Bayman; Atiye
Patent Applications and Registrations
Patent applications and USPTO patent grants for Bayman; Atiye.The latest application filed is for "process modulation to prevent structure erosion during gap fill".
- Bayman; Atiye - Palo Alto CA
| Patent | Date |
|---|---|
| Process modulation to prevent structure erosion during gap fill Grant 7,217,658 - Bayman , et al. May 15, 2 | 2007-05-15 |
| Dynamic modification of gap fill process characteristics Grant 7,176,039 - Papasouliotis , et al. February 13, 2 | 2007-02-13 |
| Gap fill for high aspect ratio structures Grant 7,067,440 - Bayman , et al. June 27, 2 | 2006-06-27 |
| Gap fill for high aspect ratio structures Grant 6,787,483 - Bayman , et al. September 7, 2 | 2004-09-07 |
| Gap fill for high aspect ratio structures Grant 6,596,654 - Bayman , et al. July 22, 2 | 2003-07-22 |
| Plasma etch process for single-crystal silicon with improved selectivity to silicon dioxide Grant 4,468,285 - Bayman , et al. August 28, 1 | 1984-08-28 |
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