loadpatents
name:-0.031282901763916
name:-0.027368068695068
name:-0.0017058849334717
Babu; Suryadevara V. Patent Filings

Babu; Suryadevara V.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Babu; Suryadevara V..The latest application filed is for "abrasive-free planarization for euv mask substrates".

Company Profile
0.21.20
  • Babu; Suryadevara V. - Potsdam NY US
  • Babu; Suryadevara V. - Pottsdam NY
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Abrasive-free planarization for EUV mask substrates
Grant 9,097,994 - Babu , et al. August 4, 2
2015-08-04
Abrasive compositions for chemical mechanical polishing and methods for using same
Grant 8,822,340 - Babu , et al. September 2, 2
2014-09-02
Abrasive-free Planarization For Euv Mask Substrates
App 20130209924 - BABU; Suryadevara V. ;   et al.
2013-08-15
Abrasive Compositions For Chemical Polishing And Methods For Using Same
App 20130122705 - BABU; Suryadevara V. ;   et al.
2013-05-16
Abrasive compositions for chemical mechanical polishing and methods for using same
Grant 8,366,959 - Babu , et al. February 5, 2
2013-02-05
Abrasive Free Silicon Chemical Mechanical Planarization
App 20120190200 - Penta; Naresh K. ;   et al.
2012-07-26
Method for selective CMP of polysilicon
Grant 7,723,234 - Babu , et al. May 25, 2
2010-05-25
Abrasive compositions for chemical mechanical polishing and methods for using same
App 20100081281 - Babu; Suryadevara V. ;   et al.
2010-04-01
Method for one-to-one polishing of silicon nitride and silicon oxide
Grant 7,629,258 - Babu , et al. December 8, 2
2009-12-08
Method For The Preferential Polishing Of Silicon Nitride Versus Silicon Oxide
App 20090176371 - Babu; Suryadevara V. ;   et al.
2009-07-09
Method For The Preferential Polishing Of Silicon Nitride Versus Silicon Oxide
App 20080116171 - Babu; Suryadevara V. ;   et al.
2008-05-22
Method For One-To-One Polishing Of Silicon Nitride And Silicon Oxide
App 20080116172 - Babu; Suryadevara V. ;   et al.
2008-05-22
Method For Selective CMP Of Polysilicon
App 20080119051 - Babu; Suryadevara V. ;   et al.
2008-05-22
Silica and silica-based slurry
Grant 7,279,119 - Hellring , et al. October 9, 2
2007-10-09
Slurry for chemical mechanical polishing silicon dioxide
Grant 7,091,164 - Srinivasan , et al. August 15, 2
2006-08-15
Polishing compositions comprising polymeric cores having inorganic surface particles and method of use
Grant 6,918,820 - Smith , et al. July 19, 2
2005-07-19
Polishing compositions comprising polymeric cores having inorganic surface particles and method of use
App 20040203324 - Smith, Dennis E. ;   et al.
2004-10-14
Chemical mechanical planarization of wafers or films using fixed polishing pads and a nanoparticle composition
App 20040127045 - Gorantla, Venkata R. K. ;   et al.
2004-07-01
Silica and silica-based slurry
App 20040067649 - Hellring, Stuart D. ;   et al.
2004-04-08
Slurry for chemical mechanical polishing silicon dioxide
App 20040051077 - Srinivasan, Ramanathan ;   et al.
2004-03-18
Shallow trench isolation polishing using mixed abrasive slurries
App 20030211747 - Hegde, Sharath ;   et al.
2003-11-13
Slurry for chemical mechanical polishing silicon dioxide
Grant 6,627,107 - Srinivasan , et al. September 30, 2
2003-09-30
Silica and a silica-based slurry
App 20030094593 - Hellring, Stuart D. ;   et al.
2003-05-22
Shallow trench isolation polishing using mixed abrasive slurries
App 20030092271 - Jindal, Anurag ;   et al.
2003-05-15
Slurry for chemical mechanical polishing silicon dioxide
Grant 6,544,892 - Srinivasan , et al. April 8, 2
2003-04-08
Chemical-mechanical polishing
App 20030047710 - Babu, Suryadevara V. ;   et al.
2003-03-13
Slurry for chemical mechanical polishing silicon dioxide
App 20030006397 - Srinivasan, Ramanathan ;   et al.
2003-01-09
Slurry for chemical mechanical polishing silicon dioxide
App 20020195421 - Srinivasan, Ramanathan ;   et al.
2002-12-26
Slurry for chemical mechanical polishing silicon dioxide
Grant 6,491,843 - Srinivasan , et al. December 10, 2
2002-12-10
Multilayer photoconductive elements having low dark decay
Grant 5,849,445 - Visser , et al. December 15, 1
1998-12-15
Fuser members with an outermost layer of a fluorinated diamond like carbon
Grant 5,674,621 - Visser , et al. October 7, 1
1997-10-07
Plasma processing apparatus including three bus structures
Grant 5,061,359 - Babu , et al. * October 29, 1
1991-10-29
Side source center sink plasma reactor
Grant 5,021,138 - Babu , et al. June 4, 1
1991-06-04
Interlaminate adhesion between polymeric materials and electrolytic copper surfaces
Grant 4,810,326 - Babu , et al. March 7, 1
1989-03-07
Method of removing seed particles from circuit board substrate surface
Grant 4,718,972 - Babu , et al. January 12, 1
1988-01-12
Uniform plasma for drill smear removal reactor
Grant 4,618,477 - Babu , et al. October 21, 1
1986-10-21
Plasma etching with tracer
Grant 4,599,134 - Babu , et al. July 8, 1
1986-07-08

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