| Patent | Date |
|---|
Micro-led Displays To Reduce Subpixel Crosstalk
App 20220310575 - Xu; Lisong ; et al. | 2022-09-29 |
Manufacturing Micro-led Displays To Reduce Subpixel Crosstalk
App 20220310872 - Xu; Lisong ; et al. | 2022-09-29 |
Projection System And Methods
App 20220174246 - BENCHER; Christopher Dennis ; et al. | 2022-06-02 |
Multibeamlet charged particle device and method
Grant 11,309,163 - Vaez-Iravani , et al. April 19, 2 | 2022-04-19 |
Method Of Building A 3d Functional Optical Material Layer Stacking Structure
App 20220082738 - YOUNG; Michael Yu-tak ; et al. | 2022-03-17 |
System, software application, and method for lithography stitching
Grant 11,237,485 - Xu , et al. February 1, 2 | 2022-02-01 |
Method of building a 3D functional optical material layer stacking structure
Grant 11,187,836 - Young , et al. November 30, 2 | 2021-11-30 |
System, Software Application, And Method For Lithography Stitching
App 20210223704 - XU; Yongan ; et al. | 2021-07-22 |
Shadow Mask With Tapered Openings Formed By Double Electroforming With Reduced Internal Stresses
App 20210214834 - HUANG; Xi ; et al. | 2021-07-15 |
Multibeamlet Charged Particle Device And Method
App 20210142976 - VAEZ-IRAVANI; Mehdi ; et al. | 2021-05-13 |
Systems and methods of using solid state emitter arrays
Grant 10,983,444 - Bencher , et al. April 20, 2 | 2021-04-20 |
Half tone scheme for maskless lithography
Grant 10,935,890 - Bencher , et al. March 2, 2 | 2021-03-02 |
Reserving spatial light modulator sections to address field non-uniformities
Grant 10,921,714 - Johnson , et al. February 16, 2 | 2021-02-16 |
Micro LED array illumination source
Grant 10,908,507 - Chen , et al. February 2, 2 | 2021-02-02 |
Reserving Spatial Light Modulator Sections To Address Field Non-uniformities
App 20200301288 - JOHNSON; Joseph R. ; et al. | 2020-09-24 |
Method to enhance the resolution of maskless lithography while maintaining a high image contrast
Grant 10,761,430 - Bencher , et al. Sep | 2020-09-01 |
Half Tone Scheme For Maskless Lithography
App 20200264517 - BENCHER; Christopher Dennis ; et al. | 2020-08-20 |
Quarter wave light splitting
Grant 10,705,431 - Bencher , et al. | 2020-07-07 |
Reserving spatial light modulator sections to address field non-uniformities
Grant 10,705,433 - Johnson , et al. | 2020-07-07 |
Spatial light modulator with variable intensity diodes
Grant 10,684,555 - Johnson , et al. | 2020-06-16 |
Digital lithography with extended field size
Grant 10,599,044 - Zhao , et al. | 2020-03-24 |
Method To Enhance The Resolution Of Maskless Lithography While Maintaining A High Image Contrast
App 20200089128 - BENCHER; Christopher Dennis ; et al. | 2020-03-19 |
Shifting of patterns to reduce line waviness
Grant 10,591,815 - Johnson , et al. | 2020-03-17 |
Reserving Spatial Light Modulator Sections To Address Field Non-uniformities
App 20200073253 - JOHNSON; Joseph R. ; et al. | 2020-03-05 |
Half tone scheme for maskless lithography
Grant 10,571,809 - Bencher , et al. Feb | 2020-02-25 |
Collimated LED light field display
Grant 10,559,730 - Thothadri , et al. Feb | 2020-02-11 |
Photoresist Composition For Line Doubling
App 20200012188 - VORA; Ankit ; et al. | 2020-01-09 |
Shifting Of Patterns To Reduce Line Waviness
App 20200004132 - JOHNSON; Joseph R. ; et al. | 2020-01-02 |
Fabrication and use of dose maps and feature size maps during substrate processing
Grant 10,509,328 - Bencher , et al. Dec | 2019-12-17 |
Reserving spatial light modulator sections to address field non-uniformities
Grant 10,503,076 - Johnson , et al. Dec | 2019-12-10 |
Half tone scheme for maskless lithography
Grant 10,495,979 - Bencher , et al. De | 2019-12-03 |
Line edge roughness reduction via step size alteration
Grant 10,495,975 - Laidig , et al. De | 2019-12-03 |
Collimated, directional micro-LED light field display
Grant 10,490,599 - Thothadri , et al. Nov | 2019-11-26 |
