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Patent applications and USPTO patent grants for Bakshi; Vivek.The latest application filed is for "systems and methods for in-situ reflectivity degradation monitoring of optical collectors used in extreme ultraviolet (euv) lithography processes".
Patent | Date |
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Systems and methods for in-situ reflectivity degradation monitoring of optical collectors used in extreme ultraviolet (EUV) lithography processes Grant 7,760,341 - Bakshi , et al. July 20, 2 | 2010-07-20 |
Systems and methods for monitoring and controlling the operation of extreme ultraviolet (EUV) light sources used in semiconductor fabrication Grant 7,709,816 - Bakshi , et al. May 4, 2 | 2010-05-04 |
Systems and Methods for In-Situ Reflectivity Degradation Monitoring of Optical Collectors Used in Extreme Ultraviolet (EUV) Lithography Processes App 20090059196 - Bakshi; Vivek ;   et al. | 2009-03-05 |
Systems and Methods for Monitoring and Controlling the Operation of Extreme Ultraviolet (EUV) Light Sources Used in Semiconductor Fabrication App 20090046273 - Bakshi; Vivek ;   et al. | 2009-02-19 |
EUV lithography filter Grant 7,250,620 - Wurm , et al. July 31, 2 | 2007-07-31 |
EUV lithography filter App 20060160031 - Wurm; Stefan ;   et al. | 2006-07-20 |
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