Augustyniak; Edward J.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Augustyniak; Edward J..The latest application filed is for "suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region".

Company Profile

5.5.6

Augustyniak; Edward J. - Tualatin OR

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substrate Region App 20210381106 - Xia; Chunguang ; et al.	2021-12-09
Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region Grant 11,111,581 - Xia , et al. September 7, 2	2021-09-07
Systems and methods for determining film thickness using DC self-bias voltage Grant 10,876,209 - Augustyniak , et al. December 29, 2	2020-12-29
Systems And Methods For Determining Film Thickness Using Dc Self-bias Voltage App 20190360101 - AUGUSTYNIAK; Edward J. ; et al.	2019-11-28
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substra App 20190271081 - XIA; Chunguang ; et al.	2019-09-05
Mechanical Suppression Of Parasitic Plasma In Substrate Processing Chamber App 20190172684 - KEIL; Douglas ; et al.	2019-06-06
Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region Grant 10,287,683 - Xia , et al.	2019-05-14
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substrate Region App 20160289832 - Xia; Chunguang ; et al.	2016-10-06
Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region Grant 9,388,494 - Xia , et al. July 12, 2	2016-07-12
Suppression Of Parasitic Deposition In A Substrate Processing System By Suppressing Precursor Flow And Plasma Outside Of Substrate Region App 20130344245 - XIA; CHUNGUANG ; et al.	2013-12-26
Plasma clean for a semiconductor thin film deposition chamber Grant 6,716,765 - Hanprasopwattana , et al. April 6, 2	2004-04-06

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