BATZER; Rachel Patent Filings

Patent	Date
Integrated Showerhead With Thermal Control For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Plasma Film Deposition App 20210371982 - BATZER; Rachel ; et al.	2021-12-02
Integrated Showerhead With Improved Hole Pattern For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Plasma Film Deposition App 20210269918 - BATZER; Rachel ; et al.	2021-09-02
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition Grant 11,101,164 - Batzer , et al. August 24, 2	2021-08-24
Integrated showerhead with improved hole pattern for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition Grant 11,015,247 - Batzer , et al. May 25, 2	2021-05-25
Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition Grant 10,604,841 - Batzer , et al.	2020-03-31
Integrated Showerhead With Improved Hole Pattern For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remo App 20190177846 - BATZER; Rachel ; et al.	2019-06-13
Wafer Level Uniformity Control In Remote Plasma Film Deposition App 20180251893 - Hohn; Geoffrey ; et al.	2018-09-06
Integrated Showerhead With Thermal Control For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Plasma Film Deposition App 20180163305 - Batzer; Rachel ; et al.	2018-06-14

Patent

Date

Integrated Showerhead With Thermal Control For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Plasma Film Deposition
App 20210371982 - BATZER; Rachel ; et al.

2021-12-02

Integrated Showerhead With Improved Hole Pattern For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Plasma Film Deposition
App 20210269918 - BATZER; Rachel ; et al.

2021-09-02

Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
Grant 11,101,164 - Batzer , et al. August 24, 2

2021-08-24

Integrated showerhead with improved hole pattern for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
Grant 11,015,247 - Batzer , et al. May 25, 2

2021-05-25

Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition
Grant 10,604,841 - Batzer , et al.

2020-03-31

Integrated Showerhead With Improved Hole Pattern For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remo
App 20190177846 - BATZER; Rachel ; et al.

2019-06-13

Wafer Level Uniformity Control In Remote Plasma Film Deposition
App 20180251893 - Hohn; Geoffrey ; et al.

2018-09-06

Integrated Showerhead With Thermal Control For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Plasma Film Deposition
App 20180163305 - Batzer; Rachel ; et al.

2018-06-14

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BATZER; Rachel

Patent Applications and Registrations