loadpatents
name:-0.13883900642395
name:-0.0010418891906738
name:-0.0021688938140869
Applied Materials, Inc., a Delaware corporation Patent Filings

Applied Materials, Inc., a Delaware corporation

Patent Applications and Registrations

Patent applications and USPTO patent grants for Applied Materials, Inc., a Delaware corporation.The latest application filed is for "polishing pad with two-section window having recess".

Company Profile
2.0.95
  • Applied Materials, Inc., a Delaware corporation -
  • Applied Materials, Inc. A Delaware corporation - Santa Clara CA
  • Applied Materials, Inc., A Delaware corporation - P.O. Box 450A Santa Clara CA
*profile and listings may contain filings by different individuals or companies with the same name. Review application materials to confirm ownership/assignment.
Patent Activity
PatentDate
Polishing Pad With Two-section Window Having Recess
App 20130231032 - Swedek; Boguslaw A. ;   et al.
2013-09-05
Retaining Ring And Articles For Carrier Head
App 20130157549 - Bennett; Doyle E. ;   et al.
2013-06-20
Semi-Quantitative Thickness Determination
App 20130059499 - Benvegnu; Dominic J. ;   et al.
2013-03-07
Method Of Assembly Of Retaining Ring For Cmp
App 20120325395 - Zuniga; Steven M. ;   et al.
2012-12-27
Retaining Ring And Articles For Carrier Head
App 20100144255 - Bennett; Doyle E. ;   et al.
2010-06-10
Carrier Head With Retaining Ring And Carrier Ring
App 20100136892 - Zuniga; Steven M. ;   et al.
2010-06-03
Methods for Forming a Silicon Oxide Layer Over a Substrate
App 20090104791 - Nemani; Srinivas D. ;   et al.
2009-04-23
Methods And Apparatus For Polishing Control
App 20080268643 - Birang; Manoocher ;   et al.
2008-10-30
Stress Measurements During Large-mismatch Epitaxial Processes
App 20080206902 - Bour; David ;   et al.
2008-08-28
Method And Apparatus For Measuring Object Thickness
App 20080186022 - Lei; Lawrence C. ;   et al.
2008-08-07
Multi-stage Curing Of Low K Nano-porous Films
App 20080099920 - Schmitt; Francimar ;   et al.
2008-05-01
CMOS S/D SiGe DEVICE MADE WITH ALTERNATIVE INTEGRATION PROCESS
App 20070284668 - Shen; Meihua ;   et al.
2007-12-13
ALTERNATIVE INTEGRATION SCHEME FOR CMOS S/D SiGe PROCESS
App 20070287244 - Shen; Meihua ;   et al.
2007-12-13
UV activation of NH3 for III-N deposition
App 20070256635 - Bour; David ;   et al.
2007-11-08
Composite heater and chill plate
App 20070251456 - Herchen; Harald ;   et al.
2007-11-01
Eddy current system for in-situ profile measurement
App 20070139043 - Miller; G. Laurie ;   et al.
2007-06-21
Enhanced magnetic shielding for plasma-based semiconductor processing tool
App 20070062449 - Mungekar; Hemant P. ;   et al.
2007-03-22
Method and device for critical dimension detection by molecular binding
App 20070042390 - Borden; Peter
2007-02-22
Non-intrusive plasma monitoring system for arc detection and prevention for blanket CVD films
App 20070042131 - Soo; Jyr Hong ;   et al.
2007-02-22
Method and system for deposition tuning in an epitaxial film growth apparatus
App 20070010033 - Aderhold; Wolfgang R. ;   et al.
2007-01-11
Method to increase the compressive stress of PECVD silicon nitride films
App 20060269692 - Balseanu; Mihaela ;   et al.
2006-11-30
System and method for in-line metal profile measurement
App 20060246822 - Swedek; Boguslaw A. ;   et al.
2006-11-02
Electrostatic chuck for track thermal plates
App 20060238954 - Ishikawa; Tetsuya ;   et al.
2006-10-26
Polishing method and apparatus
App 20060228991 - Kitajima; Tomohiko ;   et al.
2006-10-12
Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion
App 20060194525 - Tolles; Robert D. ;   et al.
2006-08-31
High-throughput HDP-CVD processes for advanced gapfill applications
App 20060154494 - Qi; Bo ;   et al.
2006-07-13
Multilayer polishing pad and method of making
App 20060154568 - Tolles; Robert D.
2006-07-13
Flexible membrane for multi-chamber carrier head
App 20060154580 - Chen; Hung Chih ;   et al.
2006-07-13
Vibration damping in chemical mechanical polishing system
