Baik; Ki Ho

Patent Applications and Registrations

Patent applications and USPTO patent grants for Baik; Ki Ho.The latest application filed is for "method of improving the uniformity of a patterned resist on a photomask".

Company Profile

0.55.45

Baik; Ki Ho - Ichon-shi KR
Baik; Ki Ho - Kyoungki-do KR
Baik; Ki-ho - Icheon-shi KR
Baik, Ki-Ho - Pleasanton CA
Baik; Ki Ho - Gyunggi-do KR
Baik, Ki-Ho - Fremont CA
Baik; Ki-Ho - Yicheon-shi KR
Baik; Ki Ho - Ichon KR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same Grant 7,329,477 - Jung , et al. February 12, 2	2008-02-12
Additive for photoresist composition for resist flow process Grant 7,150,961 - Jung , et al. December 19, 2	2006-12-19
Top-coating composition for photoresist and process for forming fine pattern using the same Grant 6,984,482 - Jung , et al. January 10, 2	2006-01-10
Organic anti-reflective polymer and preparation thereof Grant 6,956,091 - Hong , et al. October 18, 2	2005-10-18
Method of improving the uniformity of a patterned resist on a photomask App 20050221019 - Baik, Ki-Ho ; et al.	2005-10-06
Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same App 20050069816 - Jung, Jae Chang ; et al.	2005-03-31
ArF photoresist copolymers Grant 6,866,984 - Jung , et al. March 15, 2	2005-03-15
Photoresist composition for resist flow process Grant 6,824,951 - Lee , et al. November 30, 2	2004-11-30
Cross-linker monomer comprising double bond and photoresist copolymer containing the same Grant 6,818,376 - Lee , et al. November 16, 2	2004-11-16
Partially crosslinked polymer for bilayer photoresist Grant 6,811,960 - Lee , et al. November 2, 2	2004-11-02
ArF photoresist copolymers Grant 6,808,859 - Jung , et al. October 26, 2	2004-10-26
Reflection-inhibiting resin used in process for forming photoresist pattern Grant 6,797,451 - Hong , et al. September 28, 2	2004-09-28
Additive for photoresist composition for resist flow process App 20040166437 - Jung, Min Ho ; et al.	2004-08-26
Organic polymer for anti-reflective coating layer and preparation thereof Grant 6,780,953 - Jung , et al. August 24, 2	2004-08-24
Additive for photoresist composition for resist flow process Grant 6,770,414 - Jung , et al. August 3, 2	2004-08-03
Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same Grant 6,770,415 - Lee , et al. August 3, 2	2004-08-03
Organic polymer for organic anti-reflective coating layer and preparation thereof Grant 6,770,720 - Jung , et al. August 3, 2	2004-08-03
Over-coating composition for photoresist, and processes for forming photoresist patterns using the same Grant 6,764,806 - Jung , et al. July 20, 2	2004-07-20
Novel ArF photoresist copolymers App 20040131968 - Jung, Jae Chang ; et al.	2004-07-08
Photoresist monomers, polymers thereof and photoresist compositions using the same Grant 6,753,448 - Lee , et al. June 22, 2	2004-06-22
Process for forming a photoresist pattern comprising alkaline treatment Grant 6,699,644 - Lee , et al. March 2, 2	2004-03-02
Photoresist composition containing photo radical generator with photoacid generator Grant 6,692,891 - Jung , et al. February 17, 2	2004-02-17
Process for etching photomasks App 20040000535 - Mueller, Mark ; et al.	2004-01-01
Process for forming photoresist pattern by using gas phase amine treatment Grant 6,664,031 - Jung , et al. December 16, 2	2003-12-16
Partially crosslinked polymer for bilayer photoresist App 20030207205 - Lee, Geun Su ; et al.	2003-11-06
Organic anti-reflective polymer and preparation thereof App 20030208018 - Hong, Sung-eun ; et al.	2003-11-06
Polymer-containing photoresist, and process for manufacturing the same Grant 6,632,903 - Jung , et al. October 14, 2	2003-10-14
Photoresist composition for top-surface imaging processes by silylation Grant 6,630,281 - Koh , et al. October 7, 2	2003-10-07
Photoresist composition for resist flow process, and process for forming contact hole using the same Grant 6,627,379 - Kim , et al. September 30, 2	2003-09-30
Photoresist monomer comprising bisphenol derivatives and polymers thereof Grant 6,627,383 - Lee , et al. September 30, 2	2003-09-30
Copolymer resin, preparation thereof, and photoresist using the same Grant 6,608,158 - Jung , et al. August 19, 2	2003-08-19
