Barna; Gabriel G.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Barna; Gabriel G..The latest application filed is for "soi wafer with cooling channels and a method of manufacture thereof".

Company Profile

0.11.3

Barna; Gabriel G. - Dallas TX
Barna; Gabriel G. - Richardson TX

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method to manufacture silicon quantum islands and single-electron devices Grant 7,939,398 - Wasshuber , et al. May 10, 2	2011-05-10
SOI wafer with cooling channels and a method of manufacture thereof Grant 7,344,957 - Barna March 18, 2	2008-03-18
Method of fabricating a combined fully-depleted silicon-on-insulator (FD-SOI) and partially-depleted silicon-on-insulator (PD-SOI) devices Grant 7,198,993 - Tigelaar , et al. April 3, 2	2007-04-03
SOI wafer with cooling channels and a method of manufacture thereof App 20060160327 - Barna; Gabriel G.	2006-07-20
Combined fully-depleted silicon-on-insulator (FD-SOI) and partially-depleted silicon-on-insulator (PD-SOI)devices App 20060128074 - Tigelaar; Howard L. ; et al.	2006-06-15
Method for improving silicon-on-insulator (SOI) film uniformity on a semiconductor wafer Grant 6,875,656 - Barna April 5, 2	2005-04-05
Method for improving silicon-on-insulator (SOI) film uniformity on a semiconductor wafer App 20040232489 - Barna, Gabriel G.	2004-11-25
Plasma etching with fast endpoint detector Grant 6,104,487 - Buck , et al. August 15, 2	2000-08-15
Virtual sensor based monitoring and fault detection/classification system and method for semiconductor processing equipment Grant 5,864,773 - Barna , et al. January 26, 1	1999-01-26
Method and apparatus of etching a clean trench in a semiconductor material Grant 5,512,130 - Barna , et al. April 30, 1	1996-04-30
Measurement of gas leaks into gas lines of a plasma reactor Grant 5,326,975 - Barna July 5, 1	1994-07-05
Method for measuring plasma properties in semiconductor processing Grant 4,859,277 - Barna , et al. August 22, 1	1989-08-22
Process and apparatus for detecting aberrations in production process operations Grant 4,847,792 - Barna , et al. July 11, 1	1989-07-11
Gas sensing electrode system employing hydrophilic wick Grant 3,886,058 - Barna May 27, 1	1975-05-27

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.