| Patent | Date |
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Methods for making dual-damascene dielectric structures
Grant 7,501,339 - Uglow , et al. March 10, 2 | 2009-03-10 |
Methods for making dual-damascene dielectric structures
App 20060166485 - Uglow; Jay E. ; et al. | 2006-07-27 |
Methods for making dual-damascene dielectric structures
Grant 7,060,605 - Uglow , et al. June 13, 2 | 2006-06-13 |
Dual-damascene dielectric structures
Grant 6,909,190 - Uglow , et al. June 21, 2 | 2005-06-21 |
Low dielectric constant porous materials having improved mechanical strength
Grant 6,528,153 - Benzing , et al. March 4, 2 | 2003-03-04 |
Dual - Damascene Dielectric Structures
App 20010010970 - Uglow, Jay E. ; et al. | 2001-08-02 |
Methods for making dual-damascene dielectric structures
App 20010009803 - Uglow, Jay E. ; et al. | 2001-07-26 |
Dual-damascene dielectric structures and methods for making the same
Grant 6,251,770 - Uglow , et al. June 26, 2 | 2001-06-26 |
Apparatus for aligning substrate to chuck in processing chamber
Grant 6,126,382 - Scales , et al. October 3, 2 | 2000-10-03 |
Gas-based substrate deposition protection
Grant 5,925,411 - van de Ven , et al. July 20, 1 | 1999-07-20 |
Process of evaporating a liquid in a cyclone evaporator
Grant 5,901,271 - Benzing , et al. May 4, 1 | 1999-05-04 |
Apparatus for preventing deposition on frontside peripheral region and edge of wafer in chemical vapor deposition apparatus
Grant 5,882,417 - van de Ven , et al. March 16, 1 | 1999-03-16 |
Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus
Grant 5,843,233 - van de Ven , et al. December 1, 1 | 1998-12-01 |
Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus
Grant 5,769,951 - van de Ven , et al. June 23, 1 | 1998-06-23 |
Cyclone evaporator
Grant 5,653,813 - Benzing , et al. August 5, 1 | 1997-08-05 |
Apparatus for supporting a substrate and introducing gas flow doximate to an edge of the substrate
Grant 5,620,525 - van de Ven , et al. April 15, 1 | 1997-04-15 |
Method of generating plasma having high ion density for substrate processing operation
Grant 5,605,599 - Benzing , et al. February 25, 1 | 1997-02-25 |
Wafer surface protection in a gas deposition process
Grant 5,578,532 - van de Ven , et al. November 26, 1 | 1996-11-26 |
Induction plasma source
Grant 5,405,480 - Benzing , et al. April 11, 1 | 1995-04-11 |
Gas-based backside protection during substrate processing
Grant 5,374,594 - van de Ven , et al. December 20, 1 | 1994-12-20 |
Induction plasma source
Grant 5,346,578 - Benzing , et al. September 13, 1 | 1994-09-13 |
Gas-based substrate protection during processing
Grant 5,238,499 - van de Ven , et al. August 24, 1 | 1993-08-24 |
Gas-based backside protection during substrate processing
Grant 5,230,741 - van de Ven , et al. * July 27, 1 | 1993-07-27 |
In-situ CVD chamber cleaner
Grant 4,657,616 - Benzing , et al. April 14, 1 | 1987-04-14 |
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