Arisawa; Yukiyasu

Patent Applications and Registrations

Patent applications and USPTO patent grants for Arisawa; Yukiyasu.The latest application filed is for "imprint apparatus and imprint method".

Company Profile

0.12.12

Arisawa; Yukiyasu - Tokyo JP
Arisawa; Yukiyasu - Ibaraki N/A JP
Arisawa; Yukiyasu - Tsukuba JP
ARISAWA; Yukiyasu - Tsukuba-shi JP
Arisawa; Yukiyasu - Yokohama-shi JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Imprint apparatus and imprint method Grant 10,290,498 - Mitsugi , et al.	2019-05-14
Imprint Apparatus And Imprint Method App 20190080899 - MITSUGI; Satoshi ; et al.	2019-03-14
Method of correcting mask pattern, computer program product, and method of manufacturing semiconductor device Grant 8,617,773 - Uno , et al. December 31, 2	2013-12-31
Flare prediction method, photomask manufacturing method, semiconductor device manufacturing method, and computer-readable medium Grant 8,507,160 - Uno , et al. August 13, 2	2013-08-13
Flare value calculation method, flare correction method, and computer program product Grant 8,443,311 - Arisawa , et al. May 14, 2	2013-05-14
Method Of Correcting Mask Pattern, Computer Program Product, Mask Pattern Correcting Apparatus, And Method Of Manufacturing Semiconductor Device App 20120244707 - Uno; Taiga ; et al.	2012-09-27
Flare Prediction Method, Photomask Manufacturing Method, Semiconductor Device Manufacturing Method, And Computer-readable Medium App 20120202140 - UNO; Taiga ; et al.	2012-08-09
Flare Value Calculation Method, Flare Correction Method, And Computer Program Product App 20120198395 - Arisawa; Yukiyasu ; et al.	2012-08-02
Method Of Creating An Evaluation Map, System, Method Of Manufacturing A Semiconductor Device And Computer Program Product App 20110262867 - UNO; Taiga ; et al.	2011-10-27
Method of correcting a flare and computer program product Grant 8,039,177 - Uno , et al. October 18, 2	2011-10-18
Photomask management method and photomask wash limit generating method Grant 7,941,767 - Mukai , et al. May 10, 2	2011-05-10
Method of evaluating a photo mask and method of manufacturing a semiconductor device Grant 7,912,275 - Yamamoto , et al. March 22, 2	2011-03-22
Method Of Correcting A Flare And Computer Program Product App 20100323282 - UNO; Taiga ; et al.	2010-12-23
Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device App 20100112812 - Arisawa; Yukiyasu ; et al.	2010-05-06
Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device Grant 7,636,910 - Arisawa , et al. December 22, 2	2009-12-22
Method Of Evaluating A Photo Mask And Method Of Manufacturing A Semiconductor Device App 20090202924 - YAMAMOTO; Hiroki ; et al.	2009-08-13
Photomask Management Method And Photomask Wash Limit Generating Method App 20080320434 - MUKAI; Hidefumi ; et al.	2008-12-25
Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program project Grant 7,446,852 - Arisawa , et al. November 4, 2	2008-11-04
Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program product App 20070182941 - Arisawa; Yukiyasu ; et al.	2007-08-09
Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device App 20070005280 - Arisawa; Yukiyasu ; et al.	2007-01-04
Pattern extracting system, method for extracting measuring points, method for extracting patterns, and computer program product for extracting patterns App 20060190875 - Arisawa; Yukiyasu ; et al.	2006-08-24

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