App 20060148387 - Chen; Hung Chih ;   et al.
2006-07-06
Self-cooling gas delivery apparatus under high vacuum for high density plasma applications
App 20060130756 - Liang; Qiwei ;   et al.
2006-06-22
Coat/develop module with independent stations
App 20060134340 - Ishikawa; Tetsuya ;   et al.
2006-06-22
Silicon Oxide Gapfill Deposition Using Liquid Precursors
App 20060046508 - Nemani; Srinivas D. ;   et al.
2006-03-02
Gap-fill depositions introducing hydroxyl-containing precursors in the formation of silicon containing dielectric materials
App 20060046427 - Ingle; Nitin K. ;   et al.
2006-03-02
Multi-step anneal of thin films for film densification and improved gap-fill
App 20060030165 - Ingle; Nitin K. ;   et al.
2006-02-09
Data processing for monitoring chemical mechanical polishing
App 20060009131 - Swedek; Boguslaw A. ;   et al.
2006-01-12
Oxygen plasma treatment for enhanced HDP-CVD gapfill
App 20050282398 - Mungekar, Hemant P. ;   et al.
2005-12-22
Hermetic cap layers formed on low-k films by plasma enhanced chemical vapor deposition
App 20050282404 - Nguyen, Vu Ngoc Tran ;   et al.
2005-12-22
Polishing pad with window
App 20050266771 - Wiswesser, Andreas Norbert
2005-12-01
Method For Forming A Low Thermal Budget Spacer
App 20050266622 - Arghavani, Reza ;   et al.
2005-12-01
Method of inducing stresses in the channel region of a transistor
App 20050255667 - Arghavani, Reza ;   et al.
2005-11-17
HDP-CVD seasoning process for high power HDP-CVD gapfil to improve particle performance
App 20050250340 - Chen, Xiaolin ;   et al.
2005-11-10
Polishing system with in-line and in-situ metrology
App 20050245170 - Swedek, Boguslaw A. ;   et al.
2005-11-03
Method and system for control of processing conditions in plasma processing systems
App 20050220984 - Sun, Sheng ;   et al.
2005-10-06
Low-thermal-budget gapfill process
App 20050196929 - Yuan, Zheng ;   et al.
2005-09-08
Profile control platen
App 20050186892 - Chen, Hung Chih ;   et al.
2005-08-25
Methods and apparatuses promoting adhesion of dielectric barrier film to copper
App 20050186339 - Rajagopalan, Nagarajan ;   et al.
2005-08-25
HDP-CVD deposition process for filling high aspect ratio gaps
App 20050181632 - Tan, Zhengquan ;   et al.
2005-08-18
Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
App 20050170751 - Birang, Manoocher ;   et al.
2005-08-04
Chemical mechanical polishing a substrate having a filler layer and a stop layer
App 20050153561 - Jin, Raymond R. ;   et al.
2005-07-14
Edge flow faceplate for improvement of CVD film properties
App 20050126484 - Zhao, Maosheng ;   et al.
2005-06-16
Method of forming a polishing pad for endpoint detection
App 20050124273 - Swedek, Boguslaw A. ;   et al.
2005-06-09
Gas distribution showerhead featuring exhaust apertures
App 20050103265 - Gianoulakis, Steven ;   et al.
2005-05-19
Ramp temperature techniques for improved mean wafer before clean
App 20050101155 - Bang, Won B. ;   et al.
2005-05-12
System and method for in-line metal profile measurement
App 20050048874 - Swedek, Boguslaw A. ;   et al.
2005-03-03
Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion
App 20050048880 - Tolles, Robert D. ;   et al.
2005-03-03
Carrier head with a flexible membrane
App 20050037698 - Zuniga, Steven M. ;   et al.
2005-02-17
Sequential gas flow oxide deposition technique
App 20050019494 - Moghadam, Farhad K. ;   et al.
2005-01-27
Closed-loop control of wafer polishing in a chemical mechanical polishing system
App 20050020185 - Zuniga, Steven ;   et al.
2005-01-27
Methods for a multilayer retaining ring
App 20040209556 - Zuniga, Steven M. ;   et al.
2004-10-21
Polishing pad with a partial adhesive coating
App 20040198187 - Tolles, Robert D.
2004-10-07
Vibration damping in a chemical mechanical polishing system
App 20040142646 - Chen, Hung Chih ;   et al.
2004-07-22
Method and apparatus for detecting an end-point in chemical mechanical polishing of metal layers
App 20040116047 - Wiswesser, Andreas Norbert ;   et al.
2004-06-17
Polishing pad for in-situ endpoint detection
