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Patent applications and USPTO patent grants for Awtrey; Allan Wendell.The latest application filed is for "developing photoresist with supercritical fluid and developer".
Patent | Date |
---|---|
Developing photoresist with supercritical fluid and developer Grant 7,044,662 - Arena-Foster , et al. May 16, 2 | 2006-05-16 |
Drying resist with a solvent bath and supercritical CO2 Grant 6,928,746 - Arena-Foster , et al. August 16, 2 | 2005-08-16 |
Developing photoresist with supercritical fluid and developer Grant 6,924,086 - Arena-Foster , et al. August 2, 2 | 2005-08-02 |
Developing photoresist with supercritical fluid and developer App 20050008980 - Arena-Foster, Chantal J. ;   et al. | 2005-01-13 |
Removal of contaminants using supercritical processing App 20040072706 - Arena-Foster, Chantal J. ;   et al. | 2004-04-15 |
Drying resist with a solvent bath and supercritical CO2 App 20040035021 - Arena-Foster, Chantal J. ;   et al. | 2004-02-26 |
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