Arahori; Tadahisa

Patent Applications and Registrations

Patent applications and USPTO patent grants for Arahori; Tadahisa.The latest application filed is for "sputtering target and method for producing the same".

Company Profile

2.7.7

Arahori; Tadahisa - Tokyo N/A JP
Arahori; Tadahisa - Ashiya JP
Arahori; Tadahisa - Ashiya-shi JP
Arahori, Tadahisa - Hyogo JP

*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.

Patent Activity

Patent	Date
Sputtering target and method for producing the same Grant 10,504,706 - Okamoto , et al. Dec	2019-12-10
Sputtering target and method for producing the same Grant 9,824,868 - Okamoto , et al. November 21, 2	2017-11-21
Sputtering Target And Method For Producing The Same App 20150122642 - Okamoto; Ken ; et al.	2015-05-07
Sputtering Target And Method For Producing The Same App 20140318956 - Okamoto; Ken ; et al.	2014-10-30
Surface-treated ceramic member, method for producing the same and vacuum processing apparatus Grant 8,231,967 - Nakano , et al. July 31, 2	2012-07-31
Yttria sintered body and component used for plasma processing apparatus Grant 8,158,544 - Okamoto , et al. April 17, 2	2012-04-17
Surface-treated Ceramic Member, Method For Producing The Same And Vacuum Processing Apparatus App 20110151237 - NAKANO; Katsuaki ; et al.	2011-06-23
Yttria Sintered Body And Component Used For Plasma Processing Apparatus App 20110129684 - Okamoto; Ken ; et al.	2011-06-02
Machinable ceramic Grant 7,160,825 - Etoh , et al. January 9, 2	2007-01-09
Low thermal expansion ceramic and member for exposure system Grant 7,112,549 - Yoshitomi , et al. September 26, 2	2006-09-26
Machinable ceramic App 20050130829 - Etoh, Shunichi ; et al.	2005-06-16
Low thermal expansion ceramic and member for exposure system App 20030100434 - Yoshitomi, Yasuki ; et al.	2003-05-29

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