Aruga; Michio

Patent Applications and Registrations

Patent applications and USPTO patent grants for Aruga; Michio.The latest application filed is for "automatic window generation for process trace".

Company Profile

0.11.5

Aruga; Michio - Chiba-ken JP
Aruga; Michio - Kanagawa JP
Aruga; Michio - Inba-Gun JP
Aruga; Michio - Narita JP
Aruga, Michio - Narita-shi JP
Aruga; Michio - Tomisato JP
Aruga; Michio - Inba JP
Aruga; Michio - Chiba JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Automatic Window Generation for Process Trace App 20220027248 - Burch; Richard ; et al.	2022-01-27
Device for Treating Object and Process Therefor App 20080035754 - Aruga; Michio ; et al.	2008-02-14
Apparatus for reducing plasma charge damage for plasma processes Grant 7,036,453 - Ishikawa , et al. May 2, 2	2006-05-02
Apparatus for reducing plasma charge damage for plasma processes App 20040048492 - Ishikawa, Tetsuya ; et al.	2004-03-11
Method of reducing plasma charge damage for plasma processes Grant 6,660,662 - Ishikawa , et al. December 9, 2	2003-12-09
Film formation method and film formation apparatus Grant 6,632,726 - Aruga , et al. October 14, 2	2003-10-14
Method of reducing plasma charge damage for plasma processes App 20030024901 - Ishikawa, Tetsuya ; et al.	2003-02-06
Film formation method and film formation apparatus App 20020028567 - Aruga, Michio ; et al.	2002-03-07
Preconditioning process for treating deposition chamber prior to deposition of tungsten silicide coating on active substrates therein Grant 6,090,706 - Telford , et al. July 18, 2	2000-07-18
Resistance heated stem mounted aluminum susceptor assembly Grant 5,688,331 - Aruga , et al. November 18, 1	1997-11-18
Uniform tungsten silicide films produced by chemical vapor depostiton Grant 5,643,633 - Telford , et al. July 1, 1	1997-07-01
Uniform tungsten silicide films produced by chemical vapor deposition Grant 5,558,910 - Telford , et al. September 24, 1	1996-09-24
Process for uniform deposition of tungsten silicide on semiconductor wafers by treatment of susceptor having aluminum nitride surface thereon with tungsten silicide after cleaning of susceptor Grant 5,510,297 - Telford , et al. April 23, 1	1996-04-23
Uniform tungsten silicide films produced by chemical vapor deposition Grant 5,500,249 - Telford , et al. March 19, 1	1996-03-19
Pretreatment process for treating aluminum-bearing surfaces of deposition chamber prior to deposition of tungsten silicide coating on substrate therein Grant 5,482,749 - Telford , et al. January 9, 1	1996-01-09
Susceptor for vapor deposition Grant 5,456,757 - Aruga , et al. October 10, 1	1995-10-10

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