Patent | Date |
---|
Low-k films Grant 11,371,144 - Zhang , et al. June 28, 2 | 2022-06-28 |
Selective deposition of SiCON by plasma ALD Grant 11,359,281 - Zhang , et al. June 14, 2 | 2022-06-14 |
Method of forming self-aligned via Grant 11,270,914 - Parikh , et al. March 8, 2 | 2022-03-08 |
Low-k Films App 20210388499 - Zhang; Shuaidi ;   et al. | 2021-12-16 |
Self-aligned double patterning with spatial atomic layer deposition Grant 11,164,753 - Li , et al. November 2, 2 | 2021-11-02 |
Methods and systems to modulate film stress Grant 11,158,489 - Tanaka , et al. October 26, 2 | 2021-10-26 |
Seamless gapfill with dielectric ALD films Grant 11,133,178 - Balseanu , et al. September 28, 2 | 2021-09-28 |
Methods And Apparatus For Low Temperature Silicon Nitride Films App 20210265157 - Yan; Wenbo ;   et al. | 2021-08-26 |
Selective Deposition Of Sicon By Plama Ald App 20210230747 - Zhang; Shuaidi ;   et al. | 2021-07-29 |
Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors Grant 11,028,478 - Nguyen , et al. June 8, 2 | 2021-06-08 |
Methods and apparatus for low temperature silicon nitride films Grant 11,017,997 - Yan , et al. May 25, 2 | 2021-05-25 |
Seamless Gapfill With Dielectric ALD Films App 20210090882 - Balseanu; Mihaela ;   et al. | 2021-03-25 |
Method and apparatus for deposition of low-k films Grant 10,957,532 - Li , et al. March 23, 2 | 2021-03-23 |
Method of forming self-aligned via Grant 10,923,396 - Parikh , et al. February 16, 2 | 2021-02-16 |
Methods And Apparatus For Deposition Of Low-K Films App 20200332415 - Bhuyan; Bhaskar Jyoti ;   et al. | 2020-10-22 |
Methods And Precursors For Selective Deposition Of Metal Films App 20200312653 - Fredrickson; Kurt ;   et al. | 2020-10-01 |
Cap Layer For Bit Line Resistance Reduction App 20200235104 - Panda; Priyadarshi ;   et al. | 2020-07-23 |
Method to fabricate thermally stable low K-FinFET spacer Grant 10,714,331 - Balseanu , et al. | 2020-07-14 |
Method Of Forming Self-Aligned Via App 20200219768 - Parikh; Suketu Arun ;   et al. | 2020-07-09 |
Cap layer for bit line resistance reduction Grant 10,700,072 - Panda , et al. | 2020-06-30 |
Method Of Forming Self-Aligned Via App 20200144117 - Parikh; Suketu Arun ;   et al. | 2020-05-07 |
Method of forming self-aligned via Grant 10,629,484 - Parikh , et al. | 2020-04-21 |
Method And Apparatus For Deposition Of Low-K Films App 20200006064 - Li; Ning ;   et al. | 2020-01-02 |
Methods And Apparatus For Low Temperature Silicon Nitride Films App 20190348271 - Yan; Wenbo ;   et al. | 2019-11-14 |
Method and apparatus for deposition of low-k films Grant 10,453,678 - Li , et al. Oc | 2019-10-22 |
Methods For Low Temperature ALD Of Metal Oxides App 20190309412 - Bhuyan; Bhaskar Jyoti ;   et al. | 2019-10-10 |
Method To Fabricate Thermally Stable Low K-finfet Spacer App 20190311896 - BALSEANU; Mihaela ;   et al. | 2019-10-10 |
Selective deposition of silicon nitride films for spacer applications Grant 10,319,583 - Li , et al. | 2019-06-11 |
High temperature silicon oxide atomic layer deposition technology Grant 10,170,298 - Yan , et al. J | 2019-01-01 |
Methods for depositing low K and low wet etch rate dielectric thin films Grant 10,147,599 - Li , et al. De | 2018-12-04 |
Methods and apparatus for selective dry etch Grant 10,134,581 - Li , et al. November 20, 2 | 2018-11-20 |
Method And Apparatus For Deposition Of Low-K Films App 20180301333 - Li; Ning ;   et al. | 2018-10-18 |
Atomic Layer Deposition Of Films Comprising Silicon, Carbon And Nitrogen Using Halogenated Silicon Precursors App 20180291505 - Nguyen; Victor ;   et al. | 2018-10-11 |
Method And Apparatus For Selective Deposition Of Dielectric Films App 20180211833 - Li; Ning ;   et al. | 2018-07-26 |
Atomic layer deposition of films comprising silicon, carbon and nitrogen using halogenated silicon precursors Grant 10,023,958 - Nguyen , et al. July 17, 2 | 2018-07-17 |
PEALD of films comprising silicon nitride Grant 9,984,868 - Nguyen , et al. May 29, 2 | 2018-05-29 |
