loadpatents
Patent applications and USPTO patent grants for Babayan; Viachslav.The latest application filed is for "method and apparatus for post exposure processing of photoresist wafers".
Patent | Date |
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Post exposure processing apparatus Grant 11,262,662 - Babayan , et al. March 1, 2 | 2022-03-01 |
Method And Apparatus For Post Exposure Processing Of Photoresist Wafers App 20220004104 - BABAYAN; Viachslav ;   et al. | 2022-01-06 |
Method and apparatus for post exposure processing of photoresist wafers Grant 11,112,697 - Babayan , et al. September 7, 2 | 2021-09-07 |
Method and apparatus for thin wafer carrier Grant 11,094,573 - Qiao , et al. August 17, 2 | 2021-08-17 |
Biased cover ring for a substrate processing system Grant 11,049,701 - Allen , et al. June 29, 2 | 2021-06-29 |
High temperature vapor delivery system and method Grant 10,954,594 - Babayan , et al. March 23, 2 | 2021-03-23 |
Post Exposure Processing Apparatus App 20210026257 - BABAYAN; Viachslav ;   et al. | 2021-01-28 |
Apparatus For Post Exposure Bake App 20200387074 - HANSON; Kyle M. ;   et al. | 2020-12-10 |
High density, low stress amorphous carbon film, and process and equipment for its deposition Grant 10,858,727 - Liu , et al. December 8, 2 | 2020-12-08 |
Post exposure processing apparatus Grant 10,845,715 - Babayan , et al. November 24, 2 | 2020-11-24 |
Apparatus for post exposure bake Grant 10,754,252 - Hanson , et al. A | 2020-08-25 |
Method And Apparatus For Thin Wafer Carrier App 20200161156 - QIAO; Jingyu ;   et al. | 2020-05-21 |
Apparatus for field guided acid profile control in a photoresist layer Grant 10,615,058 - Godet , et al. | 2020-04-07 |
Pulse shape controller for sputter sources Grant 10,566,177 - Stowell , et al. Feb | 2020-02-18 |
High Power Impulse Magnetron Sputtering Physical Vapor Deposition Of Tungsten Films Having Improved Bottom Coverage App 20200048760 - KALATHIPARAMBIL; KISHOR ;   et al. | 2020-02-13 |
Post Exposure Processing Apparatus App 20190377272 - BABAYAN; Viachslav ;   et al. | 2019-12-12 |
Method and apparatus for post exposure processing of photoresist wafers Grant 10,474,033 - Babayan , et al. Nov | 2019-11-12 |
Post exposure processing apparatus Grant 10,401,742 - Babayan , et al. Sep | 2019-09-03 |
Method And Apparatus For Post Exposure Processing Of Photoresist Wafers App 20190187563 - BABAYAN; Viachslav ;   et al. | 2019-06-20 |
Pulsed Dc Source For High Power Impulse Magnetron Sputtering Physical Vapor Deposition Of Dielectric Films And Methods Of Application App 20190127842 - BABAYAN; Viachslav ;   et al. | 2019-05-02 |
Sync Controller For High Impulse Magnetron Sputtering App 20190088457 - BABAYAN; Viachslav ;   et al. | 2019-03-21 |
Method and apparatus for post exposure processing of photoresist wafers Grant 10,203,604 - Babayan , et al. Feb | 2019-02-12 |
Post Exposure Processing Apparatus App 20180224754 - BABAYAN; Viachslav ;   et al. | 2018-08-09 |
Apparatus For Post Exposure Bake App 20180217504 - HANSON; Kyle M. ;   et al. | 2018-08-02 |
Apparatus For Field Guided Acid Profile Control In A Photoresist Layer App 20180190518 - GODET; Ludovic ;   et al. | 2018-07-05 |
Biased Cover Ring For A Substrate Processing System App 20180151325 - ALLEN; ADOLPH MILLER ;   et al. | 2018-05-31 |
Post exposure processing apparatus Grant 9,964,863 - Babayan , et al. May 8, 2 | 2018-05-08 |
Apparatus for post exposure bake Grant 9,958,782 - Hanson , et al. May 1, 2 | 2018-05-01 |
Apparatus For Post Exposure Bake App 20180107119 - HANSON; Kyle M. ;   et al. | 2018-04-19 |
POWER DELIVERY FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING (HiPIMS) App 20180108519 - BABAYAN; VIACHSLAV ;   et al. | 2018-04-19 |
Selective Etch Using Material Modification And Rf Pulsing App 20180082861 - Citla; Bhargav ;   et al. | 2018-03-22 |
High Density, Low Stress Amorphous Carbon Film, And Process And Equipment For Its Deposition App 20180051368 - Liu; Jingjing ;   et al. | 2018-02-22 |
Pulse Shape Controller For Sputter Sources App 20180044781 - STOWELL; Michael ;   et al. | 2018-02-15 |
Substrate Support With In Situ Wafer Rotation App 20180033673 - Nemani; Srinivas D. ;   et al. | 2018-02-01 |
Selective etch using material modification and RF pulsing Grant 9,865,484 - Citla , et al. January 9, 2 | 2018-01-09 |
Apparatus For Post Exposure Bake App 20180004094 - HANSON; Kyle M. ;   et al. | 2018-01-04 |
Selective Etch Using Material Modification And Rf Pulsing App 20180005850 - Citla; Bhargav ;   et al. | 2018-01-04 |
Method And Apparatus For Post Exposure Processing Of Photoresist Wafers App 20170363960 - BABAYAN; Viachslav ;   et al. | 2017-12-21 |
Immersion field guided exposure and post-exposure bake process Grant 9,829,790 - Buchberger, Jr. , et al. November 28, 2 | 2017-11-28 |
Method And Apparatus For Post Exposure Processing Of Photoresist Wafers App 20170154797 - Babayan; Viachslav ;   et al. | 2017-06-01 |
High Temperature Vapor Delivery System And Method App 20170088949 - BABAYAN; Viachslav ;   et al. | 2017-03-30 |
Immersion Field Guided Exposure And Post-exposure Bake Process App 20160357107 - BUCHBERGER, JR.; Douglas A. ;   et al. | 2016-12-08 |
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