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof Grant 6,602,650 - Hong , et al. August 5, 2	2003-08-05
Novel photoresist monomers, polymers thereof and photoresist compositions using the same App 20030144567 - Lee, Geun Su ; et al.	2003-07-31
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof Grant 6,599,678 - Hong , et al. July 29, 2	2003-07-29
Partially crosslinked polymer for bilayer photoresist Grant 6,589,707 - Lee , et al. July 8, 2	2003-07-08
Organic polymer for anti-reflective coating layer and preparation thereof App 20030118736 - Jung, Min-Ho ; et al.	2003-06-26
Top-coating composition for photoresist and process for forming fine pattern using the same App 20030108815 - Jung, Jae Chang ; et al.	2003-06-12
Organic polymer for organic anti-reflective coating layer and preparation thereof App 20030100695 - Jung, Jae-chang ; et al.	2003-05-29
Reflection-inhibiting resinn used in process for forming photoresist pattern App 20030018150 - Hong, Sung Eun ; et al.	2003-01-23
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof App 20030003397 - Hong, Sung-eun ; et al.	2003-01-02
Anti reflective coating polymers and the preparation method thereof Grant 6,492,441 - Hong , et al. December 10, 2	2002-12-10
Organic anti-reflective coating polymer and preparation thereof Grant 6,489,432 - Jung , et al. December 3, 2	2002-12-03
Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same App 20020177069 - Jung, Jae Chang ; et al.	2002-11-28
Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof Grant 6,486,283 - Hong , et al. November 26, 2	2002-11-26
Cross-linker monomer comprising double bond and photoresist copolymer containing the same App 20020160301 - Lee, Geun Su ; et al.	2002-10-31
Novel photoresist monomer, polymer thereof and photoresist composition containing it App 20020151666 - Jung, Min Ho ; et al.	2002-10-17
Organic anti-reflective polymer and method for manufacturing therof App 20020136834 - Jung, Min-Ho ; et al.	2002-09-26
Organic anti-reflective polymer and method for manufacturing thereof App 20020137826 - Jung, Min-ho ; et al.	2002-09-26
Photoresist monomers having stability to post exposure delay, polymers thereof and photoresist compositions containing the same Grant 6,455,225 - Kong , et al. September 24, 2	2002-09-24
Organic anti-reflective coating material and its preparation App 20020132183 - Jung, Min-Ho ; et al.	2002-09-19
Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof App 20020127789 - Hong, Sung-Eun ; et al.	2002-09-12
Photoresist monomer, polymer thereof and photoresist composition containing it Grant 6,448,352 - Jung , et al. September 10, 2	2002-09-10
Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof App 20020123586 - Hong, Sung-Eun ; et al.	2002-09-05
Anti reflective coating polymers and the preparation method thereof App 20020120070 - Hong, Sung-Eun ; et al.	2002-08-29
Photoresist monomer, polymer thereof and photoresist composition containing it Grant 6,426,171 - Jung , et al. July 30, 2	2002-07-30
Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof App 20020093069 - Hong, Sung-Eun ; et al.	2002-07-18
Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof App 20020090452 - Hong, Sung-Eun ; et al.	2002-07-11
Novel photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same App 20020091216 - Lee, Geun Su ; et al.	2002-07-11
Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same Grant 6,410,670 - Lee , et al. June 25, 2	2002-06-25
Copolymer resin, preparation thereof, and photoresist using the same App 20020068803 - Jung, Min Ho ; et al.	2002-06-06
Photoresist composition containing photo base generator with photo acid generator Grant 6,395,451 - Jung , et al. May 28, 2	2002-05-28
Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same App 20020061461 - Lee, Geun Su ; et al.	2002-05-23
Polymers and photoresist compositions using the same Grant 6,391,518 - Jung , et al. May 21, 2	2002-05-21
Photoresist monomer comprising bisphenol derivatives and polymers thereof App 20020051940 - Lee, Geun Su ; et al.	2002-05-02
Photoresist composition for resist flow process App 20020048723 - Lee, Geun Su ; et al.	2002-04-25
Photoresist cross-linker and photoresist composition comprising the same Grant 6,368,773 - Jung , et al. April 9, 2	2002-04-09