Method to reduce data stream for spatial light modulator
Grant 10,488,762 - Johnson , et al. Nov | 2019-11-26 |
Digital lithography with extended depth of focus
Grant 10,474,041 - Zhao , et al. Nov | 2019-11-12 |
Quarter Wave Light Splitting
App 20190339622 - BENCHER; Christopher Dennis ; et al. | 2019-11-07 |
Fabrication And Use Of Dose Maps And Feature Size Maps During Substrate Processing
App 20190332020 - BENCHER; Christopher Dennis ; et al. | 2019-10-31 |
Systems And Methods Of Using Solid State Emitter Arrays
App 20190332017 - BENCHER; Christopher Dennis ; et al. | 2019-10-31 |
Spatial Light Modulator With Variable Intensity Diodes
App 20190294051 - JOHNSON; Joseph R. ; et al. | 2019-09-26 |
Method to reduce line waviness
Grant 10,416,550 - Johnson , et al. Sept | 2019-09-17 |
Method Of Building A 3d Functional Optical Material Layer Stacking Structure
App 20190278005 - YOUNG; Michael Yu-tak ; et al. | 2019-09-12 |
Quarter wave light splitting
Grant 10,394,130 - Bencher , et al. A | 2019-08-27 |
Line Edge Roughness Reduction Via Step Size Alteration
App 20190243250 - LAIDIG; Thomas L. ; et al. | 2019-08-08 |
Collimated Oled Light Field Display
App 20190229246 - BENCHER; Christopher Dennis ; et al. | 2019-07-25 |
Line edge roughness reduction via step size alteration
Grant 10,289,003 - Laidig , et al. | 2019-05-14 |
Collimated OLED light field display
Grant 10,256,382 - White , et al. | 2019-04-09 |
A Shadow Mask With Tapered Openings Formed By Double Electroforming Using Positive/negative Photoresists
App 20190036026 - HUANG; Xi ; et al. | 2019-01-31 |
Collimated, Directional Micro-led Light Field Display
App 20190019840 - THOTHADRI; Manivannan ; et al. | 2019-01-17 |
Wire Grid Polarizer Manufacturing Methods Using Frequency Doubling Interference Lithography
App 20180335694 - CHEN; Jang Fung ; et al. | 2018-11-22 |
Maskless lithography for web based processing
Grant 10,073,350 - Bencher September 11, 2 | 2018-09-11 |
Method To Reduce Line Waviness
App 20180217491 - JOHNSON; Joseph R. ; et al. | 2018-08-02 |
Micro Led Array As Illumination System
App 20180188655 - Chen; Jang Fung ; et al. | 2018-07-05 |
Pattern generators employing processors to vary delivery dose of writing beams according to photoresist thickness, and associated methods
Grant 10,012,910 - Bencher July 3, 2 | 2018-07-03 |
Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning
Grant 10,014,174 - Mebarki , et al. July 3, 2 | 2018-07-03 |
Collimated Oled Light Field Display
App 20180166616 - WHITE; John M. ; et al. | 2018-06-14 |
Method to reduce line waviness
Grant 9,927,696 - Johnson , et al. March 27, 2 | 2018-03-27 |
Extreme ultraviolet (EUV) substrate inspection system with simplified optics and method of manufacturing thereof
Grant 9,915,621 - Foad , et al. March 13, 2 | 2018-03-13 |
Micro Led Array As Illumination Source
App 20180017876 - CHEN; Jang Fung ; et al. | 2018-01-18 |
Method To Reduce Line Waviness
App 20180004099 - JOHNSON; Joseph R. ; et al. | 2018-01-04 |
Correction of non-uniform patterns using time-shifted exposures
Grant 9,823,573 - Johnson , et al. November 21, 2 | 2017-11-21 |
Method to reduce line waviness
Grant 9,791,786 - Johnson , et al. October 17, 2 | 2017-10-17 |
Method To Reduce Line Waviness
App 20170293232 - JOHNSON; Joseph R. ; et al. | 2017-10-12 |
Conformal Strippable Carbon Film For Line-edge-roughness Reduction For Advanced Patterning
App 20170278709 - MEBARKI; Bencherki ; et al. | 2017-09-28 |
Localized stress modulation for overlay and EPE
Grant 9,748,148 - Yieh , et al. August 29, 2 | 2017-08-29 |
Resist Fortification For Magnetic Media Patterning
App 20170206922 - BENCHER; Christopher Dennis ; et al. | 2017-07-20 |
Conformal strippable carbon film for line-edge-roughness reduction for advanced patterning
Grant 9,659,771 - Mebarki , et al. May 23, 2 | 2017-05-23 |
Resist fortification for magnetic media patterning
