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Askarinam; Farahmand E Patent Filings

Askarinam; Farahmand E

Patent Applications and Registrations

Patent applications and USPTO patent grants for Askarinam; Farahmand E.The latest application filed is for "method and apparatus for heating a semiconductor wafer plasma reactor vacuum chamber".

Company Profile
0.3.4
  • Askarinam; Farahmand E - Sunnyvale CA
  • Askarinam; Farahmand E. - Sunnyvale CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Plasma reactor having RF power applicator and a dual-purpose window
Grant 6,790,311 - Collins , et al. September 14, 2
2004-09-14
Method and apparatus for heating a semiconductor wafer plasma reactor vacuum chamber
Grant 6,759,624 - Kumar , et al. July 6, 2
2004-07-06
Method and apparatus for heating a semiconductor wafer plasma reactor vacuum chamber
App 20030209526 - Kumar, Ananda H. ;   et al.
2003-11-13
Top gas feed lid for semiconductor processing chamber
App 20030037879 - Askarinam, Farahmand E. ;   et al.
2003-02-27
Plasma reactor having RF power applicator and a dual-purpose window
App 20020096259 - Collins, Kenneth S. ;   et al.
2002-07-25
Plasma reactor having a dual mode RF power application
Grant 6,365,063 - Collins , et al. April 2, 2
2002-04-02
Thermal Control Apparatus For Inductively Coupled Rf Plasma Reactor Having An Overhead Solenoidal Antenna
App 20010054483 - COLLINS, KENNETH S. ;   et al.
2001-12-27

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