Appasamy; Sreeram
Patent Applications and Registrations
Patent applications and USPTO patent grants for Appasamy; Sreeram.The latest application filed is for "high throughput, low cost dual-mode patterning method for large area substrates".
- Appasamy; Sreeram - North White Plains NY
| Patent | Date |
|---|---|
| High throughput, low cost dual-mode patterning method for large area substrates Grant 8,420,978 - Jain , et al. April 16, 2 | 2013-04-16 |
| High Throughput, Low Cost Dual-mode Patterning Method For Large Area Substrates App 20080176398 - Jain; Kanti ; et al. | 2008-07-24 |
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