Grant 9,646,642 - Bencher , et al. May 9, 2 | 2017-05-09 |
Line Edge Roughness Reduction Via Step Size Alteration
App 20170068163 - LAIDIG; Thomas L. ; et al. | 2017-03-09 |
Quarter Wave Light Splitting
App 20170017165 - BENCHER; Christopher Dennis ; et al. | 2017-01-19 |
Correction Of Non-uniform Patterns Using Time-shifted Exposures
App 20170003598 - JOHNSON; Joseph R. ; et al. | 2017-01-05 |
Application Of Magnetic Fields In Additive Manufacturing
App 20160375492 - Bencher; Christopher Dennis ; et al. | 2016-12-29 |
Conformal Strippable Carbon Film For Line-edge-roughness Reduction For Advanced Patterning
App 20160365248 - MEBARKI; Bencherki ; et al. | 2016-12-15 |
Resist Hardening And Development Processes For Semiconductor Device Manufacturing
App 20160329222 - Xie; Peng ; et al. | 2016-11-10 |
Methods for reducing semiconductor substrate strain variation
Grant 9,484,274 - Bencher , et al. November 1, 2 | 2016-11-01 |
Optically tuned hardmask for multi-patterning applications
Grant 9,478,421 - Bencher , et al. October 25, 2 | 2016-10-25 |
Extreme Ultraviolet (euv) Substrate Inspection System With Simplified Optics And Method Of Manufacturing Thereof
App 20160282280 - Foad; Majeed A. ; et al. | 2016-09-29 |
Maskless Lithography For Web Based Processing
App 20160238941 - BENCHER; Christopher Dennis | 2016-08-18 |
Resist hardening and development processes for semiconductor device manufacturing
Grant 9,411,237 - Xie , et al. August 9, 2 | 2016-08-09 |
Pattern Generators Employing Processors To Vary Delivery Dose Of Writing Beams According To Photoresist Thickness, And Associated Methods
App 20160216615 - BENCHER; Christopher Dennis | 2016-07-28 |
Magnetic Field Guided Crystal Orientation System For Metal Conductivity Enhancement
App 20160208415 - Bencher; Christopher Dennis ; et al. | 2016-07-21 |
Digital grey tone lithography for 3D pattern formation
Grant 9,383,649 - Bencher July 5, 2 | 2016-07-05 |
Technique for selectively processing three dimensional device
Grant 9,337,314 - Pradhan , et al. May 10, 2 | 2016-05-10 |
Method for critical dimension reduction using conformal carbon films
Grant 9,337,051 - Mebarki , et al. May 10, 2 | 2016-05-10 |
Method For Critical Dimension Reduction Using Conformal Carbon Films
App 20160049305 - MEBARKI; Bencherki ; et al. | 2016-02-18 |
Optically Tuned Hardmask For Multi-patterning Applications
App 20160042951 - BENCHER; Christopher Dennis ; et al. | 2016-02-11 |
Dual Stage/dual Chuck For Maskless Lithography
App 20160033881 - BENCHER; Christopher Dennis | 2016-02-04 |
Digital Grey Tone Lithography For 3d Pattern Formation
App 20160033867 - BENCHER; Christopher Dennis | 2016-02-04 |
Localized Stress Modulation For Overlay And Epe
App 20160005662 - YIEH; Ellie Y. ; et al. | 2016-01-07 |
Methods For Reducing Semiconductor Substrate Strain Variation
App 20150371908 - BENCHER; Christopher Dennis ; et al. | 2015-12-24 |
Optically tuned hardmask for multi-patterning applications
Grant 9,177,796 - Bencher , et al. November 3, 2 | 2015-11-03 |
Optically Tuned Hardmask For Multi-patterning Applications
App 20140327117 - BENCHER; Christopher Dennis ; et al. | 2014-11-06 |
Resist Hardening And Development Processes For Semiconductor Device Manufacturing
App 20140263172 - Xie; Peng ; et al. | 2014-09-18 |
Technique For Selectively Processing Three Dimensional Device
App 20140162414 - Pradhan; Nilay A. ; et al. | 2014-06-12 |
Resist Fortification For Magnetic Media Patterning
App 20140147700 - BENCHER; Christopher Dennis ; et al. | 2014-05-29 |
Frequency doubling using a photo-resist template mask
Grant 8,357,618 - Bencher , et al. January 22, 2 | 2013-01-22 |
Low temperature process for depositing a high extinction coefficient non-peeling optical absorber for a scanning laser surface anneal of implanted dopants
Grant 8,338,316 - Parihar , et al. December 25, 2 | 2012-12-25 |
