| Patent | Date |
|---|
All-in-one Bioreactor For Therapeutic Cells Manufacturing
App 20220177821 - BANNA; Samer ; et al. | 2022-06-09 |
Gas Hub For Plasma Reactor
App 20220157562 - Rozenzon; Yan ; et al. | 2022-05-19 |
Methods And Apparatus For Forming Antimicrobial Film
App 20220132859 - SOWWAN; Mukhles ; et al. | 2022-05-05 |
Methods And Apparatus For Cell Development
App 20220135921 - SOWWAN; Mukhles ; et al. | 2022-05-05 |
Automated Closed System For Cell Therapy Manufacturing
App 20220127558 - SOWWAN; Mukhles ; et al. | 2022-04-28 |
Methods And Apparatus For Cell And Gene Therapy At Point-of-care Location
App 20220125656 - BANNA; Samer ; et al. | 2022-04-28 |
High Throughput Compact Microfluidic Cell Counter
App 20220126291 - SOWWAN; Mukhles ; et al. | 2022-04-28 |
Plasma reactor with highly symmetrical four-fold gas injection
Grant 11,244,811 - Rozenzon , et al. February 8, 2 | 2022-02-08 |
High-resolution three-dimensional profiling of features in advanced semiconductor devices in a non-destructive manner using electron beam scanning electron microscopy
Grant 11,139,142 - Yuli , et al. October 5, 2 | 2021-10-05 |
Nozzle for multi-zone gas injection assembly
Grant 11,139,150 - Rozenzon , et al. October 5, 2 | 2021-10-05 |
Particle detection for substrate processing
Grant 11,119,051 - Egan , et al. September 14, 2 | 2021-09-14 |
Adaptive Control Of Variability In Device Performance In Advanced Semiconductor Processes
App 20210175104 - BANNA; Samer ; et al. | 2021-06-10 |
Use Of Electron Beam Scanning Electron Microscopy For Characterization Of A Sidewall Occluded From Line-of-sight Of The Electron Beam
App 20210090852 - YULI; Ofer ; et al. | 2021-03-25 |
Adaptive chamber matching in advanced semiconductor process control
Grant 10,955,832 - Banna March 23, 2 | 2021-03-23 |
Use of electron beam scanning electron microscopy for characterization of a sidewall occluded from line-of-sight of the electron beam
Grant 10,943,763 - Yuli , et al. March 9, 2 | 2021-03-09 |
Predictive spatial digital design of experiment for advanced semiconductor process optimization and control
Grant 10,929,586 - Banna , et al. February 23, 2 | 2021-02-23 |
Adaptive control of wafer-to-wafer variability in device performance in advanced semiconductor processes
Grant 10,930,531 - Banna , et al. February 23, 2 | 2021-02-23 |
Metrology system for substrate deformation measurement
Grant 10,923,371 - Vaez-Iravani , et al. February 16, 2 | 2021-02-16 |
Particle Detection For Substrate Processing
App 20210018449 - EGAN; Todd ; et al. | 2021-01-21 |
High-resolution Three-dimensional Profiling Of Features In Advanced Semiconductor Devices In A Non-destructive Manner Using Electron Beam Scanning Electron Microscopy
App 20200373120 - YULI; Ofer ; et al. | 2020-11-26 |
Particle detection for substrate processing
Grant 10,845,317 - Egan , et al. November 24, 2 | 2020-11-24 |
Process kit components for use with an extended and independent RF powered cathode substrate for extreme edge tunability
Grant 10,825,708 - Todorow , et al. November 3, 2 | 2020-11-03 |
Adaptive Chamber Matching In Advanced Semiconductor Process Control
App 20200333774 - BANNA; Samer | 2020-10-22 |
Predictive Spatial Digital Design Of Experiment For Advanced Semiconductor Process Optimization And Control
App 20200279066 - BANNA; Samer ; et al. | 2020-09-03 |
Adaptive chamber matching in advanced semiconductor process control
Grant 10,705,514 - Banna | 2020-07-07 |
Predictive spatial digital design of experiment for advanced semiconductor process optimization and control
