic Apparatus, a Control System, a Method for Measuring Reflectivity and a Method for Measuring a Dose of EUV Radiation App 20170115578 - BERENDSEN; Christianus Wilhelmus Johannes ; et al.	2017-04-27

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