| Patent | Date |
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Planar substrate edge contact with open volume equalization pathways and side containment
Grant 11,443,975 - Breiling , et al. September 13, 2 | 2022-09-13 |
Modulated Atomic Layer Deposition
App 20220208543 - Soe; Chan Myae Myae ; et al. | 2022-06-30 |
Pedestals For Modulating Film Properties In Atomic Layer Deposition (ald) Substrate Processing Chambers
App 20220162749 - LAVOIE; Adrien ; et al. | 2022-05-26 |
Thickness compensation by modulation of number of deposition cycles as a function of chamber accumulation for wafer to wafer film thickness matching
Grant 11,286,560 - Phillips , et al. March 29, 2 | 2022-03-29 |
Fill On Demand Ampoule Refill
App 20210324521 - Nguyen; Tuan ; et al. | 2021-10-21 |
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
Grant 11,127,567 - Kang , et al. September 21, 2 | 2021-09-21 |
Fill on demand ampoule refill
Grant 11,072,860 - Nguyen , et al. July 27, 2 | 2021-07-27 |
Electrostatic Chuck With Seal Surface
App 20210013080 - Breiling; Patrick G. ; et al. | 2021-01-14 |
Systems And Methods For Suppressing Parasitic Plasma And Reducing Within-wafer Non-uniformity
App 20200335304 - Kang; Hu ; et al. | 2020-10-22 |
Thickness Compensation By Modulation Of Number Of Deposition Cycles As A Function Of Chamber Accumulation For Wafer To Wafer Film Thickness Matching
App 20200299838 - Phillips; Richard ; et al. | 2020-09-24 |
Planar Substrate Edge Contact With Open Volume Equalization Pathways And Side Containment
App 20200227304 - Breiling; Patrick ; et al. | 2020-07-16 |
Integrated Showerhead With Thermal Control For Delivering Radical And Precursor Gas To A Downstream Chamber To Enable Remote Pla
App 20200219757 - BREILING; Patrick ; et al. | 2020-07-09 |
Thickness compensation by modulation of number of deposition cycles as a function of chamber accumulation for wafer to wafer film thickness matching
Grant 10,697,059 - Phillips , et al. | 2020-06-30 |
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
Grant 10,665,429 - Kang , et al. | 2020-05-26 |
Reducing backside deposition at wafer edge
Grant 10,648,079 - Baldasseroni , et al. | 2020-05-12 |
Planar substrate edge contact with open volume equalization pathways and side containment
Grant 10,622,243 - Breiling , et al. | 2020-04-14 |
Systems and methods for tilting a wafer for achieving deposition uniformity
Grant 10,541,117 - Swaminathan , et al. Ja | 2020-01-21 |
Hardware and process for film uniformity improvement
Grant 10,526,700 - Kumar , et al. J | 2020-01-07 |
Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system
Grant 10,407,773 - LaVoie , et al. Sept | 2019-09-10 |
Low volume showerhead with faceplate holes for improved flow uniformity
Grant 10,378,107 - Chandrasekharan , et al. A | 2019-08-13 |
Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition
Grant 10,323,323 - Chandrasekharan , et al. | 2019-06-18 |
Thickness Compensation By Modulation Of Number Of Deposition Cycles As A Function Of Chamber Accumulation For Wafer To Wafer Film Thickness Matching
App 20190085448 - Phillips; Richard ; et al. | 2019-03-21 |
Hardware And Process For Film Uniformity Improvement
App 20190040528 - Kumar; Purushottam ; et al. | 2019-02-07 |
Wafer Edge Contact Hardware and Methods to Eliminate Deposition at Wafer Backside Edge and Notch
App 20180334746 - Breiling; Patrick ; et al. | 2018-11-22 |
Method for high modulus ALD SiO2 spacer
Grant 10,134,579 - Baldasseroni , et al. November 20, 2 | 2018-11-20 |
Hardware and process for film uniformity improvement
Grant 10,100,407 - Kumar , et al. October 16, 2 | 2018-10-16 |
Method For High Modulus Ald Sio2 Spacer