Grant 10,657,214 - Banna , et al. | 2020-05-19 |
Adaptive Control Of Wafer-to-wafer Variability In Device Performance In Advanced Semiconductor Processes
App 20200111689 - BANNA; Samer ; et al. | 2020-04-09 |
Predictive Spatial Digital Design Of Experiment For Advanced Semiconductor Process Optimization And Control
App 20200110852 - BANNA; Samer ; et al. | 2020-04-09 |
Adaptive Chamber Matching In Advanced Semiconductor Process Control
App 20200110390 - BANNA; Samer | 2020-04-09 |
Inductively coupled plasma apparatus
Grant 10,573,493 - Todorow , et al. Feb | 2020-02-25 |
Power deposition control in inductively coupled plasma (ICP) reactors
Grant 10,553,398 - Banna , et al. Fe | 2020-02-04 |
Nozzle For Multi-zone Gas Injection Assembly
App 20190385824 - Rozenzon; Yan ; et al. | 2019-12-19 |
Metrology systems with multiple derivative modules for substrate stress and deformation measurement
Grant 10,510,624 - Vaez-Iravani , et al. Dec | 2019-12-17 |
Flexible mode scanning optical microscopy and inspection system
Grant 10,422,984 - Banna , et al. Sept | 2019-09-24 |
Side gas injection kit for multi-zone gas injection assembly
Grant 10,410,841 - Rozenzon , et al. Sept | 2019-09-10 |
Process Kit Components For Use With An Extended And Independent Rf Powered Cathode Substrate For Extreme Edge Tunability
App 20190221463 - TODOROW; VALENTIN ; et al. | 2019-07-18 |
Multi-zone heated ESC with independent edge zones
Grant 10,332,772 - Tantiwong , et al. | 2019-06-25 |
Plasma Reactor with Highly Symmetrical Four-Fold Gas Injection
App 20190122861 - Rozenzon; Yan ; et al. | 2019-04-25 |
High efficiency triple-coil inductively coupled plasma source with phase control
Grant 10,271,416 - Banna , et al. | 2019-04-23 |
Metrology System For Substrate Deformation Measurement
App 20190074201 - VAEZ-IRAVANI; Mehdi ; et al. | 2019-03-07 |
Particle Detection For Substrate Processing
App 20190072497 - EGAN; Todd ; et al. | 2019-03-07 |
Metrology Systems For Substrate Stress And Deformation Measurement
App 20190057910 - VAEZ-IRAVANI; Mehdi ; et al. | 2019-02-21 |
Plasma reactor with highly symmetrical four-fold gas injection
Grant 10,163,606 - Rozenzon , et al. Dec | 2018-12-25 |
Flexible Mode Scanning Optical Microscopy And Inspection System
App 20180329189 - Banna; Samer ; et al. | 2018-11-15 |
Multi-Zone Gas Injection Assembly with Azimuthal and Radial Distribution Control
App 20180269038 - Rozenzon; Yan ; et al. | 2018-09-20 |
Multi-zone gas injection assembly with azimuthal and radial distribution control
Grant 10,008,368 - Rozenzon , et al. June 26, 2 | 2018-06-26 |
Method and apparatus for reducing radiation induced change in semiconductor structures
Grant 9,978,620 - Dickerson , et al. May 22, 2 | 2018-05-22 |
High efficiency inductively coupled plasma source with customized RF shield for plasma profile control
Grant 9,945,033 - Banna , et al. April 17, 2 | 2018-04-17 |
Electromagnetic dipole for plasma density tuning in a substrate processing chamber
Grant 9,779,953 - Aubuchon , et al. October 3, 2 | 2017-10-03 |
Method And Apparatus For Reducing Radiation Induced Change In Semiconductor Structures
App 20170271181 - DICKERSON; Gary E. ; et al. | 2017-09-21 |
Electrostatic chuck with concentric cooling base
Grant 9,659,803 - Lubomirsky , et al. May 23, 2 | 2017-05-23 |
Method and apparatus for reducing radiation induced change in semiconductor structures
Grant 9,646,893 - Dickerson , et al. May 9, 2 | 2017-05-09 |
Tunable Gas Delivery Assembly With Internal Diffuser And Angular Injection
