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name:-0.016491889953613
name:-0.0043690204620361
name:-0.0032501220703125
Bailey; Robert Jeffrey Patent Filings

Bailey; Robert Jeffrey

Patent Applications and Registrations

Patent applications and USPTO patent grants for Bailey; Robert Jeffrey.The latest application filed is for "multiplexed dlts and hscv measurement system".

Company Profile
2.2.13
  • Bailey; Robert Jeffrey - Scotts Valley CA
  • Bailey; Robert Jeffrey - Santa Cruz CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Multiplexed Dlts And Hscv Measurement System
App 20190377025 - Bailey; Robert Jeffrey
2019-12-12
System And Method Of Forming Selenized Composite Metal Powder
App 20190134651 - BAILEY; Robert Jeffrey ;   et al.
2019-05-09
Thermal Reactors With Improved Gas Flow Characteristics
App 20120234242 - Bailey; Robert Jeffrey
2012-09-20
Gas Delivery Device
App 20110268891 - MacNeil; John ;   et al.
2011-11-03
Oxide-containing Film Formed From Silicon
App 20100117203 - Bailey; Robert Jeffrey ;   et al.
2010-05-13
Radical Assisted Batch Film Deposition
App 20080038486 - Treichel; Helmuth ;   et al.
2008-02-14
Showerhead for a Gas Supply Apparatus
App 20080000424 - Bailey; Robert Jeffrey ;   et al.
2008-01-03
Thermal Processing System With Across-flow Liner
App 20070137794 - Qiu; Taiquing T. ;   et al.
2007-06-21
Deposition apparatus for semiconductor processing
App 20070022959 - Bercaw; Craig ;   et al.
2007-02-01
Uniform batch film deposition process and films so produced
App 20070010072 - Bailey; Robert Jeffrey ;   et al.
2007-01-11
Thermal processing system with cross-flow liner
App 20050098107 - Du Bois, Dale R. ;   et al.
2005-05-12
Heated vacuum support apparatus
App 20030121898 - Kane, Tom ;   et al.
2003-07-03
Wafer Carrier And Semiconductor Apparatus For Processing A Semiconductor Substrate
App 20020066412 - YAO, JACK CHIHCHIEH ;   et al.
2002-06-06
Wafer carrier and semiconductor apparatus for processing a semiconductor substrate
Grant 6,026,589 - Yao , et al. February 22, 2
2000-02-22
Method of reducing metal contamination during semiconductor processing in a reactor having metal components
Grant 5,916,378 - Bailey , et al. June 29, 1
1999-06-29

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