Patent | Date |
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Ordered porosity to direct memory element formation Grant 7,776,682 - Nickel , et al. August 17, 2 | 2010-08-17 |
Solutions for controlled, selective etching of copper Grant 7,465,408 - Avanzino December 16, 2 | 2008-12-16 |
Memory cell and method of making the memory cell Grant 7,306,988 - Avanzino , et al. December 11, 2 | 2007-12-11 |
Use of Ta-capped metal line to improve formation of memory element films Grant 7,288,782 - Avanzino , et al. October 30, 2 | 2007-10-30 |
Semiconductor device with electrically biased die edge seal Grant 7,235,867 - Augur , et al. June 26, 2 | 2007-06-26 |
Utilization of a Ta-containing cap over copper to facilitate concurrent formation of copper vias and memory element structures Grant 7,232,765 - Avanzino , et al. June 19, 2 | 2007-06-19 |
Composite tantalum nitride/tantalum copper capping layer Grant 7,157,795 - Erb , et al. January 2, 2 | 2007-01-02 |
Method of forming copper sulfide layer over substrate Grant 7,148,144 - Avanzino December 12, 2 | 2006-12-12 |
Method of making a memory cell Grant 7,141,482 - Avanzino November 28, 2 | 2006-11-28 |
Method and structure of memory element plug with conductive Ta removed from sidewall at region of memory element film Grant 7,129,133 - Avanzino , et al. October 31, 2 | 2006-10-31 |
Use of Ta-capped metal line to improve formation of memory element films Grant 7,084,062 - Avanzino , et al. August 1, 2 | 2006-08-01 |
Metal bridging monitor for etch and CMP endpoint detection Grant 7,011,762 - Lyons , et al. March 14, 2 | 2006-03-14 |
Conformal barrier liner in an integrated circuit interconnect Grant 6,989,604 - Woo , et al. January 24, 2 | 2006-01-24 |
Integrated circuit with dielectric diffusion barrier layer formed between interconnects and interlayer dielectric layers Grant 6,979,903 - Avanzino , et al. December 27, 2 | 2005-12-27 |
Copper oxide monitoring by scatterometry/ellipsometry during nitride or BLOK removal in damascene process Grant 6,934,032 - Subramanian , et al. August 23, 2 | 2005-08-23 |
Manufacturing an integrated circuit with low solubility metal-conductor interconnect cap Grant 6,841,473 - Wang , et al. January 11, 2 | 2005-01-11 |
Protection of low-k ILD during damascene processing with thin liner Grant 6,836,017 - Ngo , et al. December 28, 2 | 2004-12-28 |
Model based metal overetch control Grant 6,808,591 - Phan , et al. October 26, 2 | 2004-10-26 |
Scatterometry of grating structures to monitor wafer stress Grant 6,771,356 - Lyons , et al. August 3, 2 | 2004-08-03 |
Protection of low-k ILD during damascene processing with thin liner App 20040147117 - Ngo, Minh Van ;   et al. | 2004-07-29 |
Low temperature dielectric deposition to improve copper electromigration performance Grant 6,756,306 - Avanzino , et al. June 29, 2 | 2004-06-29 |
Protection low-k ILD during damascene processing with thin liner Grant 6,723,635 - Ngo , et al. April 20, 2 | 2004-04-20 |
Prevention of precipitation defects on copper interconnects during CMP by use of solutions containing organic compounds with silica adsorption and copper corrosion inhibiting properties Grant 6,720,264 - Sahota , et al. April 13, 2 | 2004-04-13 |
Use of scatterometry/reflectometry to measure thin film delamination during CMP Grant 6,702,648 - Avanzino , et al. March 9, 2 | 2004-03-09 |
Conductor abrasiveless chemical-mechanical polishing in integrated circuit interconnects Grant 6,699,785 - Yang , et al. March 2, 2 | 2004-03-02 |
Low temperature dielectric deposition to improve copper electromigration performance App 20040023511 - Avanzino, Steven C. ;   et al. | 2004-02-05 |
Sensor to predict void free films using various grating structures and characterize fill performance Grant 6,684,172 - Subramanian , et al. January 27, 2 | 2004-01-27 |
Integrated circuit having increased gate coupling capacitance Grant 6,682,978 - Park , et al. January 27, 2 | 2004-01-27 |
Integrated circuit with low solubility metal-conductor interconnect cap Grant 6,657,303 - Wang , et al. December 2, 2 | 2003-12-02 |
Conformal barrier liner in an integrated circuit interconnect Grant 6,657,304 - Woo , et al. December 2, 2 | 2003-12-02 |
Process for formation of a wiring network using a porous interlevel dielectric and related structures App 20030218253 - Avanzino, Steven C. ;   et al. | 2003-11-27 |
Method of manufacturing an integrated circuit with a dielectric diffusion barrier layer formed between interconnects and interlayer dielectric layers Grant 6,642,145 - Avanzino , et al. November 4, 2 | 2003-11-04 |
Integrated pressure sensor for measuring multiaxis pressure gradients App 20030188829 - Rangarajan, Bharath ;   et al. | 2003-10-09 |
Metal bridging monitor for etch and CMP endpoint detection Grant 6,624,642 - Lyons , et al. September 23, 2 | 2003-09-23 |
Conductor abrasiveless chemical-mechanical polishing in integrated circuit interconnects App 20030146512 - Yang, Kai ;   et al. | 2003-08-07 |
Methods of forming capped copper interconnects with improved electromigration resistance Grant 6,599,827 - Ngo , et al. July 29, 2 | 2003-07-29 |