App 20170110292 - KNYAZIK; Vladimir ; et al. | 2017-04-20 |
Tunable gas delivery assembly with internal diffuser and angular injection
Grant 9,536,710 - Knyazik , et al. January 3, 2 | 2017-01-03 |
Multiple zone coil antenna with plural radial lobes
Grant 9,472,378 - Knyazik , et al. October 18, 2 | 2016-10-18 |
Method And Apparatus For Reducing Radiation Induced Change In Semiconductor Structures
App 20160276227 - DICKERSON; Gary E. ; et al. | 2016-09-22 |
Self-bias calculation on a substrate in a process chamber with bias power for single or multiple frequencies
Grant 9,406,540 - Leray , et al. August 2, 2 | 2016-08-02 |
Inductively Coupled Plasma Apparatus
App 20160196953 - TODOROW; VALENTIN N. ; et al. | 2016-07-07 |
Coil antenna with plural radial lobes
Grant 9,312,104 - Knyazik , et al. April 12, 2 | 2016-04-12 |
Substrate support with advanced edge control provisions
Grant 9,287,147 - Tantiwong , et al. March 15, 2 | 2016-03-15 |
Methods for reducing etch nonuniformity in the presence of a weak magnetic field in an inductively coupled plasma reactor
Grant 9,257,265 - Garcia De Gorordo , et al. February 9, 2 | 2016-02-09 |
Plasma Reactor With Highly Symmetrical Four-fold Gas Injection
App 20150371826 - Rozenzon; Yan ; et al. | 2015-12-24 |
Multi-zone Gas Injection Assembly With Azimuthal And Radial Distribution Control
App 20150371831 - Rozenzon; Yan ; et al. | 2015-12-24 |
Multi-zone Heated Esc With Independent Edge Zones
App 20150364354 - TANTIWONG; Kyle ; et al. | 2015-12-17 |
High Efficiency Inductively Coupled Plasma Source With Customized Rf Shield For Plasma Profile Control
App 20150191823 - Banna; Samer ; et al. | 2015-07-09 |
Extreme Edge And Skew Control In Icp Plasma Reactor
App 20150181684 - BANNA; Samer ; et al. | 2015-06-25 |
Coil Antenna With Plural Radial Lobes
App 20150097478 - Knyazik; Vladimir ; et al. | 2015-04-09 |
Multiple Zone Coil Antenna With Plural Radial Lobes
App 20150097479 - Knyazik; Vladimir ; et al. | 2015-04-09 |
Electromagnetic Dipole For Plasma Density Tuning In A Substrate Processing Chamber
App 20150087157 - AUBUCHON; JOSEPH F. ; et al. | 2015-03-26 |
Extended and independent RF powered cathode substrate for extreme edge tunability
Grant 8,988,848 - Todorow , et al. March 24, 2 | 2015-03-24 |
Power Deposition Control In Inductively Coupled Plasma (icp) Reactors
App 20150068682 - BANNA; SAMER ; et al. | 2015-03-12 |
Synchronous embedded radio frequency pulsing for plasma etching
Grant 8,974,684 - Banna , et al. March 10, 2 | 2015-03-10 |
Embedded test structure for trimming process control
Grant 8,956,886 - Banna , et al. February 17, 2 | 2015-02-17 |
Electrostatic chuck with advanced RF and temperature uniformity
Grant 8,937,800 - Lubomirsky , et al. January 20, 2 | 2015-01-20 |
Inductively coupled plasma source with phase control
Grant 8,933,628 - Banna , et al. January 13, 2 | 2015-01-13 |
Method For Fast And Repeatable Plasma Ignition And Tuning In Plasma Chambers
App 20140367043 - BISHARA; WAHEB ; et al. | 2014-12-18 |
Substrate Support With Advanced Edge Control Provisions
App 20140265089 - TANTIWONG; Kyle ; et al. | 2014-09-18 |
Mu Metal Shield Cover
App 20140262044 - YOUSIF; IMAD ; et al. | 2014-09-18 |
Embedded Test Structure For Trimming Process Control
App 20140273297 - BANNA; SAMER ; et al. | 2014-09-18 |
Methods For Reducing Etch Nonuniformity In The Presence Of A Weak Magnetic Field In An Inductively Coupled Plasma Reactor
App 20140273304 - GARCIA DE GORORDO; ALVARO ; et al. | 2014-09-18 |
