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Post chemical mechanical polishing formulations and method of use Grant 10,557,107 - Sun , et al. Feb | 2020-02-11 |
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Composition and process for selectively etching metal nitrides Grant 9,831,088 - Chen , et al. November 28, 2 | 2017-11-28 |
Compositions And Methods For Selectively Etching Titanium Nitride App 20170260449 - BARNES; Jeffrey A. ;   et al. | 2017-09-14 |
Compositions and methods for selectively etching titanium nitride Grant 9,546,321 - Barnes , et al. January 17, 2 | 2017-01-17 |
Post Chemical Mechanical Polishing Formulations And Method Of Use App 20160340620 - SUN; Laisheng ;   et al. | 2016-11-24 |
Use Of Non-oxidizing Strong Acids For The Removal Of Ion-implanted Resist App 20160322232 - BILODEAU; Steven ;   et al. | 2016-11-03 |
Ni:nige:ge Selective Etch Formulations And Method Of Using Same App 20160314990 - BILODEAU; Steven ;   et al. | 2016-10-27 |
Non-amine Post-cmp Composition And Method Of Use App 20160237385 - BARNES; Jeffrey A. ;   et al. | 2016-08-18 |
Non-amine post-CMP composition and method of use Grant 9,340,760 - Barnes , et al. May 17, 2 | 2016-05-17 |
Copper Cleaning And Protection Formulations App 20160075971 - LIU; Jun ;   et al. | 2016-03-17 |
Copper Cleaning And Protection Formulations App 20160032221 - Barnes; Jeffrey A. ;   et al. | 2016-02-04 |
Post-cmp Removal Using Compositions And Method Of Use App 20160020087 - LIU; Jun ;   et al. | 2016-01-21 |
Aqueous Cleaner For The Removal Of Post-etch Residues App 20150307818 - Barnes; Jeffrey A. ;   et al. | 2015-10-29 |
Copper cleaning and protection formulations Grant 9,074,170 - Barnes , et al. July 7, 2 | 2015-07-07 |
Aqueous cleaner for the removal of post-etch residues Grant 9,063,431 - Barnes , et al. June 23, 2 | 2015-06-23 |
Formulations For Wet Etching Nipt During Silicide Fabrication App 20150162213 - Chen; Tianniu ;   et al. | 2015-06-11 |
Compositions And Methods For Selectively Etching Titanium Nitride App 20150027978 - Barnes; Jeffrey A. ;   et al. | 2015-01-29 |
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Formulations For The Removal Of Particles Generated By Cerium-containing Solutions App 20140318584 - Cooper; Emanuel I. ;   et al. | 2014-10-30 |
Non-amine post-CMP composition and method of use Grant 8,754,021 - Barnes , et al. June 17, 2 | 2014-06-17 |
Composition And Process For Selectively Etching Metal Nitrides App 20140038420 - Chen; Tianniu ;   et al. | 2014-02-06 |
Aqueous Cleaner For The Removal Of Post-etch Residues App 20130296214 - Barnes; Jeffrey A. ;   et al. | 2013-11-07 |
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Non-amine Post-cmp Composition And Method Of Use App 20120028870 - Barnes; Jeffrey A. ;   et al. | 2012-02-02 |
Compositions for processing of semiconductor substrates Grant 7,922,823 - Walker , et al. April 12, 2 | 2011-04-12 |
Low Ph Post-cmp Residue Removal Composition And Method Of Use App 20100286014 - Barnes; Jeffrey A. | 2010-11-11 |
Compositions For Processing Of Semiconductor Substrates App 20100056409 - Walker; Elizabeth ;   et al. | 2010-03-04 |
Aqueous Cleaner With Low Metal Etch Rate App 20080200361 - Walker; Elizabeth L. ;   et al. | 2008-08-21 |
Aqueous cleaner with low metal etch rate comprising alkanolamine and tetraalkylammonium hydroxide Grant 7,365,045 - Walker , et al. April 29, 2 | 2008-04-29 |
Copper passivating post-chemical mechanical polishing cleaning composition and method of use App 20080076688 - Barnes; Jeffrey A. ;   et al. | 2008-03-27 |
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Method for monitoring surface treatment of copper containing devices App 20050145311 - Walker, Elizabeth L. ;   et al. | 2005-07-07 |