Methods And Systems To Modulate Film Stress App 20180130642 - Tanaka; Tsutomu ;   et al. | 2018-05-10 |
High Temperature Silicon Oxide Atomic Layer Deposition Technology App 20180076023 - Yan; Wenbo ;   et al. | 2018-03-15 |
Methods For Depositing Low K And Low Wet Etch Rate Dielectric Thin Films App 20180040470 - Li; Ning ;   et al. | 2018-02-08 |
High temperature silicon oxide atomic layer deposition technology Grant 9,875,888 - Yan , et al. January 23, 2 | 2018-01-23 |
Methods for depositing low k and low wet etch rate dielectric thin films Grant 9,799,511 - Li , et al. October 24, 2 | 2017-10-24 |
Methods And Apparatus For Selective Dry Etch App 20170263438 - Li; Ning ;   et al. | 2017-09-14 |
Selective Deposition Of Silicon Nitride Films For Spacer Applications App 20170263437 - Li; Ning ;   et al. | 2017-09-14 |
Pulsed nitride encapsulation Grant 9,748,093 - Reilly , et al. August 29, 2 | 2017-08-29 |
Cu/barrier interface enhancement Grant 9,633,861 - Ye , et al. April 25, 2 | 2017-04-25 |
High Temperature Thermal ALD Silicon Nitride Films App 20170053792 - Lu; Xinliang ;   et al. | 2017-02-23 |
Method of forming magnetic tunneling junctions Grant 9,564,582 - Pakala , et al. February 7, 2 | 2017-02-07 |
Methods For Depositing Low K And Low Wet Etch Rate Dielectric Thin Films App 20160322214 - Li; Ning ;   et al. | 2016-11-03 |
Pulsed Nitride Encapsulation App 20160284567 - Reilly; Patrick James ;   et al. | 2016-09-29 |
High Temperature Silicon Oxide Atomic Layer Deposition Technology App 20160099143 - Yan; Wenbo ;   et al. | 2016-04-07 |
Accurate film thickness control in gap-fill technology Grant 9,297,073 - Li , et al. March 29, 2 | 2016-03-29 |
Enhancing Uv Compatibility Of Low K Barrier Film App 20160013049 - YE; Weifeng ;   et al. | 2016-01-14 |
Accurate Film Thickness Control In Gap-fill Technology App 20150299856 - LI; Ning ;   et al. | 2015-10-22 |
In-situ Carbon And Oxide Doping Of Atomic Layer Deposition Silicon Nitride Films App 20150252477 - NGUYEN; Victor ;   et al. | 2015-09-10 |
Method Of Forming Magnetic Tunneling Junctions App 20150255507 - PAKALA; Mahendra ;   et al. | 2015-09-10 |
Seamless Gap-fill With Spatial Atomic Layer Deposition App 20150255324 - LI; Ning ;   et al. | 2015-09-10 |
Self-Aligned Double Patterning With Spatial Atomic Layer Deposition App 20150200110 - Li; Ning ;   et al. | 2015-07-16 |
Atomic Layer Deposition Of Films Comprising Silicon, Carbon And Nitrogen Using Halogenated Silicon Precursors App 20150147484 - Nguyen; Victor ;   et al. | 2015-05-28 |
Cu/barrier Interface Enhancement App 20140273438 - YE; Weifeng ;   et al. | 2014-09-18 |
Plasma Doping Of Silicon-Containing Films App 20140273524 - Nguyen; Victor ;   et al. | 2014-09-18 |
Vbd And Tddb Improvement Thru Interface Engineering App 20140273516 - XIA; Li-Qun ;   et al. | 2014-09-18 |
Post-Deposition Treatment Methods For Silicon Nitride App 20140273530 - Nguyen; Victor ;   et al. | 2014-09-18 |
PEALD of Films Comprising Silicon Nitride App 20140273529 - Nguyen; Victor ;   et al. | 2014-09-18 |
Copper oxide removal techniques Grant 8,758,638 - Ye , et al. June 24, 2 | 2014-06-24 |
Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure Grant 8,753,989 - Balseanu , et al. June 17, 2 | 2014-06-17 |
Method And Apparatus For Low Temperature ALD Deposition App 20140023794 - Mahajani; Maitreyee ;   et al. | 2014-01-23 |
MODULATED COMPOSITIONAL AND STRESS CONTROLLED MULTILAYER ULTRATHIN CONFORMAL SiNx DIELECTRICS USED IN NANO DEVICE FABRICATION App 20130333923 - Balseanu; Mihaela ;   et al. | 2013-12-19 |
Plasma-enhanced chemical vapor deposition of crystalline germanium Grant 8,598,020 - Nguyen , et al. December 3, 2 | 2013-12-03 |
Low temperature plasma enhanced chemical vapor deposition of conformal silicon carbon nitride and silicon nitride films Grant 8,586,487 - Nguyen , et al. November 19, 2 | 2013-11-19 |