Tunable Gas Delivery Assembly With Internal Diffuser And Angular Injection
App 20140237840 - KNYAZIK; Vladimir ; et al. | 2014-08-28 |
Skew Elimination And Control In A Plasma Enhanced Substrate Processing Chamber
App 20140209244 - BANNA; SAMER ; et al. | 2014-07-31 |
Electrostatic Chuck With Concentric Cooling Base
App 20140209596 - LUBOMIRSKY; Dmitry ; et al. | 2014-07-31 |
Apparatus for VHF impedance match tuning
Grant 8,578,879 - Ramaswamy , et al. November 12, 2 | 2013-11-12 |
Electrostatic Chuck With Advanced Rf And Temperature Uniformity
App 20130279066 - Lubomirsky; Dmitry ; et al. | 2013-10-24 |
Methods for calibrating RF power applied to a plurality of RF coils in a plasma processing system
Grant 8,492,980 - Banna , et al. July 23, 2 | 2013-07-23 |
Extended And Independent Rf Powered Cathode Substrate For Extreme Edge Tunability
App 20130155568 - TODOROW; VALENTIN ; et al. | 2013-06-20 |
Process Kit Components For Use With An Extended And Independent Rf Powered Cathode Substrate For Extreme Edge Tunability
App 20130154175 - TODOROW; VALENTIN ; et al. | 2013-06-20 |
Inductively Coupled Plasma Apparatus
App 20130134129 - TODOROW; VALENTIN N. ; et al. | 2013-05-30 |
Inductively Coupled Plasma Soure With Phase Control
App 20130106286 - BANNA; SAMER ; et al. | 2013-05-02 |
Synchronous Embedded Radio Frequency Pulsing For Plasma Etching
App 20130105443 - BANNA; SAMER ; et al. | 2013-05-02 |
High Efficiency Triple-coil Inductively Coupled Plasma Source With Phase Control
App 20130105086 - BANNA; SAMER ; et al. | 2013-05-02 |
Electrostatic Chuck
App 20130107415 - BANNA; SAMER ; et al. | 2013-05-02 |
Plasma Reactor With Chamber Wall Temperature Control
App 20130105085 - YOUSIF; IMAD ; et al. | 2013-05-02 |
Self-bias Calculation On A Substrate In A Process Chamber With Bias Power For Single Or Multiple Frequencies
App 20130110435 - LERAY; GARY ; et al. | 2013-05-02 |
Inductively coupled plasma reactor having RF phase control and methods of use thereof
Grant 8,368,308 - Banna , et al. February 5, 2 | 2013-02-05 |
Plasma reactor with uniform process rate distribution by improved RF ground return path
Grant 8,360,003 - Nguyen , et al. January 29, 2 | 2013-01-29 |
Field enhanced inductively coupled plasma (Fe-ICP) reactor
Grant 8,299,391 - Todorow , et al. October 30, 2 | 2012-10-30 |
Methods For Calibrating Rf Power Applied To A Plurality Of Rf Coils In A Plasma Processing System
App 20120104950 - BANNA; SAMER ; et al. | 2012-05-03 |
Rf Feed Structure For Plasma Processing
App 20110094683 - CHEN; ZHIGANG ; et al. | 2011-04-28 |
Inductively Coupled Plasma Apparatus
App 20110094994 - TODOROW; VALENTIN N. ; et al. | 2011-04-28 |
Dual Mode Inductively Coupled Plasma Reactor With Adjustable Phase Coil Assembly
App 20110097901 - BANNA; SAMER ; et al. | 2011-04-28 |
Apparatus For Vhf Impedance Match Tuning
App 20110023780 - RAMASWAMY; KARTIK ; et al. | 2011-02-03 |
Plasma Reactor With Uniform Process Rate Distribution By Improved Rf Ground Return Path
App 20110005685 - Nguyen; Andrew ; et al. | 2011-01-13 |
Inductively Coupled Plasma Reactor Having Rf Phase Control And Methods Of Use Thereof
App 20100227420 - BANNA; SAMER ; et al. | 2010-09-09 |
Field Enhanced Inductively Coupled Plasma (fe-icp) Reactor
App 20100025384 - TODOROW; VALENTIN N. ; et al. | 2010-02-04 |
Method And Apparatus For Pulsed Plasma Processing Using A Time Resolved Tuning Scheme For Rf Power Delivery
App 20090284156 - BANNA; SAMER ; et al. | 2009-11-19 |
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