Beique; Genevieve
Patent Applications and Registrations
Patent applications and USPTO patent grants for Beique; Genevieve.The latest application filed is for "extreme ultraviolet (euv) lithography mask".
- Beique; Genevieve - Clifton Park NY
| Patent | Date |
|---|---|
| Extreme ultraviolet (EUV) lithography mask Grant 10,802,393 - Sun , et al. October 13, 2 | 2020-10-13 |
| Methods of identifying space within integrated circuit structure as mandrel space or non-mandrel space Grant 10,622,266 - Verduijn , et al. | 2020-04-14 |
| Multiple patterning with mandrel cuts formed using a block mask Grant 10,395,926 - Tang , et al. A | 2019-08-27 |
| Extreme Ultraviolet (euv) Lithography Mask App 20190113836 - SUN; Lei ; et al. | 2019-04-18 |
| Methods Of Identifying Space Within Integrated Circuit Structure As Mandrel Space Or Non-mandrel Space App 20180286681 - Verduijn; Erik A. ; et al. | 2018-10-04 |
| Self-aligned lithographic patterning Grant 10,056,292 - Law , et al. August 21, 2 | 2018-08-21 |
| Post spacer self-aligned cuts Grant 10,056,291 - Law , et al. August 21, 2 | 2018-08-21 |
| Post Spacer Self-aligned Cuts App 20180144976 - LAW; Shao Beng ; et al. | 2018-05-24 |
| Self-aligned Lithographic Patterning App 20180144979 - Law; Shao Beng ; et al. | 2018-05-24 |
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