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Patent applications and USPTO patent grants for Appels; Johannes Arnoldus.The latest application filed is for "method of manufacturing semiconductor devices in which silicon oxide regions inset in silicon are formed by a masking oxidation, wherein an intermediate layer of polycrystalline silicon is provided between the substrate and the oxidation mask".
Patent | Date |
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Method of manufacturing semiconductor devices in which silicon oxide regions inset in silicon are formed by a masking oxidation, wherein an intermediate layer of polycrystalline silicon is provided between the substrate and the oxidation mask Grant 3,900,350 - Appels , et al. August 19, 1 | 1975-08-19 |
Method Of Making Semiconductor Devices With Selective Doping And Selective Oxidation Grant 3,755,001 - Kooi , et al. August 28, 1 | 1973-08-28 |
Method Of Manufacturing A Semiconductor Device Employing Selective Doping And Selective Oxidation Grant 3,755,014 - Appels , et al. August 28, 1 | 1973-08-28 |
Deep Depletion Semiconductor Device With Surface Inversion Preventing Means Grant 3,678,347 - Tulp , et al. July 18, 1 | 1972-07-18 |
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