Ashida; Isao Patent Filings

Patent	Date
Mask pattern correction method, semiconductor device manufacturing method, mask manufacturing method and mask Grant 7,109,500 - Omori , et al. September 19, 2	2006-09-19
Mask processing device, mask processing method, program and mask App 20060143172 - Ashida; Isao ; et al.	2006-06-29
Complementary division condition determining method and program and complementary division method Grant 7,010,434 - Ashida , et al. March 7, 2	2006-03-07
Mask pattern correction method, semiconductor device manufacturing method, mask manufacturing method and mask App 20050124078 - Omori, Shinji ; et al.	2005-06-09
Stencil mask and method of producing the same, semiconductor device produced using the stencil mask and method of producing the semiconductor device App 20050003282 - Ashida, Isao	2005-01-06
Complementary division condition determining method and program and complementary division method App 20040210423 - Ashida, Isao ; et al.	2004-10-21
Stencil mask and method of producing the same, semiconductor device produced using the stencil mask and method of producing the semiconductor device Grant 6,780,659 - Ashida August 24, 2	2004-08-24
Method for mask data verification and computer readable record medium recording the verification program Grant 6,658,641 - Ashida , et al. December 2, 2	2003-12-02
Stencil mask and method of producing the same, semiconductor device produced using the stencil mask and method of producing the semiconductor device App 20030022496 - Ashida, Isao	2003-01-30
Method for mask data verification and computer readable record medium recording the verification program App 20020066069 - Ashida, Isao ; et al.	2002-05-30

Patent

Date

Mask pattern correction method, semiconductor device manufacturing method, mask manufacturing method and mask
Grant 7,109,500 - Omori , et al. September 19, 2

2006-09-19

Mask processing device, mask processing method, program and mask
App 20060143172 - Ashida; Isao ; et al.

2006-06-29

Complementary division condition determining method and program and complementary division method
Grant 7,010,434 - Ashida , et al. March 7, 2

2006-03-07

Mask pattern correction method, semiconductor device manufacturing method, mask manufacturing method and mask
App 20050124078 - Omori, Shinji ; et al.

2005-06-09

Stencil mask and method of producing the same, semiconductor device produced using the stencil mask and method of producing the semiconductor device
App 20050003282 - Ashida, Isao

2005-01-06

Complementary division condition determining method and program and complementary division method
App 20040210423 - Ashida, Isao ; et al.

2004-10-21

Stencil mask and method of producing the same, semiconductor device produced using the stencil mask and method of producing the semiconductor device
Grant 6,780,659 - Ashida August 24, 2

2004-08-24

Method for mask data verification and computer readable record medium recording the verification program
Grant 6,658,641 - Ashida , et al. December 2, 2

2003-12-02

Stencil mask and method of producing the same, semiconductor device produced using the stencil mask and method of producing the semiconductor device
App 20030022496 - Ashida, Isao

2003-01-30

Method for mask data verification and computer readable record medium recording the verification program
App 20020066069 - Ashida, Isao ; et al.

2002-05-30

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Ashida; Isao

Patent Applications and Registrations