Banba; Toshio

Patent Applications and Registrations

Patent applications and USPTO patent grants for Banba; Toshio.The latest application filed is for "positive photosensitive resin composition for spray coating and method for producing through electrode using the same".

Company Profile

0.19.14

Banba; Toshio - Tokyo JP
Banba; Toshio - Tochigi JP
Banba; Toshio - Shinagawa-ku JP
Banba; Toshio - Utsunomiya JP
Banba, Toshio - Utsunomiya-shi JP
Banba; Toshio - Yokohama JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Positive photosensitive resin composition for spray coating and method for producing through electrode using the same Grant 9,005,876 - Orihara , et al. April 14, 2	2015-04-14
Positive Photosensitive Resin Composition For Spray Coating And Method For Producing Through Electrode Using The Same App 20140113448 - ORIHARA; Hideki ; et al.	2014-04-24
Positive photosensitive resin composition, cured film, protective film, interlayer insulating film, and semiconductor device and display element using the same Grant 8,530,119 - Hirano , et al. September 10, 2	2013-09-10
Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device Grant 8,309,280 - Banba November 13, 2	2012-11-13
Process for producing semiconductor device Grant 8,198,006 - Banba June 12, 2	2012-06-12
Positive Photosensitive Resin Composition, Cured Film, Protective Film, Interlayer Insulating Film, And Semiconductor Device And Display Element Using The Same App 20120100484 - Hirano; Takashi ; et al.	2012-04-26
Positive photosensitive resin composition, and semiconductor device and display therewith Grant 8,080,350 - Banba , et al. December 20, 2	2011-12-20
Positive Photosensitive Resin Composition For Spray Coating And Method For Producing Through Electrode Using The Same App 20110200937 - Orihara; Hideki ; et al.	2011-08-18
Positive-type Photosensitive Resin Composition, Cured Film, Protective Film, Insulating Film, And Semiconductor Device App 20100239977 - Banba; Toshio	2010-09-23
Positive Photosensitive Resin Composition For Spray Coating, Method For Forming Cured Film Using The Same, Cured Film, And Semiconductor Device App 20100193971 - Banba; Toshio ; et al.	2010-08-05
Process For Producing Semiconductor Device App 20100183985 - Banba; Toshio	2010-07-22
Positive-type photosensitive resin composition, cured film, protecting film, insulating film and semiconductor device and display device using these films Grant 7,678,514 - Sugiyama , et al. March 16, 2	2010-03-16
Positive Photosensitive Resin Composition, Cured Layer, Protecting Layer, Insulating Layer And Semiconductor Device And Display Therewith App 20090170026 - SUGIYAMA; Hiromichi ; et al.	2009-07-02
Positive Photosensitive Resin Composition, and Semiconductor Device and Display Therewith App 20090166818 - Banba; Toshio ; et al.	2009-07-02
Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device Grant 7,368,205 - Banba , et al. May 6, 2	2008-05-06
Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device Grant 7,361,445 - Banba , et al. April 22, 2	2008-04-22
Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device Grant 7,238,455 - Banba , et al. July 3, 2	2007-07-03
Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semicoductor device, display device, and method for producing the semiconductor device and the display device App 20050266334 - Banba, Toshio ; et al.	2005-12-01
Positive photosensitive resin compositions and semiconductor device Grant 6,927,013 - Banba , et al. August 9, 2	2005-08-09
Polyamide resin, positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device App 20050031994 - Banba, Toshio ; et al.	2005-02-10
Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device App 20040259020 - Banba, Toshio ; et al.	2004-12-23
Positive photosensitive resin compositions and semiconductor device App 20040146801 - Banba, Toshio ; et al.	2004-07-29
Process for producing a semiconductor device Grant 6,613,699 - Banba , et al. September 2, 2	2003-09-02
Positive photosensitive resin composition Grant 6,607,865 - Makabe , et al. August 19, 2	2003-08-19
Process for producing a semiconductor device App 20030036292 - Banba, Toshio ; et al.	2003-02-20
Positive photosensitive resin composition App 20020119389 - Makabe, Hiroaki ; et al.	2002-08-29
Semiconductor device using positive photosensitive resin composition and process for preparation thereof Grant 6,235,436 - Hirano , et al. May 22, 2	2001-05-22
Method for the pattern-processing of photosensitive resin composition Grant 6,207,356 - Banba , et al. March 27, 2	2001-03-27
Positive type photosensitive resin composition and semiconductor device using the same Grant 6,071,666 - Hirano , et al. June 6, 2	2000-06-06
Photosensitive polyimide resin composition containing a stabilizer and method for formation of relief pattern using same Grant 5,756,260 - Sashida , et al. May 26, 1	1998-05-26
Process for producing photosensitive resin Grant 5,648,451 - Sashida , et al. July 15, 1	1997-07-15
Positive photo-sensitive resin composition comprising a photosensitive polybenzoxazole or a mixture of a polybenzoxazole, an organic solvent soluble polymer and a diazoquinone and/or a dihydropyridine compound Grant 5,449,584 - Banba , et al. September 12, 1	1995-09-12

uspto.report is an independent third-party trademark research tool that is not affiliated, endorsed, or sponsored by the United States Patent and Trademark Office (USPTO) or any other governmental organization. The information provided by uspto.report is based on publicly available data at the time of writing and is intended for informational purposes only.

While we strive to provide accurate and up-to-date information, we do not guarantee the accuracy, completeness, reliability, or suitability of the information displayed on this site. The use of this site is at your own risk. Any reliance you place on such information is therefore strictly at your own risk.

All official trademark data, including owner information, should be verified by visiting the official USPTO website at www.uspto.gov. This site is not intended to replace professional legal advice and should not be used as a substitute for consulting with a legal professional who is knowledgeable about trademark law.