Bencher; Christopher D.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Bencher; Christopher D..The latest application filed is for "methods and apparatus for forming a resist array using chemical mechanical planarization".

Company Profile

0.16.19

Bencher; Christopher D. - Cupertino CA
Bencher; Christopher D. - San Jose CA US
Bencher; Christopher D. - Sunnyvale CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Methods and apparatus for forming a resist array using chemical mechanical planarization Grant 10,014,184 - Bencher July 3, 2	2018-07-03
Methods And Apparatus For Forming A Resist Array Using Chemical Mechanical Planarization App 20160343578 - Bencher; Christopher D.	2016-11-24
Resist fortification for magnetic media patterning Grant 8,658,242 - Bencher , et al. February 25, 2	2014-02-25
Double exposure patterning with carbonaceous hardmask Grant 8,293,460 - Chen , et al. October 23, 2	2012-10-23
Resist Fortification For Magnetic Media Patterning App 20120196155 - Bencher; Christopher D. ; et al.	2012-08-02
Boron nitride and boron-nitride derived materials deposition method Grant 8,148,269 - Balseanu , et al. April 3, 2	2012-04-03
Adhesion and minimizing oxidation on electroless CO alloy films for integration with low K inter-metal dielectric and etch stop Grant 7,910,476 - Fang , et al. March 22, 2	2011-03-22
Double patterning with a double layer cap on carbonaceous hardmask Grant 7,901,869 - Bencher , et al. March 8, 2	2011-03-08
Frequency Doubling Using Spacer Mask App 20110008969 - Bencher; Christopher D. ; et al.	2011-01-13
Frequency tripling using spacer mask having interposed regions Grant 7,846,849 - Bencher , et al. December 7, 2	2010-12-07
Air gap formation and integration using a patterning cap Grant 7,811,924 - Cui , et al. October 12, 2	2010-10-12
Frequency doubling using spacer mask Grant 7,807,578 - Bencher , et al. October 5, 2	2010-10-05
Techniques for the use of amorphous carbon (APF) for various etch and litho integration schemes Grant 7,718,081 - Liu , et al. May 18, 2	2010-05-18
Double Exposure Patterning With Carbonaceous Hardmask App 20090311635 - CHEN; HUI W. ; et al.	2009-12-17
Air Gap Formation And Integration Using A Patterning Cap App 20090309230 - CUI; ZHENJIANG ; et al.	2009-12-17
Boron Nitride And Boron-nitride Derived Materials Deposition Method App 20090263972 - Balseanu; Mihaela ; et al.	2009-10-22
Adhesion And Minimizing Oxidation On Electroless Co Alloy Films For Integration With Low K Inter-metal Dielectric And Etch Stop App 20090029544 - Fang; Hongbin ; et al.	2009-01-29
Self-aligned Pillar Patterning Using Multiple Spacer Masks App 20090017631 - Bencher; Christopher D.	2009-01-15
Frequency Tripling Using Spacer Mask Having Interposed Regions App 20080299465 - BENCHER; CHRISTOPHER D. ; et al.	2008-12-04
Double Patterning With A Double Layer Cap On Carbonaceous Hardmask App 20080299494 - BENCHER; CHRISTOPHER D. ; et al.	2008-12-04
Frequency Doubling Using Spacer Mask App 20080299776 - Bencher; Christopher D. ; et al.	2008-12-04
Absorber Layer For Dsa Processing App 20070243721 - AUTRYVE; LUC VAN ; et al.	2007-10-18
Adhesion and minimizing oxidation on electroless CO alloy films for integration with low K inter-metal dielectric and etch stop App 20070099417 - Fang; Hongbin ; et al.	2007-05-03
Techniques For The Use Of Amorphous Carbon (apf) For Various Etch And Litho Integration Schemes App 20060231524 - Liu; Wei ; et al.	2006-10-19
Nitrogen-free dielectric anti-reflective coating and hardmask Grant 7,105,460 - Kim , et al. September 12, 2	2006-09-12
Nitrogen-free dielectric anti-reflective coating and hardmask Grant 6,927,178 - Kim , et al. August 9, 2	2005-08-09
Conductive bi-layer e-beam resist with amorphous carbon Grant 6,913,868 - Bencher , et al. July 5, 2	2005-07-05
Nitrogen-free dielectric anti-reflective coating and hardmask App 20040214446 - Kim, Bok Hoen ; et al.	2004-10-28
Method of nitrogen doping of fluorinated silicate glass (FSG) while removing the photoresist layer Grant 6,797,646 - Ngai , et al. September 28, 2	2004-09-28
Airgap for semiconductor devices Grant 6,780,753 - Latchford , et al. August 24, 2	2004-08-24
Conductive bi-layer e-beam resist with amorphous carbon App 20040142281 - Bencher, Christopher D. ; et al.	2004-07-22
Nitrogen-free dielectric anti-reflective coating and hardmask App 20040009676 - Kim, Bok Hoen ; et al.	2004-01-15
Airgap For Semiconductor Devices App 20030224591 - Latchford, Ian S. ; et al.	2003-12-04
Nitrogen doping of FSG layer App 20020133258 - Ngai, Christopher ; et al.	2002-09-19

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