Ashtiani; Kaihan A.

Patent Applications and Registrations

Patent applications and USPTO patent grants for Ashtiani; Kaihan A..The latest application filed is for "deposition of tungsten nitride".

Company Profile

0.10.4

Ashtiani; Kaihan A. - Sunnyvale CA
Ashtiani; Kaihan A. - Mountain View CA

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Adsorption based material removal process Grant 8,043,972 - Liu , et al. October 25, 2	2011-10-25
Deposition of tungsten nitride Grant 7,691,749 - Levy , et al. April 6, 2	2010-04-06
Adsorption based material removal process Grant 7,416,989 - Liu , et al. August 26, 2	2008-08-26
Method of forming low-resistivity tungsten interconnects Grant 7,262,125 - Wongsenakhum , et al. August 28, 2	2007-08-28
Method for reducing tungsten film roughness and improving step coverage Grant 7,141,494 - Lee , et al. November 28, 2	2006-11-28
Deposition of tungsten nitride App 20060094238 - Levy; Karl B. ; et al.	2006-05-04
Deposition of tungsten nitride Grant 7,005,372 - Levy , et al. February 28, 2	2006-02-28
Apparatus and method for depositing superior Ta (N) copper thin films for barrier and seed applications in semiconductor processing Grant 6,905,959 - Ashtiani , et al. June 14, 2	2005-06-14
Method for reducing tungsten film roughness and improving step coverage App 20050031786 - Lee, Sang-Hyeob ; et al.	2005-02-10
Method of forming low-resistivity tungsten interconnects App 20040202786 - Wongsenakhum, Panya ; et al.	2004-10-14
Deposition of tungsten nitride App 20040142557 - Levy, Karl B. ; et al.	2004-07-22
Control of erosion profile and process characteristics in magnetron sputtering by geometrical shaping of the sputtering target Grant 6,500,321 - Ashtiani , et al. December 31, 2	2002-12-31
Apparatus and method for controlling plasma uniformity across a substrate Grant 6,497,796 - Ashtiani , et al. December 24, 2	2002-12-24
Apparatus and method for controlling plasma uniformity across a substrate Grant 6,179,973 - Lai , et al. January 30, 2	2001-01-30

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