Chemically preventing Cu dendrite formation and growth by immersion Grant 6,596,637 - Schonauer , et al. July 22, 2 | 2003-07-22 |
Interconnect methodology employing a low dielectric constant etch stop layer Grant 6,593,632 - Avanzino , et al. July 15, 2 | 2003-07-15 |
Wafer based temperature sensors for characterizing chemical mechanical polishing processes Grant 6,562,185 - Avanzino , et al. May 13, 2 | 2003-05-13 |
Wafer Based Temperature Sensors For Characterizing Chemical Mechanical Polishing Processes App 20030055526 - Avanzino, Steven C. ;   et al. | 2003-03-20 |
Interconnect structure formed in porous dielectric material with minimized degradation and electromigration Grant 6,528,409 - Lopatin , et al. March 4, 2 | 2003-03-04 |
Graded low-k middle-etch stop layer for dual-inlaid patterning Grant 6,525,428 - Ngo , et al. February 25, 2 | 2003-02-25 |
Ta barrier slurry containing an organic additive Grant 6,503,418 - Sahota , et al. January 7, 2 | 2003-01-07 |
Anneal hillock suppression method in integrated circuit interconnects Grant 6,500,754 - Erb , et al. December 31, 2 | 2002-12-31 |
Method of copper-polysilicon T-gate formation Grant 6,500,743 - Lopatin , et al. December 31, 2 | 2002-12-31 |
Conductor chemical-mechanical polishing in integrated circuit interconnects App 20020173140 - Sahota, Kashmir S. ;   et al. | 2002-11-21 |
Integrated circuit with dielectric diffusion barrier layer formed between interconnects and interlayer dielectric layers Grant 6,469,385 - Avanzino , et al. October 22, 2 | 2002-10-22 |
Tantalum anodization for in-laid copper metallization capacitor Grant 6,433,379 - Lopatin , et al. August 13, 2 | 2002-08-13 |
Method of improving electromigration resistance of capped Cu Grant 6,432,822 - Ngo , et al. August 13, 2 | 2002-08-13 |
Dielectric protected chemical-mechanical polishing in integrated circuit interconnects Grant 6,413,869 - Achuthan , et al. July 2, 2 | 2002-07-02 |
Controlled Anneal Conductors For Integrated Circuit Interconnects App 20020076923 - Avanzino, Steven C. ;   et al. | 2002-06-20 |
Planarization of a polysilicon layer surface by chemical mechanical polish to improve lithography and silicide formation App 20020072219 - Avanzino, Steven C. ;   et al. | 2002-06-13 |
Method of fabricating improved copper metallization including forming and removing passivation layer before forming capping film Grant 6,350,687 - Avanzino , et al. February 26, 2 | 2002-02-26 |
Ta Barrier Slurry Containing An Organic Additive App 20020005504 - SAHOTA, KASHMIR S. ;   et al. | 2002-01-17 |
Ceria removal in chemical-mechanical polishing of integrated circuits Grant 6,326,305 - Avanzino , et al. December 4, 2 | 2001-12-04 |
Chemically preventing copper dendrite formation and growth by spraying Grant 6,319,833 - Schonauer , et al. November 20, 2 | 2001-11-20 |
Method and apparatus for improved planarity metallization by electroplating and CMP Grant 6,319,834 - Erb , et al. November 20, 2 | 2001-11-20 |
Low-k photoresist removal process Grant 6,235,453 - You , et al. May 22, 2 | 2001-05-22 |
Optimized trench/via profile for damascene filling Grant 6,211,071 - Lukanc , et al. April 3, 2 | 2001-04-03 |
Chemically preventing Cu dendrite formation and growth by double sided scrubbing Grant 6,197,690 - Schonauer , et al. March 6, 2 | 2001-03-06 |
Method for multiple phase polishing of a conductive layer in a semidonductor wafer Grant 6,184,141 - Avanzino , et al. February 6, 2 | 2001-02-06 |
Chemically removable Cu CMP slurry abrasive Grant 6,169,034 - Avanzino , et al. January 2, 2 | 2001-01-02 |
Chemically removable Cu CMP slurry abrasive Grant 6,140,239 - Avanzino , et al. October 31, 2 | 2000-10-31 |
Method to reduce gate-to-local interconnect capacitance using a low dielectric constant material for LDD spacer Grant 6,137,126 - Avanzino , et al. October 24, 2 | 2000-10-24 |
Sputter-resistant hardmask for damascene trench/via formation Grant 6,121,150 - Avanzino , et al. September 19, 2 | 2000-09-19 |
Optimized trench/via profile for damascene filling Grant 6,121,149 - Lukanc , et al. September 19, 2 | 2000-09-19 |
Optimized trench/via profile for damascene processing Grant 6,117,781 - Lukanc , et al. September 12, 2 | 2000-09-12 |
Optimized trench/via profile for damascene filling Grant 6,117,782 - Lukanc , et al. September 12, 2 | 2000-09-12 |
Method of preventing copper dendrite formation and growth Grant 6,074,949 - Schonauer , et al. June 13, 2 | 2000-06-13 |
Methodology for developing product-specific interlayer dielectric polish processes Grant 5,665,199 - Sahota , et al. September 9, 1 | 1997-09-09 |
Chemical solutions for removing metal-compound contaminants from wafers after CMP and the method of wafer cleaning Grant 5,662,769 - Schonauer , et al. September 2, 1 | 1997-09-02 |
Void free oxide fill for interconnect spaces Grant 5,382,547 - Sultan , et al. January 17, 1 | 1995-01-17 |
Dopant sources for CMOS device Grant 5,116,778 - Haskell , et al. May 26, 1 | 1992-05-26 |
Method of planarization of topologies in integrated circuit structures Grant 4,962,064 - Haskell , et al. October 9, 1 | 1990-10-09 |
Method of planarization of topologies in integrated circuit structures Grant 4,954,459 - Avanzino , et al. September 4, 1 | 1990-09-04 |