BABCOKE; Jason E.
Patent Applications and Registrations
Patent applications and USPTO patent grants for BABCOKE; Jason E..The latest application filed is for "microfluidic devices and method for their use".
- BABCOKE; Jason E. - Suisun City CA
- Babcoke; Jason E. - San Francisco CA
- Babcoke; Jason E. - Menlo Park CA
| Patent | Date |
|---|---|
| Microfluidic Devices And Method For Their Use App 20150238919 - OLDHAM; Mark F. ; et al. | 2015-08-27 |
| Microfluidic devices and method for their use Grant 8,945,481 - Oldham , et al. February 3, 2 | 2015-02-03 |
| Heated Cover Methods And Technology App 20110164862 - Hirano; Kirk M. ; et al. | 2011-07-07 |
| Substrate temperature control in an ALD reactor Grant 7,806,983 - Chiang , et al. October 5, 2 | 2010-10-05 |
| Variable gas conductance control for a process chamber Grant 7,318,869 - Chiang , et al. January 15, 2 | 2008-01-15 |
| Heated Cover Methods And Technology App 20080000892 - Hirano; Kirk M. ; et al. | 2008-01-03 |
| Varying conductance out of a process region to control gas flux in an ALD reactor Grant 7,189,432 - Chiang , et al. March 13, 2 | 2007-03-13 |
| Variable gas conductance control for a process chamber App 20050051100 - Chiang, Tony P. ; et al. | 2005-03-10 |
| Substrate temperature control in an ALD reactor App 20050016471 - Chiang, Tony P. ; et al. | 2005-01-27 |
| Variable gas conductance control for a process chamber Grant 6,800,173 - Chiang , et al. October 5, 2 | 2004-10-05 |
| Adsorption process for atomic layer deposition Grant 6,630,201 - Chiang , et al. October 7, 2 | 2003-10-07 |
| Bubbler for gas delivery App 20030042630 - Babcoke, Jason E. ; et al. | 2003-03-06 |
| ALD reactor employing electrostatic chuck App 20020144657 - Chiang, Tony P. ; et al. | 2002-10-10 |
| Gas valve system for a reactor App 20020144655 - Chiang, Tony P. ; et al. | 2002-10-10 |
| Substrate temperature control in an ALD reactor App 20020144786 - Chiang, Tony P. ; et al. | 2002-10-10 |
| Chemisorption technique for atomic layer deposition App 20020146511 - Chiang, Tony P. ; et al. | 2002-10-10 |
| Process sequence for atomic layer deposition App 20020076507 - Chiang, Tony P. ; et al. | 2002-06-20 |
| Chamber pressure state-based control for a reactor App 20020076481 - Chiang, Tony P. ; et al. | 2002-06-20 |
| Varying conductance out of a process region to control gas flux in an ALD reactor App 20020076508 - Chiang, Tony P. ; et al. | 2002-06-20 |
| Variable gas conductance control for a process chamber App 20020076490 - Chiang, Tony P. ; et al. | 2002-06-20 |
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