App 20180138036 - Baldasseroni; Chloe ; et al. | 2018-05-17 |
Systems and methods for vapor delivery in a substrate processing system
Grant 9,970,108 - Qian , et al. May 15, 2 | 2018-05-15 |
Planar Substrate Edge Contact With Open Volume Equalization Pathways And Side Containment
App 20180122685 - Breiling; Patrick ; et al. | 2018-05-03 |
Valve manifold deadleg elimination via reentrant flow path
Grant 9,920,844 - Leeser , et al. March 20, 2 | 2018-03-20 |
Systems And Methods For Suppressing Parasitic Plasma And Reducing Within-wafer Non-uniformity
App 20180068833 - Kang; Hu ; et al. | 2018-03-08 |
Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity
Grant 9,793,096 - Kang , et al. October 17, 2 | 2017-10-17 |
Wafer centering in pocket to improve azimuthal thickness uniformity at wafer edge
Grant 9,698,042 - Baldasseroni , et al. July 4, 2 | 2017-07-04 |
Systems And Methods Enabling Low Defect Processing Via Controlled Separation And Delivery Of Chemicals During Atomic Layer Deposition
App 20170175269 - Chandrasekharan; Ramesh ; et al. | 2017-06-22 |
Methods And Apparatuses For Showerhead Backside Parasitic Plasma Suppression In A Secondary Purge Enabled Ald System
App 20170167017 - LaVoie; Adrien ; et al. | 2017-06-15 |
Systems And Methods For Tilting A Wafer For Achieving Deposition Uniformity
App 20170121819 - Swaminathan; Shankar ; et al. | 2017-05-04 |
Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition
Grant 9,631,276 - Chandrasekharan , et al. April 25, 2 | 2017-04-25 |
Method for RF compensation in plasma assisted atomic layer deposition
Grant 9,624,578 - Qian , et al. April 18, 2 | 2017-04-18 |
Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD system
Grant 9,617,638 - LaVoie , et al. April 11, 2 | 2017-04-11 |
Systems And Methods Enabling Low Defect Processing Via Controlled Separation And Delivery Of Chemicals During Atomic Layer Deposition
App 20170016115 - Chandrasekharan; Ramesh ; et al. | 2017-01-19 |
Composition-matched curtain gas mixtures for edge uniformity modulation in large-volume ALD reactors
Grant 9,508,547 - Pasquale , et al. November 29, 2 | 2016-11-29 |
Low Volume Showerhead With Faceplate Holes For Improved Flow Uniformity
App 20160340782 - Chandrasekharan; Ramesh ; et al. | 2016-11-24 |
Method and apparatus for backside deposition reduction by control of wafer support to achieve edge seal
Grant 9,428,833 - Duvall , et al. August 30, 2 | 2016-08-30 |
Hardware And Process For Film Uniformity Improvement
App 20160177443 - Kumar; Purushottam ; et al. | 2016-06-23 |
Reducing Backside Deposition At Wafer Edge
App 20160177444 - Baldasseroni; Chloe ; et al. | 2016-06-23 |
Valve Manifold Deadleg Elimination Via Reentrant Flow Path
App 20160147234 - Leeser; Karl ; et al. | 2016-05-26 |
Method And Apparatus For Rf Compensation In Plasma Assisted Atomic Layer Deposition
App 20160090650 - Qian; Jun ; et al. | 2016-03-31 |
Systems and Methods for Suppressing Parasitic Plasma and Reducing Within-Wafer Non-Uniformity
App 20160079036 - Kang; Hu ; et al. | 2016-03-17 |
Fill On Demand Ampoule Refill
App 20160052655 - Nguyen; Tuan ; et al. | 2016-02-25 |
Methods And Apparatuses For Stable Deposition Rate Control In Low Temperature Ald Systems By Showerhead Active Heating And/or Pedestal Cooling
App 20160056032 - Baldasseroni; Chloe ; et al. | 2016-02-25 |
Fill On Demand Ampoule
App 20160052651 - Nguyen; Tuan ; et al. | 2016-02-25 |
Systems And Methods For Vapor Delivery
App 20160032453 - Qian; Jun ; et al. | 2016-02-04 |
Methods And Apparatuses For Showerhead Backside Parasitic Plasma Suppression In A Secondary Purge Enabled Ald System
App 20160035566 - LaVoie; Adrien ; et al. | 2016-02-04 |
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