Patent | Date |
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Abrasive-free planarization for EUV mask substrates Grant 9,097,994 - Babu , et al. August 4, 2 | 2015-08-04 |
Abrasive compositions for chemical mechanical polishing and methods for using same Grant 8,822,340 - Babu , et al. September 2, 2 | 2014-09-02 |
Abrasive-free Planarization For Euv Mask Substrates App 20130209924 - BABU; Suryadevara V. ;   et al. | 2013-08-15 |
Abrasive Compositions For Chemical Polishing And Methods For Using Same App 20130122705 - BABU; Suryadevara V. ;   et al. | 2013-05-16 |
Abrasive compositions for chemical mechanical polishing and methods for using same Grant 8,366,959 - Babu , et al. February 5, 2 | 2013-02-05 |
Abrasive Free Silicon Chemical Mechanical Planarization App 20120190200 - Penta; Naresh K. ;   et al. | 2012-07-26 |
Method for selective CMP of polysilicon Grant 7,723,234 - Babu , et al. May 25, 2 | 2010-05-25 |
Abrasive compositions for chemical mechanical polishing and methods for using same App 20100081281 - Babu; Suryadevara V. ;   et al. | 2010-04-01 |
Method for one-to-one polishing of silicon nitride and silicon oxide Grant 7,629,258 - Babu , et al. December 8, 2 | 2009-12-08 |
Method For The Preferential Polishing Of Silicon Nitride Versus Silicon Oxide App 20090176371 - Babu; Suryadevara V. ;   et al. | 2009-07-09 |
Method For The Preferential Polishing Of Silicon Nitride Versus Silicon Oxide App 20080116171 - Babu; Suryadevara V. ;   et al. | 2008-05-22 |
Method For One-To-One Polishing Of Silicon Nitride And Silicon Oxide App 20080116172 - Babu; Suryadevara V. ;   et al. | 2008-05-22 |
Method For Selective CMP Of Polysilicon App 20080119051 - Babu; Suryadevara V. ;   et al. | 2008-05-22 |
Silica and silica-based slurry Grant 7,279,119 - Hellring , et al. October 9, 2 | 2007-10-09 |
Slurry for chemical mechanical polishing silicon dioxide Grant 7,091,164 - Srinivasan , et al. August 15, 2 | 2006-08-15 |
Polishing compositions comprising polymeric cores having inorganic surface particles and method of use Grant 6,918,820 - Smith , et al. July 19, 2 | 2005-07-19 |
Polishing compositions comprising polymeric cores having inorganic surface particles and method of use App 20040203324 - Smith, Dennis E. ;   et al. | 2004-10-14 |
Chemical mechanical planarization of wafers or films using fixed polishing pads and a nanoparticle composition App 20040127045 - Gorantla, Venkata R. K. ;   et al. | 2004-07-01 |
Silica and silica-based slurry App 20040067649 - Hellring, Stuart D. ;   et al. | 2004-04-08 |
Slurry for chemical mechanical polishing silicon dioxide App 20040051077 - Srinivasan, Ramanathan ;   et al. | 2004-03-18 |
Shallow trench isolation polishing using mixed abrasive slurries App 20030211747 - Hegde, Sharath ;   et al. | 2003-11-13 |
Slurry for chemical mechanical polishing silicon dioxide Grant 6,627,107 - Srinivasan , et al. September 30, 2 | 2003-09-30 |
Silica and a silica-based slurry App 20030094593 - Hellring, Stuart D. ;   et al. | 2003-05-22 |
Shallow trench isolation polishing using mixed abrasive slurries App 20030092271 - Jindal, Anurag ;   et al. | 2003-05-15 |
Slurry for chemical mechanical polishing silicon dioxide Grant 6,544,892 - Srinivasan , et al. April 8, 2 | 2003-04-08 |
Chemical-mechanical polishing App 20030047710 - Babu, Suryadevara V. ;   et al. | 2003-03-13 |
Slurry for chemical mechanical polishing silicon dioxide App 20030006397 - Srinivasan, Ramanathan ;   et al. | 2003-01-09 |
Slurry for chemical mechanical polishing silicon dioxide App 20020195421 - Srinivasan, Ramanathan ;   et al. | 2002-12-26 |
Slurry for chemical mechanical polishing silicon dioxide Grant 6,491,843 - Srinivasan , et al. December 10, 2 | 2002-12-10 |
Multilayer photoconductive elements having low dark decay Grant 5,849,445 - Visser , et al. December 15, 1 | 1998-12-15 |
Fuser members with an outermost layer of a fluorinated diamond like carbon Grant 5,674,621 - Visser , et al. October 7, 1 | 1997-10-07 |
Plasma processing apparatus including three bus structures Grant 5,061,359 - Babu , et al. * October 29, 1 | 1991-10-29 |
Side source center sink plasma reactor Grant 5,021,138 - Babu , et al. June 4, 1 | 1991-06-04 |
Interlaminate adhesion between polymeric materials and electrolytic copper surfaces Grant 4,810,326 - Babu , et al. March 7, 1 | 1989-03-07 |
Method of removing seed particles from circuit board substrate surface Grant 4,718,972 - Babu , et al. January 12, 1 | 1988-01-12 |
Uniform plasma for drill smear removal reactor Grant 4,618,477 - Babu , et al. October 21, 1 | 1986-10-21 |
Plasma etching with tracer Grant 4,599,134 - Babu , et al. July 8, 1 | 1986-07-08 |