BECKER; Moritz

Patent Applications and Registrations

Patent applications and USPTO patent grants for BECKER; Moritz.The latest application filed is for "projection exposure apparatus having a device for determining the concentration of atomic hydrogen".

Company Profile

8.14.15

BECKER; Moritz - Aalen DE
Becker; Moritz - Stuttgart DE
Becker; Moritz - Remscheid DE
Becker; Moritz - Cambridge N/A GB

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Projection Exposure Apparatus Having A Device For Determining The Concentration Of Atomic Hydrogen App 20220308457 - EHM; Dirk ; et al.	2022-09-29
Method for operating an optical apparatus, and optical apparatus Grant 11,307,505 - Becker , et al. April 19, 2	2022-04-19
Method for removing a contamination layer by an atomic layer etching process Grant 11,199,363 - Roozeboom , et al. December 14, 2	2021-12-14
Optical arrangement for EUV radiation with a shield for protection against the etching effect of a plasma Grant 11,137,687 - Liebaug , et al. October 5, 2	2021-10-05
Projection exposure system for semiconductor lithography, comprising elements for plasma conditioning Grant 10,712,677 - Ament , et al.	2020-07-14
Method For Operating An Optical Apparatus, And Optical Apparatus App 20200183292 - BECKER; Moritz ; et al.	2020-06-11
Optical Arrangement For Euv Radiation With A Shield For Protection Against The Etching Effect Of A Plasma App 20200166847 - LIEBAUG; Bjoern ; et al.	2020-05-28
Reflective optical element for EUV lithography Grant 10,649,340 - Ehm , et al.	2020-05-12
Method For Removing A Contamination Layer By An Atomic Layer Etching Process App 20200142327 - ROOZEBOOM; Fred ; et al.	2020-05-07
Method for determining the thickness of a contaminating layer and/or the type of contaminating material, optical element and EUV-lithography system Grant 10,627,217 - Ament , et al.	2020-04-21
Projection Exposure System For Semiconductor Lithography, Comprising Elements For Plasma Conditioning App 20190243258 - AMENT; Irene ; et al.	2019-08-08
Reflective Optical Element For Euv Lithography App 20190171108 - EHM; Dirk Heinrich ; et al.	2019-06-06
Reflective optical element Grant 10,061,205 - Ehm , et al. August 28, 2	2018-08-28
External heat engine device Grant 9,874,175 - Risla , et al. January 23, 2	2018-01-23
Method For Determining The Thickness Of A Contaminating Layer And/or The Type Of Contaminating Material, Optical Element And Euv-lithography System App 20170292830 - AMENT; Irene ; et al.	2017-10-12
Reflective Optical Element App 20170160639 - EHM; Dirk Heinrich ; et al.	2017-06-08
Improved External Heat Engine Device App 20160245225 - Risla; Harald Nes ; et al.	2016-08-25
Optical Arrangement, In Particular Plasma Light Source Or Euv Lithography System App 20160207078 - BECKER; Moritz ; et al.	2016-07-21
Evaluating detectability of information in authorization policies Grant 9,251,342 - Becker February 2, 2	2016-02-02
Delegation-based authorization Grant 9,160,738 - Becker October 13, 2	2015-10-13
Evaluating Detectability of Information in Authorization Policies App 20130031596 - Becker; Moritz	2013-01-31
Projection objective of a microlithographic projection exposure apparatus Grant 8,339,576 - Loering , et al. December 25, 2	2012-12-25
Projection Objective Of A Microlithographic Projection Exposure Apparatus App 20120281196 - Loering; Ulrich ; et al.	2012-11-08
State-updating authorization Grant 8,296,822 - Becker October 23, 2	2012-10-23
Delegation-Based Authorization App 20110296497 - Becker; Moritz	2011-12-01
State-Updating Authorization App 20110016507 - Becker; Moritz	2011-01-20

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.