Boron film interface engineering Grant 8,563,090 - Balseanu , et al. October 22, 2 | 2013-10-22 |
Multilayered low k cap with conformal gap fill and UV stable compressive stress properties Grant 8,536,069 - Balseanu , et al. September 17, 2 | 2013-09-17 |
Method of forming flash memory with ultraviolet treatment Grant 8,501,568 - Balseanu , et al. August 6, 2 | 2013-08-06 |
Engineering Dielectric Films For Cmp Stop App 20130189841 - Balseanu; Mihaela ;   et al. | 2013-07-25 |
Multilayered low k cap with conformal gap fill and UV stable compressive stress properties Grant 8,492,880 - Balseanu , et al. July 23, 2 | 2013-07-23 |
Low Temperature Plasma Enhanced Chemical Vapor Deposition Of Conformal Silicon Carbon Nitride And Silicon Nitride Films App 20130183835 - Nguyen; Victor ;   et al. | 2013-07-18 |
MULTILAYERED LOW k CAP WITH CONFORMAL GAP FILL AND UV STABLE COMPRESSIVE STRESS PROPERTIES App 20130005146 - Balseanu; Mihaela ;   et al. | 2013-01-03 |
Method for depositing boron-rich films for lithographic mask applications Grant 8,337,950 - Nguyen , et al. December 25, 2 | 2012-12-25 |
Copper Oxide Removal Techniques App 20120289049 - YE; WEIFENG ;   et al. | 2012-11-15 |
MULTILAYERED LOW k CAP WITH CONFORMAL GAP FILL AND UV STABLE COMPRESSIVE STRESS PROPERTIES App 20120248617 - Balseanu; Mihaela ;   et al. | 2012-10-04 |
Method of forming a non-volatile memory having a silicon nitride charge trap layer Grant 8,252,653 - Balseanu , et al. August 28, 2 | 2012-08-28 |
Method To Increase Silicon Nitride Tensile Stress Using Nitrogen Plasma In-situ Treatment And Ex-situ Uv Cure App 20120196450 - Balseanu; Mihaela ;   et al. | 2012-08-02 |
Method To Increase Tensile Stress Of Silicon Nitride Films Using A Post Pecvd Deposition Uv Cure App 20120196452 - Balseanu; Mihaela ;   et al. | 2012-08-02 |
Boron nitride and boron-nitride derived materials deposition method Grant 8,148,269 - Balseanu , et al. April 3, 2 | 2012-04-03 |
Method to increase silicon nitride tensile stress using nitrogen plasma in-situ treatment and ex-situ UV cure Grant 8,138,104 - Balseanu , et al. March 20, 2 | 2012-03-20 |
Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure Grant 8,129,290 - Balseanu , et al. March 6, 2 | 2012-03-06 |
Plasma-enhanced Chemical Vapor Deposition Of Crystalline Germanium App 20110315992 - Nguyen; Victor T. ;   et al. | 2011-12-29 |
Method of depositing boron nitride and boron nitride-derived materials Grant 8,084,105 - Huh , et al. December 27, 2 | 2011-12-27 |
Methods And Apparatus Of Creating Airgap In Dielectric Layers For The Reduction Of Rc Delay App 20110104891 - AL-BAYATI; AMIR ;   et al. | 2011-05-05 |
Method to improve the step coverage and pattern loading for dielectric films Grant 7,923,386 - Balseanu , et al. April 12, 2 | 2011-04-12 |
Gapfill improvement with low etch rate dielectric liners Grant 7,910,491 - Soo Kwon , et al. March 22, 2 | 2011-03-22 |
Methods and apparatus of creating airgap in dielectric layers for the reduction of RC delay Grant 7,879,683 - Al-Bayati , et al. February 1, 2 | 2011-02-01 |
Methods and systems for forming at least one dielectric layer Grant 7,871,926 - Xia , et al. January 18, 2 | 2011-01-18 |
Method of forming non-volatile memory having charge trap layer with compositional gradient Grant 7,816,205 - Balseanu , et al. October 19, 2 | 2010-10-19 |
Engineering Boron-rich Films For Lithographic Mask Applications App 20100233633 - Nguyen; Victor ;   et al. | 2010-09-16 |
Method to increase the compressive stress of PECVD dielectric films Grant 7,790,635 - Balseanu , et al. September 7, 2 | 2010-09-07 |
Method to improve the step coverage and pattern loading for dielectric films Grant 7,780,865 - Balseanu , et al. August 24, 2 | 2010-08-24 |
Method to increase the compressive stress of PECVD silicon nitride films Grant 7,732,342 - Balseanu , et al. June 8, 2 | 2010-06-08 |
Boron derived materials deposition method Grant 7,704,816 - Huh , et al. April 27, 2 | 2010-04-27 |
