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Patent applications and USPTO patent grants for Becknell; Alan F..The latest application filed is for "processes for monitoring the levels of oxygen and/or nitrogen species in a substantially oxygen and nitrogen-free plasma ashing process".
Patent | Date |
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Apparatus and plasma ashing process for increasing photoresist removal rate Grant 7,449,416 - Becknell , et al. November 11, 2 | 2008-11-11 |
Processes for monitoring the levels of oxygen and/or nitrogen species in a substantially oxygen and nitrogen-free plasma ashing process Grant 7,381,651 - Sakthivel , et al. June 3, 2 | 2008-06-03 |
Processes for monitoring the levels of oxygen and/or nitrogen species in a substantially oxygen and nitrogen-free plasma ashing process App 20070221620 - Sakthivel; Palanikumaran ;   et al. | 2007-09-27 |
Apparatus and plasma ashing process for increasing photoresist removal rate App 20060046470 - Becknell; Alan F. ;   et al. | 2006-03-02 |
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