ASM IP Holdings B.V.

Patent Applications and Registrations

Patent applications and USPTO patent grants for ASM IP Holdings B.V..The latest application filed is for "substrate processing apparatus".

Company Profile

22.35.4

ASM IP Holdings B.V. - Almere NL
ASM IP Holdings, B.V. - NL NL
ASM IP Holdings B.V. -

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Metal clamp Grant D903,477 - Goratela , et al. December 1, 2	2020-12-01
Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures Grant 10,770,286 - Woodruff , et al. Sep	2020-09-08
Plasma film forming method Grant 10,734,219 - Shoji	2020-08-04
Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures Grant 10,720,331 - Raisanen , et al.	2020-07-21
Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures Grant 10,714,350 - Chen , et al.	2020-07-14
Semiconductor reaction chamber showerhead Grant 10,714,315 - White , et al.	2020-07-14
Radiation shield Grant 10,692,741 - Verbaas	2020-06-23
Methods for forming a silicon germanium tin layer and related semiconductor device structures Grant 10,685,834 - Bhargava , et al.	2020-06-16
Source/drain performance through conformal solid state doping Grant 10,665,452 - Xie , et al.	2020-05-26
Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber Grant 10,658,205 - Sharma	2020-05-19
Methods for thermally calibrating reaction chambers Grant 10,643,826 - Kim , et al.	2020-05-05
Methods for forming a semiconductor device and related semiconductor device structures Grant 10,643,904 - Xie , et al.	2020-05-05
Organic reactants for atomic layer deposition Grant 10,612,137 - Niskanen , et al.	2020-04-07
Method for forming a semiconductor device structure comprising a gate fill metal Grant 10,607,895 - Xie , et al.	2020-03-31
Chemical treatment, deposition and/or infiltration apparatus and method for using the same Grant 10,590,535 - Huggare	2020-03-17
Variable conductance gas distribution apparatus and method Grant 10,561,975 - Shugrue Feb	2020-02-18
Systems and methods for dynamic semiconductor process scheduling Grant 10,566,223 - Lawson , et al. Feb	2020-02-18
Method for depositing a semiconductor structure on a surface of a substrate and related semiconductor structures Grant 10,535,516 - Kohen , et al. Ja	2020-01-14
Cross-flow reactor and method Grant 10,529,542 - White , et al. J	2020-01-07
Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures Grant 10,529,563 - Blomberg , et al. J	2020-01-07
Reactor system for sublimation of pre-clean byproducts and method thereof Grant 10,519,541 - Tolle , et al. Dec	2019-12-31
Plasma atomic layer deposition Grant 10,480,078 - Knoops , et al. Nov	2019-11-19
Process gas management for an inductively-coupled plasma deposition reactor Grant 10,023,960 - Alokozai , et al. July 17, 2	2018-07-17
Photoactive devices and materials Grant 9,941,425 - Blomberg , et al. April 10, 2	2018-04-10
Film forming apparatus Grant 9,885,112 - Tsuji , et al. February 6, 2	2018-02-06
Substrate Processing Apparatus App 20170040204 - KIM; Soo Hyun ; et al.	2017-02-09
Process for deposition of titanium oxynitride for use in integrated circuit fabrication Grant 9,523,148 - Pore , et al. December 20, 2	2016-12-20
Deposition apparatus and deposition method Grant 9,399,819 - Cho July 26, 2	2016-07-26
Apparatus and method for pre-baking substrate upstream of process chamber Grant 9,349,620 - Kamata , et al. May 24, 2	2016-05-24
Semiconductor device dielectric interface layer Grant 9,177,784 - Raisanen , et al. November 3, 2	2015-11-03
Deposition apparatus Grant 9,120,114 - Jeong September 1, 2	2015-09-01
Silane or borane treatment of metal thin films Grant 9,111,749 - Shero , et al. August 18, 2	2015-08-18
Process gas management for an inductively-coupled plasma deposition reactor Grant 9,021,985 - Alokozai , et al. May 5, 2	2015-05-05
Metal oxide protective layer for a semiconductor device Grant 8,946,830 - Jung February 3, 2	2015-02-03
Method for stabilizing plasma ignition Grant 8,742,668 - Nakano , et al. June 3, 2	2014-06-03
Semiconductor device dielectric interface layer Grant 8,728,832 - Raisanen , et al. May 20, 2	2014-05-20
Process Gas Management for an Inductively-Coupled Plasma Deposition Reactor App 20140073143 - Alokozai; Fred ; et al.	2014-03-13
Semiconductor Device Dielectric Interface Layer App 20130292807 - Raisanen; Petri ; et al.	2013-11-07
Metal Oxide Protective Layer for a Semiconductor Device App 20130264659 - Jung; Sung-Hoon	2013-10-10

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