Barnes; Jeffrey A.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Barnes; Jeffrey A..The latest application filed is for "use of non-oxidizing strong acids for the removal of ion-implanted resist".

Company Profile

4.18.30

Barnes; Jeffrey A. - Danielsville PA
Barnes; Jeffrey A. - Bethlehem CT
Barnes; Jeffrey A. - Bath PA
Barnes; Jeffrey A. - New Milford CT
Barnes; Jeffrey A. - Nazareth PA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Post chemical mechanical polishing formulations and method of use Grant 10,557,107 - Sun , et al. Feb	2020-02-11
Compositions and methods for selectively etching titanium nitride Grant 10,392,560 - Barnes , et al. A	2019-08-27
Use of non-oxidizing strong acids for the removal of ion-implanted resist Grant 10,347,504 - Bilodeau , et al. July 9, 2	2019-07-09
Ni:NiGe:Ge selective etch formulations and method of using same Grant 10,340,150 - Bilodeau , et al.	2019-07-02
Post-CMP removal using compositions and method of use Grant 10,176,979 - Liu , et al. J	2019-01-08
Use Of Non-oxidizing Strong Acids For The Removal Of Ion-implanted Resist App 20180240680 - Bilodeau; Steven ; et al.	2018-08-23
Composition and process for selectively etching metal nitrides Grant 9,831,088 - Chen , et al. November 28, 2	2017-11-28
Compositions And Methods For Selectively Etching Titanium Nitride App 20170260449 - BARNES; Jeffrey A. ; et al.	2017-09-14
Compositions and methods for selectively etching titanium nitride Grant 9,546,321 - Barnes , et al. January 17, 2	2017-01-17
Post Chemical Mechanical Polishing Formulations And Method Of Use App 20160340620 - SUN; Laisheng ; et al.	2016-11-24
Use Of Non-oxidizing Strong Acids For The Removal Of Ion-implanted Resist App 20160322232 - BILODEAU; Steven ; et al.	2016-11-03
Ni:nige:ge Selective Etch Formulations And Method Of Using Same App 20160314990 - BILODEAU; Steven ; et al.	2016-10-27
Non-amine Post-cmp Composition And Method Of Use App 20160237385 - BARNES; Jeffrey A. ; et al.	2016-08-18
Non-amine post-CMP composition and method of use Grant 9,340,760 - Barnes , et al. May 17, 2	2016-05-17
Copper Cleaning And Protection Formulations App 20160075971 - LIU; Jun ; et al.	2016-03-17
Copper Cleaning And Protection Formulations App 20160032221 - Barnes; Jeffrey A. ; et al.	2016-02-04
Post-cmp Removal Using Compositions And Method Of Use App 20160020087 - LIU; Jun ; et al.	2016-01-21
Aqueous Cleaner For The Removal Of Post-etch Residues App 20150307818 - Barnes; Jeffrey A. ; et al.	2015-10-29
Copper cleaning and protection formulations Grant 9,074,170 - Barnes , et al. July 7, 2	2015-07-07
Aqueous cleaner for the removal of post-etch residues Grant 9,063,431 - Barnes , et al. June 23, 2	2015-06-23
Formulations For Wet Etching Nipt During Silicide Fabrication App 20150162213 - Chen; Tianniu ; et al.	2015-06-11
Compositions And Methods For Selectively Etching Titanium Nitride App 20150027978 - Barnes; Jeffrey A. ; et al.	2015-01-29
Non-amine Post-cmp Composition And Method Of Use App 20140352739 - BARNES; Jeffrey A. ; et al.	2014-12-04
Formulations For The Removal Of Particles Generated By Cerium-containing Solutions App 20140318584 - Cooper; Emanuel I. ; et al.	2014-10-30
Non-amine post-CMP composition and method of use Grant 8,754,021 - Barnes , et al. June 17, 2	2014-06-17
Composition And Process For Selectively Etching Metal Nitrides App 20140038420 - Chen; Tianniu ; et al.	2014-02-06
Aqueous Cleaner For The Removal Of Post-etch Residues App 20130296214 - Barnes; Jeffrey A. ; et al.	2013-11-07
Copper Cleaning And Protection Formulations App 20120283163 - Barnes; Jeffrey A. ; et al.	2012-11-08
Non-amine Post-cmp Composition And Method Of Use App 20120028870 - Barnes; Jeffrey A. ; et al.	2012-02-02
Compositions for processing of semiconductor substrates Grant 7,922,823 - Walker , et al. April 12, 2	2011-04-12
Low Ph Post-cmp Residue Removal Composition And Method Of Use App 20100286014 - Barnes; Jeffrey A.	2010-11-11
Compositions For Processing Of Semiconductor Substrates App 20100056409 - Walker; Elizabeth ; et al.	2010-03-04
Aqueous Cleaner With Low Metal Etch Rate App 20080200361 - Walker; Elizabeth L. ; et al.	2008-08-21
Aqueous cleaner with low metal etch rate comprising alkanolamine and tetraalkylammonium hydroxide Grant 7,365,045 - Walker , et al. April 29, 2	2008-04-29
Copper passivating post-chemical mechanical polishing cleaning composition and method of use App 20080076688 - Barnes; Jeffrey A. ; et al.	2008-03-27
Aqueous cleaner with low metal etch rate App 20060229221 - Walker; Elizabeth L. ; et al.	2006-10-12
Aqueous cleaner with low metal etch rate App 20060148666 - Peters; Darryl W. ; et al.	2006-07-06
Method for monitoring surface treatment of copper containing devices App 20050145311 - Walker, Elizabeth L. ; et al.	2005-07-07

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