| Patent | Date |
|---|
Nanowire sensor, nanowire sensor array and method of fabricating the same
Grant 8,236,595 - Agarwal , et al. August 7, 2 | 2012-08-07 |
Nanowire Sensor, Nanowire Sensor Array And Method Of Fabricating The Same
App 20110193183 - Agarwal; Ajay ; et al. | 2011-08-11 |
Fully salicided (FUCA) MOSFET structure
Grant 7,682,914 - Lo , et al. March 23, 2 | 2010-03-23 |
Transparent Microfluidic Device
App 20100055673 - Agarwal; Ajay ; et al. | 2010-03-04 |
Method of fabricating tensile strained layers and compressive strain layers for a CMOS device
Grant 7,439,165 - Lo , et al. October 21, 2 | 2008-10-21 |
Method to reduce junction leakage current in strained silicon on silicon-germanium devices
Grant 7,425,751 - Balasubramanian , et al. September 16, 2 | 2008-09-16 |
Gate electrode architecture for improved work function tuning and method of manufacture
Grant 7,397,090 - Mathew , et al. July 8, 2 | 2008-07-08 |
Fully salicided (FUCA) MOSFET structure
App 20080064153 - Qiang Lo; Patrick Guo ; et al. | 2008-03-13 |
Fully salicided (FUSA) MOSFET structure
Grant 7,294,890 - Lo , et al. November 13, 2 | 2007-11-13 |
Method of fabricating strained channel devices
App 20060226483 - Lo; Patrick Guo Oiang ; et al. | 2006-10-12 |
Fully salicided (FUSA) MOSFET structure
App 20060199321 - Lo; Patrick Guo Qiang ; et al. | 2006-09-07 |
Gate Electrode Architecture for Improved Work Function Tuning and Method of Manufacture
App 20050275035 - Mathew, Shajan ; et al. | 2005-12-15 |
Method to reduce junction leakage current in strained silicon on silicon-germanium devices
App 20050130361 - Balasubramanian, Narayanan ; et al. | 2005-06-16 |
CMOS compatible low band offset double barrier resonant tunneling diode
App 20050056827 - Li, Ming Fu ; et al. | 2005-03-17 |
Method to reduce junction leakage current in strained silicon on silicon-germanium devices
Grant 6,846,720 - Balasubramanian , et al. January 25, 2 | 2005-01-25 |
Method To Reduce Junction Leakage Current In Strained Silicon On Silicon-germanium Devices
App 20040259314 - Balasubramanian, Narayanan ; et al. | 2004-12-23 |
Method of fabricating a CMOS device with dual metal gate electrodes
App 20040245578 - Park, Chang Seo ; et al. | 2004-12-09 |
Stacked LDD high frequency LDMOSFET
Grant 6,664,596 - Cai , et al. December 16, 2 | 2003-12-16 |
Stacked LDD high frequency LDMOSFET
App 20030085448 - Cai, Jun ; et al. | 2003-05-08 |
Process for device using partial SOI
App 20030040185 - Jun, Cai ; et al. | 2003-02-27 |
Stacked LDD high frequency LDMOSFET
App 20020164844 - Cai, Jun ; et al. | 2002-11-07 |
Method of fabricating a shallow trench isolation structure with reduced local oxide recess near corner
Grant 6,468,853 - Balasubramanian , et al. October 22, 2 | 2002-10-22 |
Method to form gate oxides of different thicknesses on a silicon substrate
Grant 6,235,591 - Balasubramanian , et al. May 22, 2 | 2001-05-22 |
Method for forming a low impurity diffusion polysilicon layer
Grant 5,767,004 - Balasubramanian , et al. June 16, 1 | 1998-06-16 |
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