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Modular Microwave Source With Embedded Ground Surface App 20210313153 - AuBuchon; Joseph F. ;   et al. | 2021-10-07 |
Deposition Radial And Edge Profile Tunability Through Independent Control Of Teos Flow App 20210249230 - BALUJA; Sanjeev ;   et al. | 2021-08-12 |
Modular microwave source with embedded ground surface Grant 11,049,694 - AuBuchon , et al. June 29, 2 | 2021-06-29 |
Deposition radial and edge profile tunability through independent control of TEOS flow Grant 11,017,986 - Baluja , et al. May 25, 2 | 2021-05-25 |
Modular Microwave Source With Embedded Ground Surface App 20210098236 - AuBuchon; Joseph F. ;   et al. | 2021-04-01 |
Magnet configurations for radial uniformity tuning of ICP plasmas Grant 10,249,479 - Aubuchon , et al. | 2019-04-02 |
Deposition Radial And Edge Profile Tenability Through Independent Control Of Teos Flow App 20180350562 - BALUJA; Sanjeev ;   et al. | 2018-12-06 |
Method and apparatus for controlling a magnetic field in a plasma chamber Grant 10,115,566 - Lane , et al. October 30, 2 | 2018-10-30 |
High Deposition Rate High Quality Silicon Nitride Enabled By Remote Nitrogen Radical Source App 20180294144 - AUBUCHON; Joseph F. ;   et al. | 2018-10-11 |
Electromagnetic dipole for plasma density tuning in a substrate processing chamber Grant 9,779,953 - Aubuchon , et al. October 3, 2 | 2017-10-03 |
Method And Apparatus For Controlling A Magnetic Field In A Plasma Chamber App 20170162365 - LANE; STEVEN ;   et al. | 2017-06-08 |
System and method for selective coil excitation in inductively coupled plasma processing reactors Grant 9,659,751 - Ramaswamy , et al. May 23, 2 | 2017-05-23 |
Method and apparatus for controlling a magnetic field in a plasma chamber Grant 9,613,783 - Lane , et al. April 4, 2 | 2017-04-04 |
Method for tuning a deposition rate during an atomic layer deposition process Grant 9,418,890 - Ma , et al. August 16, 2 | 2016-08-16 |
Magnet Configurations For Radial Uniformity Tuning Of Icp Plasmas App 20160225590 - Aubuchon; Joseph F. ;   et al. | 2016-08-04 |
Method And Apparatus For Controlling A Magnetic Field In A Plasma Chamber App 20160027613 - LANE; STEVEN ;   et al. | 2016-01-28 |
System And Method For Selective Coil Excitation In Inductively Coupled Plasma Processing Reactors App 20160027616 - RAMASWAMY; KARTIK ;   et al. | 2016-01-28 |
Cobalt deposition on barrier surfaces Grant 9,209,074 - Lu , et al. December 8, 2 | 2015-12-08 |
Cobalt Deposition On Barrier Surfaces App 20150255333 - LU; Jiang ;   et al. | 2015-09-10 |
Cobalt deposition on barrier surfaces Grant 9,051,641 - Lu , et al. June 9, 2 | 2015-06-09 |
Electromagnetic Dipole For Plasma Density Tuning In A Substrate Processing Chamber App 20150087157 - AUBUCHON; JOSEPH F. ;   et al. | 2015-03-26 |
Method For Tuning A Deposition Rate During An Atomic Layer Deposition Process App 20140248772 - MA; Paul ;   et al. | 2014-09-04 |
In-situ chamber treatment and deposition process Grant 8,491,967 - Ma , et al. July 23, 2 | 2013-07-23 |
Vortex chamber lids for atomic layer deposition Grant 7,780,789 - Wu , et al. August 24, 2 | 2010-08-24 |
In-situ Chamber Treatment And Deposition Process App 20100062614 - Ma; Paul F. ;   et al. | 2010-03-11 |
Method For Tuning A Deposition Rate During An Atomic Layer Deposition Process App 20100062149 - Ma; Paul ;   et al. | 2010-03-11 |
Cobalt Deposition On Barrier Surfaces App 20090053426 - LU; JIANG ;   et al. | 2009-02-26 |
Vortex Chamber Lids For Atomic Layer Deposition App 20080107809 - Wu; Dien-Yeh ;   et al. | 2008-05-08 |
Vortex Chamber Lids For Atomic Layer Deposition App 20080102208 - Wu; Dien-Yeh ;   et al. | 2008-05-01 |
Vortex Chamber Lids For Atomic Layer Deposition App 20080102203 - Wu; Dien-Yeh ;   et al. | 2008-05-01 |
Catalytically Grown Mano-Bent Nanostructure and Method for Making the Same App 20070207318 - Jin; Sungho ;   et al. | 2007-09-06 |