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name:-0.58417916297913
name:-0.032702922821045
name:-0.0041310787200928
Atsuchi; Kota Patent Filings

Atsuchi; Kota

Patent Applications and Registrations

Patent applications and USPTO patent grants for Atsuchi; Kota.The latest application filed is for "positive resist composition and method of forming resist pattern".

Company Profile
0.6.6
  • Atsuchi; Kota - Kawasaki JP
  • Atsuchi; Kota - Kanagawa JP
  • Atsuchi; Kota - Kawasaki-shi JP
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Positive resist composition and method of forming resist pattern
Grant 7,972,762 - Muroi , et al. July 5, 2
2011-07-05
Method of producing positive resist composition, positive resist composition, and method of forming resist pattern
Grant 7,879,527 - Muroi , et al. February 1, 2
2011-02-01
Process for producing photoresist composition, filter, coater and photoresist composition
Grant 7,771,911 - Hada , et al. August 10, 2
2010-08-10
Copolymer for semiconductor lithography and process for production thereof
Grant 7,695,889 - Yamagishi , et al. April 13, 2
2010-04-13
Positive Resist Composition And Method Of Forming Resist Pattern
App 20090233220 - Muroi; Masaaki ;   et al.
2009-09-17
Method Of Producing Positive Resist Composition, Positive Resist Composition, And Method Of Forming Resist Pattern
App 20090092924 - Muroi; Masaaki ;   et al.
2009-04-09
Process for refining crude resin for electronic material
Grant 7,312,015 - Hada , et al. December 25, 2
2007-12-25
Process for refining crude resin for resist
Grant 7,276,575 - Hada , et al. October 2, 2
2007-10-02
Copolymer for semiconductor lithography and process for production thereof
App 20060257784 - Yamagishi; Takanori ;   et al.
2006-11-16
Process for refining crude resin for electronic material
App 20060141384 - Hada; Hideo ;   et al.
2006-06-29
Process for refining crude resin for resist
App 20060135745 - Hada; Hideo ;   et al.
2006-06-22
Process for producing photoresist composition, filter, coater and photoresist composition
App 20060014098 - Hada; Hideo ;   et al.
2006-01-19

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