Copolymer resin, preparation thereof, and photoresist using the same Grant 6,369,181 - Jung , et al. April 9, 2	2002-04-09
Photoresist composition for top-surface imaging processes by silylation App 20020031721 - Koh, Cha Won ; et al.	2002-03-14
Photoresist composition for resist flow process, and process for forming contact hole using the same App 20020028405 - Kim, Jin Soo ; et al.	2002-03-07
Partially crosslinked polymer for bilayer photoresist App 20020028406 - Lee, Geun Su ; et al.	2002-03-07
Additive for photoresist composition for resist flow process App 20020022197 - Jung, Min Ho ; et al.	2002-02-21
Novel photoresist cross-linker and photoresist composition comprising the same App 20020019560 - Kong, Keun Kyu ; et al.	2002-02-14
Novel photoresist polymers, and photoresist compositions containing the same App 20020018960 - Lee, Geun Su ; et al.	2002-02-14
Multi-oxygen containing compound for preventing acid diffusion, and photoresist composition containing the same App 20020015917 - Lee, Geun Su ; et al.	2002-02-07
Photoresist composition containing photo radical generator with photoacid generator App 20020012873 - Jung, Jae Chang ; et al.	2002-01-31
Organic anti-reflective coating polymer and preparation thereof App 20020009595 - Hong, Sung-Eun ; et al.	2002-01-24
Process for forming photoresist pattern by using gas phase amine treatment App 20010053590 - Jung, Jae Chang ; et al.	2001-12-20
Semiconductor device using polymer-containing photoresist, and process for manufacturing the same App 20010053834 - Jung, Min Ho ; et al.	2001-12-20
Organic anti-reflective coating polymer and preparation thereof App 20010049429 - Jung, Min-ho ; et al.	2001-12-06
Photoresist cross-linker and photoresist composition comprising the same Grant 6,322,948 - Jung , et al. November 27, 2	2001-11-27
Organic polymer for anti-reflective coating layer and preparation thereof App 20010043992 - Jung, Min-ho ; et al.	2001-11-22
Polymer and a forming method of a micro pattern using the same Grant 6,316,162 - Jung , et al. November 13, 2	2001-11-13
Semiconductor device using polymer-containing photoresist, and process for manufacturing the same Grant 6,312,865 - Jung , et al. November 6, 2	2001-11-06
Photoresist cross-linker and photoresist composition comprising the same Grant 6,312,868 - Kong , et al. November 6, 2	2001-11-06
Organic anti-reflective coating material and its preparation Grant 6,309,790 - Jung , et al. October 30, 2	2001-10-30
Organic anti-reflective coating polymer and preparation thereof App 20010034427 - Jung, Min-Ho ; et al.	2001-10-25
Partially crosslinked polymer for bilayer photoresist App 20010031420 - Lee, Geun Su ; et al.	2001-10-18
Monomers for photoresist, polymers thereof, and photoresist compositions using the same Grant 6,291,131 - Jung , et al. September 18, 2	2001-09-18
Photoresist polymers of carboxyl-containing alicyclic compounds Grant 6,265,130 - Lee , et al. July 24, 2	2001-07-24
Over-coating composition for photoresist, and processes for forming photoresist patterns using the same App 20010003030 - Jung, Jae Chang ; et al.	2001-06-07
Photoresist monomers, polymers thereof, and photoresist compositions containing the same Grant 6,235,448 - Lee , et al. May 22, 2	2001-05-22
Photoresist monomers, polymers thereof, and photoresist compositions containing the same Grant 6,235,447 - Lee , et al. May 22, 2	2001-05-22
Polymer and a forming method of a micro pattern using the same Grant 6,225,020 - Jung , et al. May 1, 2	2001-05-01
Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin Grant 6,165,672 - Jung , et al. December 26, 2	2000-12-26
Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same Grant 6,150,069 - Jung , et al. November 21, 2	2000-11-21
Method and photoresist using a photoresist copolymer Grant 6,143,463 - Jung , et al. November 7, 2	2000-11-07
ArF photoresist copolymers Grant 6,132,926 - Jung , et al. October 17, 2	2000-10-17
Method for forming resist patterns comprising two photoresist layers and an intermediate layer Grant 5,830,624 - Bae , et al. November 3, 1	1998-11-03
Method for forming micro patterns of semiconductor devices Grant 5,821,034 - Kim , et al. October 13, 1	1998-10-13
Method for forming photoresist pattern Grant 5,759,748 - Chun , et al. June 2, 1	1998-06-02