Flash Memory With Treated Charge Trap Layer App 20100099247 - Balseanu; Mihaela ;   et al. | 2010-04-22 |
Gapfill Improvement With Low Etch Rate Dielectric Liners App 20100099236 - Kwon; Young Soo ;   et al. | 2010-04-22 |
Non-volatile Memory Having Charge Trap Layer With Compositional Gradient App 20100096688 - Balseanu; Mihaela ;   et al. | 2010-04-22 |
Non-volatile Memory Having Silicon Nitride Charge Trap Layer App 20100096687 - BALSEANU; Mihaela ;   et al. | 2010-04-22 |
Boron Film Interface Engineering App 20100098884 - BALSEANU; MIHAELA ;   et al. | 2010-04-22 |
Method To Improve The Step Coverage And Pattern Loading For Dielectric Films App 20100048030 - BALSEANU; MIHAELA ;   et al. | 2010-02-25 |
Method For Critical Dimension Shrink Using Conformal Pecvd Films App 20090286402 - Xia; Li-Qun ;   et al. | 2009-11-19 |
Method for monolithically integrating silicon carbide microelectromechanical devices with electronic circuitry Grant 7,615,788 - Kornegay , et al. November 10, 2 | 2009-11-10 |
Boron Nitride And Boron-nitride Derived Materials Deposition Method App 20090263972 - Balseanu; Mihaela ;   et al. | 2009-10-22 |
Method to improve the step coverage and pattern loading for dielectric films Grant 7,601,651 - Balseanu , et al. October 13, 2 | 2009-10-13 |
Integration process for fabricating stressed transistor structure Grant 7,566,655 - Balseanu , et al. July 28, 2 | 2009-07-28 |
Methods and Systems for Forming at Least One Dielectric Layer App 20090104764 - Xia; Li-Qun ;   et al. | 2009-04-23 |
Method For Forming An Air Gap In Multilevel Interconnect Structure App 20090093100 - Xia; Li-Qun ;   et al. | 2009-04-09 |
Methods And Apparatus Of Creating Airgap In Dielectric Layers For The Reduction Of Rc Delay App 20090093112 - AL-BAYATI; AMIR ;   et al. | 2009-04-09 |
Boron Derived Materials Deposition Method App 20090017640 - Huh; Jeong-Uk ;   et al. | 2009-01-15 |
Boron Nitride And Boron Nitride-derived Materials Deposition Method App 20080292798 - Huh; Jeong-Uk ;   et al. | 2008-11-27 |
Method To Increase The Compressive Stress Of Pecvd Dielectric Films App 20080146007 - Balseanu; Mihaela ;   et al. | 2008-06-19 |
Method for monolithically integrating silicon carbide microelectromechanical devices with electronic circuitry App 20080093605 - Kornegay; Kevin ;   et al. | 2008-04-24 |
Method To Increase Silicon Nitride Tensile Stress Using Nitrogen Plasma In-situ Treatment And Ex-situ Uv Cure App 20080020591 - Balseanu; Mihaela ;   et al. | 2008-01-24 |
Method To Improve The Step Coverage And Pattern Loading For Dielectric Films App 20070232082 - Balseanu; Mihaela ;   et al. | 2007-10-04 |
Method To Improve The Step Coverage And Pattern Loading For Dielectric Films App 20070232071 - Balseanu; Mihaela ;   et al. | 2007-10-04 |
Low-k spacer integration into CMOS transistors App 20070202640 - Al-Bayati; Amir ;   et al. | 2007-08-30 |
Method for monolithically integrating silicon carbide microelectromechanical devices with electronic circuitry Grant 7,170,141 - Kornegay , et al. January 30, 2 | 2007-01-30 |
Integration process for fabricating stressed transistor structure App 20060270217 - Balseanu; Mihaela ;   et al. | 2006-11-30 |
Method to increase the compressive stress of PECVD silicon nitride films App 20060269692 - Balseanu; Mihaela ;   et al. | 2006-11-30 |
Method to increase tensile stress of silicon nitride films using a post PECVD deposition UV cure App 20060269693 - Balseanu; Mihaela ;   et al. | 2006-11-30 |
Tensile and compressive stressed materials for semiconductors App 20060105106 - Balseanu; Mihaela ;   et al. | 2006-05-18 |
High-power dielectric seasoning for stable wafer-to-wafer thickness uniformity of dielectric CVD films App 20060093756 - Rajagopalan; Nagarajan ;   et al. | 2006-05-04 |
Method for monolithically integrating silicon carbide microelectromechanical devices with electronic circuitry App 20040077164 - Kornegay, Kevin ;   et al. | 2004-04-22 |