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System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques Grant 7,657,864 - Tabery , et al. February 2, 2 | 2010-02-02 |
Optical proximity correction (OPC) technique to compensate for flare Grant 7,422,829 - Babcock , et al. September 9, 2 | 2008-09-09 |
System and method for automatic generation of optical proximity correction (OPC) rule sets Grant 7,281,222 - Babcock October 9, 2 | 2007-10-09 |
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques Grant 7,269,804 - Tabery , et al. September 11, 2 | 2007-09-11 |
System And Method For Integrated Circuit Device Design And Manufacture Using Optical Rule Checking To Screen Resolution Enhancement Techniques App 20070209030 - Tabery; Cyrus E. ;   et al. | 2007-09-06 |
Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results Grant 7,207,017 - Tabery , et al. April 17, 2 | 2007-04-17 |
Immersion lithographic process using a conforming immersion medium Grant 7,125,652 - Lyons , et al. October 24, 2 | 2006-10-24 |
Shallow trench isolation using antireflection layer Grant 7,061,075 - Babcock , et al. June 13, 2 | 2006-06-13 |
System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques App 20050229125 - Tabery, Cyrus E. ;   et al. | 2005-10-13 |
Pellicle for a lithographic lens Grant 6,906,777 - Kye , et al. June 14, 2 | 2005-06-14 |
Immersion lithographic process using a conforming immersion medium App 20050122497 - Lyons, Christopher F. ;   et al. | 2005-06-09 |
Method for using phase-shifting mask Grant 6,902,851 - Babcock , et al. June 7, 2 | 2005-06-07 |
Shallow trench isolation using antireflection layer Grant 6,821,883 - Babcock , et al. November 23, 2 | 2004-11-23 |
Growth of photoresist layer in photolithographic process Grant 6,682,988 - Babcock January 27, 2 | 2004-01-27 |
System and method for developing a photoresist layer with reduced pattern collapse Grant 6,660,459 - Babcock December 9, 2 | 2003-12-09 |
Method of forming shallow trench isolation using antireflection layer Grant 6,645,868 - Babcock , et al. November 11, 2 | 2003-11-11 |
Reducing feature dimension using self-assembled monolayer Grant 6,630,404 - Babcock October 7, 2 | 2003-10-07 |
Ultra narrow lines for field effect transistors Grant 6,576,536 - Babcock June 10, 2 | 2003-06-10 |
System for and method of using bacteria to aid in contact hole printing Grant 6,475,811 - Babcock November 5, 2 | 2002-11-05 |
System and method for developing a photoresist layer with reduced pattern collapse App 20020132184 - Babcock, Carl P. | 2002-09-19 |
System for determining overlay error Grant 6,423,555 - Babcock July 23, 2 | 2002-07-23 |
Simplified Method Of Patterning Field Dielectric Regions In A Semiconductor Device App 20020009845 - BHAKTA, JAYENDRA D. ;   et al. | 2002-01-24 |
Simplified method of patterning field dielectric regions in a semiconductor device Grant 6,335,235 - Bhakta , et al. January 1, 2 | 2002-01-01 |
Shallow trench isolation using antireflection layer Grant 6,255,717 - Babcock , et al. July 3, 2 | 2001-07-03 |