App 20040106357 - Birang, Manoocher ;   et al.
2004-06-03
Ionic additives for extreme low dielectric constant chemical formulations
App 20040087184 - Mandal, Robert P. ;   et al.
2004-05-06
Gas distribution showerhead
App 20040060514 - Janakiraman, Karthik ;   et al.
2004-04-01
Method of detecting a substrate in a carrier head
App 20040033762 - Chen, Hung Chih ;   et al.
2004-02-19
Carrier head with a flexible membrane for a chemical mechanical polishing system
App 20040033769 - Zuniga, Steven M. ;   et al.
2004-02-19
Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations
App 20040014395 - Birang, Manoocher ;   et al.
2004-01-22
Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
App 20030190867 - Birang, Manoocher ;   et al.
2003-10-09
Chemical mechanical polishing with multiple polishing pads
App 20030190865 - Somekh, Sasson
2003-10-09
Linear polishing sheet with window
App 20030181137 - Redeker, Fred C. ;   et al.
2003-09-25
Chemical mechanical polishing of a metal layer with polishing rate monitoring
App 20030176081 - Redeker, Fred C. ;   et al.
2003-09-18
Process for forming silicon oxide material
App 20030161951 - Yuan, Zheng ;   et al.
2003-08-28
In situ application of etch back for improved deposition into high-aspect-ratio features
App 20030136332 - Krishnaraj, Padmanabhan ;   et al.
2003-07-24
Carrier head with a substrate detection mechanism for a chemical mechanical polishing system
App 20030139123 - Somekh, Sasson
2003-07-24
Method of manufacturing an optical core
App 20030110808 - M'Saad, Hichem ;   et al.
2003-06-19
HDP-CVD film for uppercladding application in optical waveguides
App 20030113085 - M'Saad, Hichem
2003-06-19
Optical Monitoring In A Two-step Chemical Mechanical Polishing Process
App 20030104760 - Adams, Bret W. ;   et al.
2003-06-05
Method and apparatus for measuring substrate layer thickness during chemical mechanical polishing
App 20030104761 - Wiswesser, Andreas Norbert ;   et al.
2003-06-05
Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatus
App 20030092371 - Osterheld, Thomas H. ;   et al.
2003-05-15
Deposition chamber and method for depositing low dielectric constant films
App 20030056900 - Li, Shijian ;   et al.
2003-03-27
Multistep remote plasma clean process
App 20030029475 - Hua, Zhong Qiang ;   et al.
2003-02-13
Carrier head with a flexible membrane to form multiple chambers
App 20030022609 - Perlov, Ilya ;   et al.
2003-01-30
Substrate retainer
App 20020179251 - Zuniga, Steven M. ;   et al.
2002-12-05
Method and apparatus for conditioning a polishing pad
App 20020164928 - Tolles, Robert D.
2002-11-07
Carrier head with a compressible film
App 20020164938 - Chen, Hung Chih ;   et al.
2002-11-07
Polishing pad having a grooved pattern for use in chemical mechanical polishing apparatus
App 20020137450 - Osterheld, Thomas H. ;   et al.
2002-09-26
Substrate polishing article
App 20020086619 - Tolles, Robert D.
2002-07-04
Carrier head with a flexible membrane for a chemical mechanical polishing system
App 20020086624 - Zuniga, Steven M. ;   et al.
2002-07-04
Carrier head with local pressure control for a chemical mechanical polishing apparatus
App 20020072313 - Zuniga, Steven M. ;   et al.
2002-06-13
In-situ real-time monitoring technique and apparatus for endpoint detection of thin films during chemical/mechanical polishing planarization
App 20020013058 - Tang, Wallace T. Y.
2002-01-31
Carrier head with a flexible membrane for a chemical mechanical polishing system
App 20010041526 - Perlov, Ilya ;   et al.
2001-11-15
Method and apparatus for detecting an end-point in chemical mechanical polishing of metal layers
App 20010036793 - Wiswesser, Andreas Norbert ;   et al.
2001-11-01
Forming a transparent window in a polishing pad for a chemical mehcanical polishing apparatus
App 20010036805 - Birang, Manoocher M.B. ;   et al.
2001-11-01
Chemical mechanical polishing with multiple polishing pads
App 20010001756 - Somekh, Sasson
2001-05-24

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