Patent | Date |
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Process chamber for etching low k and other dielectric films Grant 11,410,860 - Lubomirsky , et al. August 9, 2 | 2022-08-09 |
Method of patterning a low-k dielectric film Grant 11,302,519 - Nemani , et al. April 12, 2 | 2022-04-12 |
Process Chamber For Etching Low K And Other Dielectric Films App 20210134618 - Lubomirsky; Dmitry ;   et al. | 2021-05-06 |
Process chamber for etching low K and other dielectric films Grant 10,923,367 - Lubomirsky , et al. February 16, 2 | 2021-02-16 |
Process Chamber For Etching Low K And Other Dielectric Films App 20180358244 - LUBOMIRSKY; Dmitry ;   et al. | 2018-12-13 |
Process chamber for etching low K and other dielectric films Grant 10,096,496 - Lubomirsky , et al. October 9, 2 | 2018-10-09 |
Process Chamber For Etching Low K And Other Dielectric Films App 20170229325 - LUBOMIRSKY; Dmitry ;   et al. | 2017-08-10 |
Process chamber for etching low k and other dielectric films Grant 9,666,414 - Lubomirsky , et al. May 30, 2 | 2017-05-30 |
Non-intrusive measurement of a wafer DC self-bias in semiconductor processing equipment Grant 9,601,301 - Belostotskiy , et al. March 21, 2 | 2017-03-21 |
Temperature ramping using gas distribution plate heat Grant 9,368,370 - Belostotskiy , et al. June 14, 2 | 2016-06-14 |
Method Of Patterning A Low-k Dielectric Film App 20150380215 - Nemani; Srinivas D. ;   et al. | 2015-12-31 |
Method of patterning a low-k dielectric film Grant 9,165,783 - Nemani , et al. October 20, 2 | 2015-10-20 |
Temperature Ramping Using Gas Distribution Plate Heat App 20150262834 - BELOSTOTSKIY; Sergey G. ;   et al. | 2015-09-17 |
Method of patterning a silicon nitride dielectric film Grant 9,093,389 - Nemani , et al. July 28, 2 | 2015-07-28 |
Low Temperature Plasma Anneal Process For Sublimative Etch Processes App 20150064921 - NEMANI; Srinivas D. ;   et al. | 2015-03-05 |
Multizone Hollow Cathode Discharge System With Coaxial And Azimuthal Symmetry And With Consistent Central Trigger App 20150040829 - RAMASWAMY; Kartik ;   et al. | 2015-02-12 |
Method and system for etching plural layers on a workpiece including a lower layer containing an advanced memory material Grant 8,932,959 - Nemani , et al. January 13, 2 | 2015-01-13 |
Non-intrusive Measurement Of A Wafer Dc Self-bias In Semiconductor Processing Equipment App 20140375299 - Belostotskiy; Sergey G. ;   et al. | 2014-12-25 |
Near Surface Etch Selectivity Enhancement App 20140342569 - Zhu; Lina ;   et al. | 2014-11-20 |
Pressure Controller Configuration For Semiconductor Processing Applications App 20140311581 - Belostotskiy; Sergey G. ;   et al. | 2014-10-23 |
Multi-mode Etch Chamber Source Assembly App 20140262031 - BELOSTOTSKIY; Sergey G. ;   et al. | 2014-09-18 |
Method of patterning a low-k dielectric film Grant 8,802,572 - Nemani , et al. August 12, 2 | 2014-08-12 |
Method Of Patterning A Silicon Nitride Dielectric Film App 20140199851 - Nemani; Srinivas D. ;   et al. | 2014-07-17 |
Method And System For Etching Plural Layers On A Workpiece Including A Lower Layer Containing An Advanced Memory Material App 20140170856 - Nemani; Srinivas D. ;   et al. | 2014-06-19 |
Silicon oxide recess etch Grant 8,748,322 - Fung , et al. June 10, 2 | 2014-06-10 |
Method Of Patterning A Low-k Dielectric Film App 20140120726 - Nemani; Srinivas D. ;   et al. | 2014-05-01 |
Method Of Patterning A Low-k Dielectric Film App 20140017898 - Nemani; Srinivas D. ;   et al. | 2014-01-16 |
Temperature enhanced electrostatic chucking in plasma processing apparatus Grant 8,580,693 - Belostotskiy , et al. November 12, 2 | 2013-11-12 |
Process Chamber For Etching Low K And Other Dielectric Films App 20130105303 - LUBOMIRSKY; Dmitry ;   et al. | 2013-05-02 |
Temperature Enhanced Electrostatic Chucking In Plasma Processing Apparatus App 20120052690 - BELOSTOTSKIY; Sergey G. ;   et al. | 2012-03-01 |