| Patent | Date |
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In-situ chamber clean end point detection systems and methods using computer vision systems
Grant 10,895,539 - Sawlani , et al. January 19, 2 | 2021-01-19 |
In-situ Chamber Clean End Point Detection Systems And Methods Using Computer Vision Systems
App 20190120775 - Sawlani; Kapil ; et al. | 2019-04-25 |
Interlevel conductor pre-fill utilizing selective barrier deposition
Grant 10,262,943 - Kolics , et al. | 2019-04-16 |
Interlevel Conductor Pre-Fill Utilizing Selective Barrier Deposition
App 20180151503 - Kolics; Artur ; et al. | 2018-05-31 |
Interlevel conductor pre-fill utilizing selective barrier deposition
Grant 9,875,968 - Kolics , et al. January 23, 2 | 2018-01-23 |
Interlevel Conductor Pre-Fill Utilizing Selective Barrier Deposition
App 20170162512 - Kolics; Artur ; et al. | 2017-06-08 |
Interlevel conductor pre-fill utilizing selective barrier deposition
Grant 9,583,386 - Kolics , et al. February 28, 2 | 2017-02-28 |
Systems and methods for eliminating seams in atomic layer deposition of silicon dioxide film in gap fill applications
Grant 9,406,544 - Tang , et al. August 2, 2 | 2016-08-02 |
Interlevel Conductor Pre-Fill Utilizing Selective Barrier Deposition
App 20160118296 - Kolics; Artur ; et al. | 2016-04-28 |
Flowable oxide film with tunable wet etch rate
Grant 9,299,559 - Draeger , et al. March 29, 2 | 2016-03-29 |
Systems And Methods For Producing Energetic Neutrals
App 20160013020 - Ashtiani; Kaihan ; et al. | 2016-01-14 |
Methods And Apparatus For Forming Flowable Dielectric Films Having Low Porosity
App 20150118863 - Rathod; Megha ; et al. | 2015-04-30 |
Flowable Oxide Film With Tunable Wet Etch Rate
App 20150044882 - Draeger; Nerissa ; et al. | 2015-02-12 |
Methods And Apparatus For Dielectric Deposition
App 20140302689 - Ashtiani; Kaihan ; et al. | 2014-10-09 |
Flowable oxide film with tunable wet etch rate
Grant 8,846,536 - Draeger , et al. September 30, 2 | 2014-09-30 |
Gap fill integration
Grant 8,728,958 - Ashtiani , et al. May 20, 2 | 2014-05-20 |
Flowable Oxide Film With Tunable Wet Etch Rate
App 20130230987 - Draeger; Nerissa ; et al. | 2013-09-05 |
Method for depositing thin tungsten film with low resistivity and robust micro-adhesion characteristics
Grant 8,409,987 - Chandrashekar , et al. April 2, 2 | 2013-04-02 |
Methods for growing low-resistivity tungsten for high aspect ratio and small features
Grant 8,409,985 - Chan , et al. April 2, 2 | 2013-04-02 |
Methods for forming all tungsten contacts and lines
Grant 8,367,546 - Humayun , et al. February 5, 2 | 2013-02-05 |
Methods For Forming All Tungsten Contacts And Lines
App 20120040530 - HUMAYUN; Raashina ; et al. | 2012-02-16 |
Method For Depositing Thin Tungsten Film With Low Resistivity And Robust Micro-adhesion Characteristics
App 20120015518 - Chandrashekar; Anand ; et al. | 2012-01-19 |
Ternary tungsten-containing resistive thin films
Grant 8,062,977 - Ashtiani , et al. November 22, 2 | 2011-11-22 |
Method for depositing thin tungsten film with low resistivity and robust micro-adhesion characteristics
Grant 8,058,170 - Chandrashekar , et al. November 15, 2 | 2011-11-15 |
Methods for forming all tungsten contacts and lines
Grant 8,053,365 - Humayun , et al. November 8, 2 | 2011-11-08 |
Methods For Growing Low-resistivity Tungsten For High Aspect Ratio And Small Features
App 20110223763 - Chan; Lana Hiului ; et al. | 2011-09-15 |
Novel Gap Fill Integration
App 20110151678 - Ashtiani; Kaihan ; et al. | 2011-06-23 |
Methods for growing low-resistivity tungsten for high aspect ratio and small features
Grant 7,955,972 - Chan , et al. June 7, 2 | 2011-06-07 |
Method For Depositing Thin Tungsten Film With Low Resistivity And Robust Micro-adhesion Characteristics
App 20100159694 - Chandrashekar; Anand ; et al. | 2010-06-24 |
Methods For Forming All Tungsten Contacts And Lines
App 20090163025 - Humayun; Raashina ; et al. | 2009-06-25 |
Methods For Growing Low-resistivity Tungsten For High Aspect Ratio And Small Features
App 20080254623 - Chan; Lana Hiului ; et al. | 2008-10-16 |
PVD deposition of titanium and titanium nitride layers in the same chamber without use of a collimator or a shutter
Grant 6,342,133 - D'Couto , et al. January 29, 2 | 2002-01-29 |
PVD deposition of titanium and titanium nitride layers in the same chamber without use of a collimator or a shutter
App 20010030125 - D'Couto, Gerard Chris ; et al. | 2001-10-18 |
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