BAILEY; GEORGE E.

Patent Applications and Registrations

Patent applications and USPTO patent grants for BAILEY; GEORGE E..The latest application filed is for "coated ring seal".

Company Profile

0.11.6

BAILEY; GEORGE E. - FLORESVILLE TX
Bailey; George E. - Welches OR
Bailey; George E. - Dublin OH
Bailey; George E. - Ashland MA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Coated Ring Seal App 20100225067 - BAILEY; GEORGE E.	2010-09-09
Optical error minimization in a semiconductor manufacturing apparatus Grant 7,298,458 - Berman , et al. November 20, 2	2007-11-20
Optical error minimization in a semiconductor manufacturing apparatus App 20060238728 - Berman; Michael J. ; et al.	2006-10-26
Optical error minimization in a semiconductor manufacturing apparatus Grant 7,098,996 - Berman , et al. August 29, 2	2006-08-29
Dual source lithography for direct write application Grant 7,023,530 - Berman , et al. April 4, 2	2006-04-04
Chromeless phase shift mask Grant 7,005,217 - Bailey , et al. February 28, 2	2006-02-28
Method and apparatus for detecting backside contamination during fabrication of a semiconductor wafer Grant 6,943,055 - Berman , et al. September 13, 2	2005-09-13
Dual source lithography for direct write application Grant 6,894,762 - Berman , et al. May 17, 2	2005-05-17
Optical error minimization in a semiconductor manufacturing apparatus Grant 6,885,436 - Berman , et al. April 26, 2	2005-04-26
Chromeless phase shift mask App 20040197674 - Bailey, George E. ; et al.	2004-10-07
Method to improve the resolution of a photolithography system by use of a coupling layer between the photo resist and the ARC Grant 6,764,749 - Berman , et al. July 20, 2	2004-07-20
Method and apparatus for detecting backside contamination during fabrication of a semiconductor wafer App 20040069407 - Berman, Michael J. ; et al.	2004-04-15
Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle App 20040067421 - Berman, Michael J. ; et al.	2004-04-08
Method to improve the resolution of a photolithography system by use of a coupling layer between the photo resist and the ARC App 20040018448 - Berman, Michael J. ; et al.	2004-01-29
Method and apparatus for detecting backside contamination during fabrication of a semiconductor wafer Grant 6,627,466 - Berman , et al. September 30, 2	2003-09-30
Shaped polycrystalline cutter elements Grant 6,102,143 - Snyder , et al. August 15, 2	2000-08-15
Kitchen Cutting Board Grant 3,770,262 - Bailey November 6, 1	1973-11-06

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