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Patent applications and USPTO patent grants for ASML NETHERLANS B.V..The latest application filed is for "method of determining characteristic of patterning process based on defect for reducing hotspot".
Patent | Date |
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Method Of Determining Characteristic Of Patterning Process Based On Defect For Reducing Hotspot App 20220229374 - PENG; Xingyue ;   et al. | 2022-07-21 |
Lithographic Apparatus, Device Manufacturing Method And Associated Data Processing Apparatus And Computer Program Product App 20160334712 - CEKLI; Hakki Ergun ;   et al. | 2016-11-17 |
Lithographic Apparatus And Device Manufacturing Method App 20160299442 - BUTLER; Hans ;   et al. | 2016-10-13 |
Imprint Lithography App 20090212462 - KRUIJT-STEGEMAN; Yvonne Wendela ;   et al. | 2009-08-27 |
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