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Patent applications and USPTO patent grants for Bailey; Robert Jeffrey.The latest application filed is for "multiplexed dlts and hscv measurement system".
Patent | Date |
---|---|
Multiplexed Dlts And Hscv Measurement System App 20190377025 - Bailey; Robert Jeffrey | 2019-12-12 |
System And Method Of Forming Selenized Composite Metal Powder App 20190134651 - BAILEY; Robert Jeffrey ;   et al. | 2019-05-09 |
Thermal Reactors With Improved Gas Flow Characteristics App 20120234242 - Bailey; Robert Jeffrey | 2012-09-20 |
Gas Delivery Device App 20110268891 - MacNeil; John ;   et al. | 2011-11-03 |
Oxide-containing Film Formed From Silicon App 20100117203 - Bailey; Robert Jeffrey ;   et al. | 2010-05-13 |
Radical Assisted Batch Film Deposition App 20080038486 - Treichel; Helmuth ;   et al. | 2008-02-14 |
Showerhead for a Gas Supply Apparatus App 20080000424 - Bailey; Robert Jeffrey ;   et al. | 2008-01-03 |
Thermal Processing System With Across-flow Liner App 20070137794 - Qiu; Taiquing T. ;   et al. | 2007-06-21 |
Deposition apparatus for semiconductor processing App 20070022959 - Bercaw; Craig ;   et al. | 2007-02-01 |
Uniform batch film deposition process and films so produced App 20070010072 - Bailey; Robert Jeffrey ;   et al. | 2007-01-11 |
Thermal processing system with cross-flow liner App 20050098107 - Du Bois, Dale R. ;   et al. | 2005-05-12 |
Heated vacuum support apparatus App 20030121898 - Kane, Tom ;   et al. | 2003-07-03 |
Wafer Carrier And Semiconductor Apparatus For Processing A Semiconductor Substrate App 20020066412 - YAO, JACK CHIHCHIEH ;   et al. | 2002-06-06 |
Wafer carrier and semiconductor apparatus for processing a semiconductor substrate Grant 6,026,589 - Yao , et al. February 22, 2 | 2000-02-22 |
Method of reducing metal contamination during semiconductor processing in a reactor having metal components Grant 5,916,378 - Bailey , et al. June 29, 1 | 1999-06-29 |
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