BELEN; Rodolfo P.

Patent Applications and Registrations

Patent applications and USPTO patent grants for BELEN; Rodolfo P..The latest application filed is for "etch rate and critical dimension uniformity by selection of focus ring material".

Company Profile

0.3.9

BELEN; Rodolfo P. - San Francisco CA
Belen; Rodolfo P. - US

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Etch Rate And Critical Dimension Uniformity By Selection Of Focus Ring Material App 20170011891 - HAMMOND, IV; Edward P. ; et al.	2017-01-12
Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias Grant 8,236,133 - Katz , et al. August 7, 2	2012-08-07
Method to control uniformity using tri-zone showerhead Grant 8,066,895 - Belen , et al. November 29, 2	2011-11-29
Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process Grant 8,017,526 - Hammond, IV , et al. September 13, 2	2011-09-13
Plasma Reactor With Center-fed Multiple Zone Gas Distribution For Improved Uniformity Of Critical Dimension Bias App 20090272492 - Katz; Dan ; et al.	2009-11-05
Plasma Process Employing Multiple Zone Gas Distribution For Improved Uniformity Of Critical Dimension Bias App 20090275206 - Katz; Dan ; et al.	2009-11-05
Etch Rate And Critical Dimension Uniformity By Selection Of Focus Ring Material App 20090221150 - Hammond, IV; Edward P. ; et al.	2009-09-03
Method To Control Uniformity Using Tri-zone Showerhead App 20090218317 - BELEN; RODOLFO P. ; et al.	2009-09-03
Multiple Port Gas Injection System Utilized In A Semiconductor Processing System App 20090221149 - Hammond, IV; Edward P. ; et al.	2009-09-03
Method of controlling CD bias and CD microloading by changing the ceiling-to-wafer gap in a plasma reactor App 20090156011 - Belen; Rodolfo P. ; et al.	2009-06-18
Gate profile control through effective frequency of dual HF/VHF sources in a plasma etch process App 20090142930 - Hammond, IV; Edward P. ; et al.	2009-06-04
Plasma etch process for controlling line edge roughness App 20080149592 - Belen; Rodolfo P. ; et al.	2008-06-26

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