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name:-0.013090133666992
name:-0.00052380561828613
Ban; Cozy Patent Filings

Ban; Cozy

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ban; Cozy.The latest application filed is for "plating apparatus and plating method, and method of manufacturing semiconductor device".

Company Profile
0.10.1
  • Ban; Cozy - Tokyo JP
  • Ban; Cozy - Chiyoda-ku JP
  • Ban; Cozy - Hyogo JP
  • Ban; Cozy - Itami JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
High-temperature ultrapure water production apparatus and liquid medicine preparation apparatus equipped with the production apparatus
Grant 6,562,205 - Ban , et al. May 13, 2
2003-05-13
Plating apparatus and plating method, and method of manufacturing semiconductor device
App 20030006135 - Ban, Cozy
2003-01-09
Method and apparatus for removing contaminants from the surface of a semiconductor wafer
Grant 6,410,454 - Muranaka , et al. June 25, 2
2002-06-25
Method of forming tungsten silicide film, method of fabricating semiconductor devices and semiconductor manufactured thereby
Grant 6,221,771 - Ban , et al. April 24, 2
2001-04-24
Semiconductor workpiece cleaning method and apparatus
Grant 6,145,519 - Konishi , et al. November 14, 2
2000-11-14
Semiconductor manufacturing non-processing apparatuses with storage equipment
Grant 6,131,052 - Ban , et al. October 10, 2
2000-10-10
Semiconductor nitride film etching system
Grant 6,001,215 - Ban December 14, 1
1999-12-14
Drying apparatus for processing surface of substrate
Grant 5,956,859 - Matsumoto , et al. September 28, 1
1999-09-28
Method for producing pure water
Grant 5,554,295 - Ban , et al. September 10, 1
1996-09-10
Apparatus and method for producing ultrapure water and method of controlling the apparatus
Grant 5,246,586 - Ban , et al. September 21, 1
1993-09-21
Device for and method of producing hyperfine frozen particles
Grant 5,216,890 - Ban , et al. June 8, 1
1993-06-08

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