loadpatents
name:-0.0084481239318848
name:-0.0049948692321777
name:-0.0038228034973145
Auth; Christopher Patent Filings

Auth; Christopher

Patent Applications and Registrations

Patent applications and USPTO patent grants for Auth; Christopher.The latest application filed is for "water collection arrangement".

Company Profile
3.4.7
  • Auth; Christopher - Catonsville MD
  • Auth; Christopher - Portland OR
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Water collection arrangement
Grant 11,248,859 - Auth , et al. February 15, 2
2022-02-15
Water Collection Arrangement
App 20200256629 - Auth; Christopher ;   et al.
2020-08-13
Cooling tower
Grant 10,677,543 - Auth , et al.
2020-06-09
Water Collection Arrangement
App 20190063855 - Auth; Christopher ;   et al.
2019-02-28
Method of forming CMOS transistors with dual-metal silicide formed through the contact openings
Grant 7,861,406 - Lodha , et al. January 4, 2
2011-01-04
Methods of forming improved EPI fill on narrow isolation bounded source/drain regions and structures formed thereby
Grant 7,691,752 - Ranade , et al. April 6, 2
2010-04-06
Short channel effect of MOS devices by retrograde well engineering using tilted dopant implantation into recessed source/drain regions
App 20080311720 - Hoffman; Thomas ;   et al.
2008-12-18
Methods Of Forming Improved Epi Fill On Narrow Isolation Bounded Source/drain Regions And Structures Formed Thereby
App 20080237741 - Ranade; Pushkar ;   et al.
2008-10-02
Methods Of Forming Improved Epi Fill On Narrow Isolation Bounded Source/drain Regions And Structures Formed Thereby
App 20080237742 - Ranade; Pushkar ;   et al.
2008-10-02
Method Of Forming Cmos Transistors With Dual-metal Silicide Formed Through The Contact Openings And Structures Formed Thereby
App 20080237603 - Lodha; Saurabh ;   et al.
2008-10-02
Short channel effect of MOS devices by retrograde well engineering using tilted dopant implantation into recessed source/drain regions
App 20060065937 - Hoffmann; Thomas ;   et al.
2006-03-30

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