ASML Masktools Netherlands B.V.

Patent Applications and Registrations

Patent applications and USPTO patent grants for ASML Masktools Netherlands B.V..The latest application filed is for "method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs".

Company Profile

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ASML Masktools Netherlands B.V. - Veldhoven NL
ASML Masktools Netherlands B.V. - La Veldhoven NL
ASML MASKTOOLS NETHERLANDS B.V. -

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs Grant 7,735,052 - Shi , et al. June 8, 2	2010-06-08
Optical proximity correction Grant RE40,084 - Petersen , et al. February 19, 2	2008-02-19
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs App 20050034096 - Shi, Xuelong ; et al.	2005-02-10
Hybrid phase-shift mask App 20040067423 - Chen, Jang Fung ; et al.	2004-04-08
Optical proximity correction method utilizing serifs having variable dimensions Grant 6,670,081 - Laidig , et al. December 30, 2	2003-12-30
Hybrid phase-shift mask Grant 6,623,895 - Chen , et al. September 23, 2	2003-09-23
Method and apparatus for detecting aberrations in a projection lens utilized for projection optics App 20030098970 - Chen, J. Fung	2003-05-29
Optical proximity correction Grant 6,541,167 - Petersen , et al. April 1, 2	2003-04-01
Method of patterning sub-0.25.lambda. line features with high transmission, "attenuated" phase shift masks Grant 6,482,555 - Chen , et al. November 19, 2	2002-11-19
Method of patterning sub-0.25lambda line features with high transmission, "attenuated" phase shift masks App 20020048708 - Chen, J. Fung ; et al.	2002-04-25
System and method of providing optical proximity correction for features using phase-shifted halftone transparent/semi-transparent features Grant 6,335,130 - Chen , et al. January 1, 2	2002-01-01
Method of fine feature edge tuning with optically-halftoned mask Grant 6,114,071 - Chen , et al. September 5, 2	2000-09-05

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