Semiconductor device having silicon carbide and conductive pathway interface
Grant 8,183,150 - Huang , et al. May 22, 2 | 2012-05-22 |
Self-aligned multi-patterning for advanced critical dimension contacts
Grant 8,084,310 - Mebarki , et al. December 27, 2 | 2011-12-27 |
Low Temperature Process For Depositing A High Extinction Coefficient Non-peeling Optical Absorber For A Scanning Laser Surface Anneal Of Implanted Dopants
App 20110223773 - Parihar; Vijay ; et al. | 2011-09-15 |
Dopant activation in doped semiconductor substrates
Grant 7,989,366 - Munro , et al. August 2, 2 | 2011-08-02 |
Low temperature process for depositing a high extinction coefficient non-peeling optical absorber for a scanning laser surface anneal of implanted dopants
Grant 7,968,473 - Parihar , et al. June 28, 2 | 2011-06-28 |
Method of reducing critical dimension bias during fabrication of a semiconductor device
Grant 7,737,040 - Bencher , et al. June 15, 2 | 2010-06-15 |
Self-aligned Multi-patterning For Advanced Critical Dimension Contacts
App 20100136792 - Mebarki; Bencherki ; et al. | 2010-06-03 |
Integral patterning of large features along with array using spacer mask patterning process flow
Grant 7,709,396 - Bencher , et al. May 4, 2 | 2010-05-04 |
Integral Patterning Of Large Features Along With Array Using Spacer Mask Patterning Process Flow
App 20100075503 - BENCHER; CHRISTOPHER DENNIS ; et al. | 2010-03-25 |
Bi-layer Capping Of Low-k Dielectric Films
App 20100022100 - Xu; Ping ; et al. | 2010-01-28 |
Methods and devices to reduce defects in dielectric stack structures
Grant 7,608,300 - Bencher , et al. October 27, 2 | 2009-10-27 |
Bi-layer capping of low-K dielectric films
Grant 7,598,183 - Xu , et al. October 6, 2 | 2009-10-06 |
Dynamic surface annealing of implanted dopants with low temperature HDPCVD process for depositing a high extinction coefficient optical absorber layer
Grant 7,588,990 - Parihar , et al. September 15, 2 | 2009-09-15 |
LPCVD gate hard mask
Grant 7,547,621 - Kanuri , et al. June 16, 2 | 2009-06-16 |
Frequency Doubling Using A Photo-resist Template Mask
App 20090111281 - Bencher; Christopher Dennis ; et al. | 2009-04-30 |
Removable amorphous carbon CMP stop
Grant 7,507,677 - Bencher March 24, 2 | 2009-03-24 |
Semiconductor Device Having Silicon Carbide And Conductive Pathway Interface
App 20090050902 - Huang; Judy H. ; et al. | 2009-02-26 |
Methods and devices to reduce defects in dielectric stack structures
App 20080257864 - Bencher; Christopher Dennis ; et al. | 2008-10-23 |
Etch pattern definition using a CVD organic layer as an anti-reflection coating and hardmask
App 20080197109 - Mui; David S. ; et al. | 2008-08-21 |
Low Temperature Process For Depositing A High Extinction Coefficient Non-peeling Optical Absorber For A Scanning Laser Surface Anneal Of Implanted Dopants
App 20080108210 - Parihar; Vijay ; et al. | 2008-05-08 |
Reticle fabrication using a removable hard mask
Grant 7,365,014 - Bencher , et al. April 29, 2 | 2008-04-29 |
Method of reducing critical dimension bias during fabrication of a semiconductor device
App 20080096138 - Bencher; Christopher Dennis ; et al. | 2008-04-24 |
Bi-layer Capping Of Low-k Dielectric Films
App 20080070421 - Xu; Ping ; et al. | 2008-03-20 |
Dopant Activation In Doped Semiconductor Substrates
App 20080057740 - Munro; Jeffrey C. ; et al. | 2008-03-06 |
Dynamic Surface Annealing Of Implanted Dopants With Low Temperature Hdpcvd Process For Depositing A High Extinction Coefficient Optical Absorber Layer
App 20080057681 - Parihar; Vijay ; et al. | 2008-03-06 |
Method of depositing an amorphous carbon layer
Grant 7,335,462 - Fairbairn , et al. February 26, 2 | 2008-02-26 |
Photolithography scheme using a silicon containing resist
Grant 7,332,262 - Latchford , et al. February 19, 2 | 2008-02-19 |
LPCVD gate hard mask
App 20080026584 - Kanuri; Rajesh ; et al. | 2008-01-31 |
