Baggenstoss; William J.
Patent Applications and Registrations
Patent applications and USPTO patent grants for Baggenstoss; William J..The latest application filed is for "pattern mask with features to minimize the effect of aberrations".
- Baggenstoss; William J. - Boise ID
| Patent | Date |
|---|---|
| Method of forming pixel cell having a grated interface Grant 8,101,454 - Baggenstoss January 24, 2 | 2012-01-24 |
| Pixel cell having a grated interface Grant 7,880,255 - Baggenstoss February 1, 2 | 2011-02-01 |
| Reticles and methods of forming and using the same Grant 7,229,724 - Baggenstoss , et al. June 12, 2 | 2007-06-12 |
| Pattern mask with features to minimize the effect of aberrations Grant 7,105,278 - Baluswamy , et al. September 12, 2 | 2006-09-12 |
| Pattern mask with features to minimize the effect of aberrations App 20060093927 - Baluswamy; Pary ; et al. | 2006-05-04 |
| Pixel cell having a grated interface App 20060081900 - Baggenstoss; William J. | 2006-04-20 |
| Pixel cell having a grated interface App 20060011955 - Baggenstoss; William J. | 2006-01-19 |
| Reticles and methods of forming and using the same Grant 6,854,106 - Baggenstoss , et al. February 8, 2 | 2005-02-08 |
| Reticles and methods of forming and using the same App 20050014078 - Baggenstoss, William J. ; et al. | 2005-01-20 |
| Pattern mask with features to minimize the effect of aberrations App 20050003281 - Baluswamy, Pary ; et al. | 2005-01-06 |
| Pattern mask with features to minimize the effect of aberrations Grant 6,803,157 - Baluswamy , et al. October 12, 2 | 2004-10-12 |
| Reticles and methods of forming and using the same App 20040044982 - Baggenstoss, William J. ; et al. | 2004-03-04 |
| Pattern mask with features to minimize the effect of aberrations App 20030165748 - Baluswamy, Pary ; et al. | 2003-09-04 |
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