Baklanov; Mikhail Rodionovich
Patent Applications and Registrations
Patent applications and USPTO patent grants for Baklanov; Mikhail Rodionovich.The latest application filed is for "anisotropic etching of organic-containing insulating layers".
- Baklanov; Mikhail Rodionovich - Leuven BE
| Patent | Date |
|---|---|
| Fluorinated hard mask for micropatterning of polymers Grant 7,042,091 - Baklanov , et al. May 9, 2 | 2006-05-09 |
| Anisotropic etching of organic-containing insulating layers Grant 6,900,140 - Vanhaelemeersch , et al. May 31, 2 | 2005-05-31 |
| Anisotropic etching of organic-containing insulating layers Grant 6,844,267 - Vanhaelemeersch , et al. January 18, 2 | 2005-01-18 |
| Anisotropic etching of organic-containing insulating layers App 20040175945 - Vanhaelemeersch, Serge ; et al. | 2004-09-09 |
| Method and apparatus for characterization of porous films Grant 6,662,631 - Baklanov , et al. December 16, 2 | 2003-12-16 |
| Metallization structure on a fluorine-containing dielectric and a method for fabrication thereof Grant 6,635,964 - Maex , et al. October 21, 2 | 2003-10-21 |
| Method and apparatus for characterization of porous films App 20030094032 - Baklanov, Mikhail Rodionovich ; et al. | 2003-05-22 |
| Apparatus and method for determining porosity Grant 6,435,008 - Baklanov , et al. August 20, 2 | 2002-08-20 |
| Metallization structure on a fluorine-containing dielectric and a method for fabrication thereof App 20020066957 - Maex, Karen ; et al. | 2002-06-06 |
| Apparatus and method for determining porosity App 20010054306 - Baklanov, Mikhail Rodionovich ; et al. | 2001-12-27 |
| Fluorinated hard mask for micropattering of polymers App 20010026956 - Baklanov, Mikhail Rodionovich ; et al. | 2001-10-04 |
| Etching process of CoSi2 layers Grant 6,255,227 - Donaton , et al. July 3, 2 | 2001-07-03 |
| Fluorinated hard mask for micropatterning of polymers Grant 6,245,489 - Baklanov , et al. June 12, 2 | 2001-06-12 |
| Etching process of CoSi.sub.2 layers Grant 6,153,484 - Donaton , et al. November 28, 2 | 2000-11-28 |
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