Method Of Depositing An Amorphous Carbon Layer
App 20070128538 - FAIRBAIRN; KEVIN ; et al. | 2007-06-07 |
Method of depositing an amorphous carbon layer
Grant 7,223,526 - Fairbairn , et al. May 29, 2 | 2007-05-29 |
Removable amorphous carbon cmp stop
App 20070054500 - Bencher; Christopher Dennis | 2007-03-08 |
Removable amorphous carbon CMP stop
Grant 7,148,156 - Bencher December 12, 2 | 2006-12-12 |
Ashable layers for reducing critical dimensions of integrated circuit features
Grant 7,105,442 - Shan , et al. September 12, 2 | 2006-09-12 |
Semiconductor device having silicon carbide and conductive pathway interface
App 20050263900 - Huang, Judy H. ; et al. | 2005-12-01 |
Photolithography scheme using a silicon containing resist
Grant 6,967,072 - Latchford , et al. November 22, 2 | 2005-11-22 |
Photolithography scheme using a silicon containing resist
App 20050233257 - Latchford, Ian ; et al. | 2005-10-20 |
Plasma treatment for copper oxide reduction
Grant 6,946,401 - Huang , et al. September 20, 2 | 2005-09-20 |
Method of depositing an amorphous carbon film for metal etch hardmask application
App 20050199585 - Wang, Yuxiang May ; et al. | 2005-09-15 |
Removable amorphous carbon CMP stop
App 20050191848 - Bencher, Christopher Dennis | 2005-09-01 |
Reticle fabrication using a removable hard mask
App 20050170655 - Bencher, Christopher Dennis ; et al. | 2005-08-04 |
Method for fabricating a gate structure of a field effect transistor
Grant 6,924,191 - Liu , et al. August 2, 2 | 2005-08-02 |
Method of depositing an amrphous carbon layer
App 20050112509 - Fairbairn, Kevin ; et al. | 2005-05-26 |
Methods and devices to reduce defects in dielectric stack structures
App 20050045099 - Bencher, Christopher Dennis ; et al. | 2005-03-03 |
Nitrogen-free antireflective coating for use with photolithographic patterning
Grant 6,853,043 - Yeh , et al. February 8, 2 | 2005-02-08 |
Removable amorphous carbon CMP stop
Grant 6,852,647 - Bencher February 8, 2 | 2005-02-08 |
Method of depositing an amorphous carbon layer
Grant 6,841,341 - Fairbairn , et al. January 11, 2 | 2005-01-11 |
Nitrogen-free antireflective coating for use with photolithographic patterning
App 20040087139 - Yeh, Wendy H. ; et al. | 2004-05-06 |
Plasma treatment for copper oxide reduction
App 20040046260 - Huang, Judy H. ; et al. | 2004-03-11 |
Method for fabricating a gate structure of a field effect transistor
App 20040043623 - Liu, Wei ; et al. | 2004-03-04 |
Semiconductor device having reduced oxidation interface
Grant 6,700,202 - Huang , et al. March 2, 2 | 2004-03-02 |
Method of preventing or suppressing sidewall buckling of mask structures used to etch feature sizes smaller than 50nm
App 20040038537 - Liu, Wei ; et al. | 2004-02-26 |
Ashable layers for reducing critical dimensions of integrated circuit features
App 20030219988 - Shan, Hongqing ; et al. | 2003-11-27 |
Removable amorphous carbon CMP stop
App 20030186477 - Bencher, Christopher Dennis | 2003-10-02 |
Method for depositing an amorphous carbon layer
Grant 6,573,030 - Fairbairn , et al. June 3, 2 | 2003-06-03 |
Method of depositing an amorphous carbon layer
App 20030091938 - Fairbairn, Kevin ; et al. | 2003-05-15 |
Removable amorphous carbon CMP stop
Grant 6,541,397 - Bencher April 1, 2 | 2003-04-01 |
Etch pattern definition using a CVD organic layer as an anti-reflection coating and hardmask
App 20020086547 - Mui, David S. ; et al. | 2002-07-04 |
Apparatus for reducing copper oxidation and contamination in a semiconductor device
App 20020081856 - Huang, Judy H. ; et al. | 2002-06-27 |
Method and apparatus for reducing copper oxidation and contamination in a semiconductor device
Grant 6,355,571 - Huang , et al. March 12, 2 | 2002-03-12 |
Photolithography scheme using a silicon containing resist
App 20020001778 - Latchford, Ian ; et al. | 2002-01-03 |
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